These tools will no longer be maintained as of December 31, 2024. Archived website can be found here. PubMed4Hh GitHub repository can be found here. Contact NLM Customer Service if you have questions.
148 related articles for article (PubMed ID: 27295338)
41. Effect of an electric field during the deposition of silicon dioxide thin films by plasma enhanced atomic layer deposition: an experimental and computational study. Beladiya V; Becker M; Faraz T; Kessels WMME; Schenk P; Otto F; Fritz T; Gruenewald M; Helbing C; Jandt KD; Tünnermann A; Sierka M; Szeghalmi A Nanoscale; 2020 Jan; 12(3):2089-2102. PubMed ID: 31912855 [TBL] [Abstract][Full Text] [Related]
42. Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers. Andringa AM; Perrotta A; de Peuter K; Knoops HC; Kessels WM; Creatore M ACS Appl Mater Interfaces; 2015 Oct; 7(40):22525-32. PubMed ID: 26393381 [TBL] [Abstract][Full Text] [Related]
43. Dataset for TiN Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition Using Tetrakis(dimethylamino)titanium (TDMAT) and Titanium Tetrachloride (TiCl Lee WJ; Yun EY; Lee HB; Hong SW; Kwon SH Data Brief; 2020 Aug; 31():105777. PubMed ID: 32551348 [TBL] [Abstract][Full Text] [Related]
44. Study of Atomic Layer Deposition Nano-Oxide Films on Corrosion Protection of Al-SiC Composites. Chen HJ; Chen YC; Lin PC; Lin K; Lin JC; Chen MJ; Lin HC Materials (Basel); 2023 Sep; 16(18):. PubMed ID: 37763427 [TBL] [Abstract][Full Text] [Related]
45. Silicon dioxide mask by plasma enhanced atomic layer deposition in focused ion beam lithography. Liu Z; Shah A; Alasaarela T; Chekurov N; Savin H; Tittonen I Nanotechnology; 2017 Feb; 28(8):085303. PubMed ID: 28045005 [TBL] [Abstract][Full Text] [Related]
46. In Situ Control of Oxygen Vacancies in TaO Egorov KV; Kuzