132 related articles for article (PubMed ID: 27140543)
1. Advanced materials for multilayer mirrors for extreme ultraviolet solar astronomy.
Bogachev SA; Chkhalo NI; Kuzin SV; Pariev DE; Polkovnikov VN; Salashchenko NN; Shestov SV; Zuev SY
Appl Opt; 2016 Mar; 55(9):2126-35. PubMed ID: 27140543
[TBL] [Abstract][Full Text] [Related]
2. Thin film multilayer filters for solar EUV telescopes.
Chkhalo NI; Drozdov MN; Kluenkov EB; Kuzin SV; Lopatin AY; Luchin VI; Salashchenko NN; Tsybin NN; Zuev SY
Appl Opt; 2016 Jun; 55(17):4683-90. PubMed ID: 27409026
[TBL] [Abstract][Full Text] [Related]
3. Pd/B4C/Y multilayer coatings for extreme ultraviolet applications near 10 nm wavelength.
Windt DL; Gullikson EM
Appl Opt; 2015 Jun; 54(18):5850-60. PubMed ID: 26193039
[TBL] [Abstract][Full Text] [Related]
4. Highly reflective Ru/Sr multilayer mirrors for wavelengths 9-12 nm.
Shaposhnikov RA; Polkovnikov VN; Salashchenko NN; Chkhalo NI; Zuev SY
Opt Lett; 2022 Sep; 47(17):4351-4354. PubMed ID: 36048651
[TBL] [Abstract][Full Text] [Related]
5. Wavelength separation from extreme ultraviolet mirrors using phaseshift reflection.
van den Boogaard AJ; van Goor FA; Louis E; Bijkerk F
Opt Lett; 2012 Jan; 37(2):160-2. PubMed ID: 22854453
[TBL] [Abstract][Full Text] [Related]
6. Influence of barrier interlayers on the performance of Mo/Be multilayer mirrors for next-generation EUV lithography.
Svechnikov MV; Chkhalo NI; Gusev SA; Nechay AN; Pariev DE; Pestov AE; Polkovnikov VN; Tatarskiy DA; Salashchenko NN; Schäfers F; Sertsu MG; Sokolov A; Vainer YA; Zorina MV
Opt Express; 2018 Dec; 26(26):33718-33731. PubMed ID: 30650805
[TBL] [Abstract][Full Text] [Related]
7. High efficiency Al/Sc-based multilayer coatings in the EUV wavelength range above 40 nanometers.
Rebellato J; Soufli R; Meltchakov E; Gullikson E; de Rossi S; Delmotte F
Opt Lett; 2020 Feb; 45(4):869-872. PubMed ID: 32058492
[TBL] [Abstract][Full Text] [Related]
8. Stable high-reflection Be/Mg multilayer mirrors for solar astronomy at 30.4 nm.
Polkovnikov VN; Chkhalo NI; Pleshkov RS; Salashchenko NN; Schäfers F; Sertsu MG; Sokolov A; Svechnikov MV; Zuev SY
Opt Lett; 2019 Jan; 44(2):263-266. PubMed ID: 30644876
[TBL] [Abstract][Full Text] [Related]
9. Mo/B4C/Si multilayer-coated photodiode with polarization sensitivity at an extreme-ultraviolet wavelength of 13.5 nm.
Kjornrattanawanich B; Bajt S; Seely JF
Appl Opt; 2004 Feb; 43(5):1082-90. PubMed ID: 15008487
[TBL] [Abstract][Full Text] [Related]
10. Beryllium-Based Multilayer Mirrors and Filters for the Extreme Ultraviolet Range.
Nikolay C; Alexey L; Andrey N; Dmitriy P; Alexey P; Vladimir P; Nikolay S; Franz S; Mewael S; Andrey S; Mikhail S; Nikolay T; Sergey Z
J Nanosci Nanotechnol; 2019 Jan; 19(1):546-553. PubMed ID: 30327068
[TBL] [Abstract][Full Text] [Related]
11. UV spectral filtering by surface structured multilayer mirrors.
Huang Q; Paardekooper DM; Zoethout E; Medvedev VV; van de Kruijs R; Bosgra J; Louis E; Bijkerk F
Opt Lett; 2014 Mar; 39(5):1185-8. PubMed ID: 24690702
[TBL] [Abstract][Full Text] [Related]
12. Mo/Si and Mo/Be multilayer thin films on Zerodur substrates for extreme-ultraviolet lithography.
Mirkarimi PB; Bajt S; Wall MA
Appl Opt; 2000 Apr; 39(10):1617-25. PubMed ID: 18345060
[TBL] [Abstract][Full Text] [Related]
13. Ultrasmooth beryllium substrates for solar astronomy in extreme ultraviolet wavelengths.
Chkhalo NI; Mikhailenko MS; Pestov AE; Polkovnikov VN; Zorina MV; Zuev SY; Kazakov DS; Milkov AV; Strulya IL; Filichkina VA; Kozlov AS
Appl Opt; 2019 May; 58(13):3652-3658. PubMed ID: 31044861
[TBL] [Abstract][Full Text] [Related]
14. Extreme Ultraviolet Multilayer Nanostructures and Their Application to Solar Plasma Observations: A Review.
Corso AJ; Pelizzo MG
J Nanosci Nanotechnol; 2019 Jan; 19(1):532-545. PubMed ID: 30327067
[TBL] [Abstract][Full Text] [Related]
15. Infrared suppression by hybrid EUV multilayer--IR etalon structures.
Medvedev VV; Yakshin AE; van de Kruijs RW; Krivtsun VM; Yakunin AM; Koshelev KN; Bijkerk F
Opt Lett; 2011 Sep; 36(17):3344-6. PubMed ID: 21886205
[TBL] [Abstract][Full Text] [Related]
16. High-reflection Mo/Be/Si multilayers for EUV lithography.
Chkhalo NI; Gusev SA; Nechay AN; Pariev DE; Polkovnikov VN; Salashchenko NN; Schäfers F; Sertsu MG; Sokolov A; Svechnikov MV; Tatarsky DA
Opt Lett; 2017 Dec; 42(24):5070-5073. PubMed ID: 29240139
[TBL] [Abstract][Full Text] [Related]
17. High efficiency structured EUV multilayer mirror for spectral filtering of long wavelengths.
Huang Q; de Boer M; Barreaux J; van der Meer R; Louis E; Bijkerk F
Opt Express; 2014 Aug; 22(16):19365-74. PubMed ID: 25321021
[TBL] [Abstract][Full Text] [Related]
18. Angular and Spectral Bandwidth of Extreme UV Multilayers Near Spacer Material Absorption Edges.
Zameshin AA; Yakshin AE; Chandrasekaran A; Bijkerk F
J Nanosci Nanotechnol; 2019 Jan; 19(1):602-608. PubMed ID: 30327075
[TBL] [Abstract][Full Text] [Related]
19. Thermal stability of Mg/Co multilayer with B4C, Mo or Zr diffusion barrier layers.
Zhu J; Zhou S; Li H; Wang Z; Jonnard P; Le Guen K; Hu MH; André JM; Zhou H; Huo T
Opt Express; 2011 Oct; 19(22):21849-54. PubMed ID: 22109036
[TBL] [Abstract][Full Text] [Related]
20. Highly reflective Ru/Y multilayer mirrors for the spectral range of 9-11 nm.
Polkovnikov VN; Shaposhnikov RA; Zuev SY; Svechnikov MV; Sertsu MG; Sokolov A; Schäfers F; Chkhalo NI
Opt Express; 2022 May; 30(11):19332-19342. PubMed ID: 36221714
[TBL] [Abstract][Full Text] [Related]
[Next] [New Search]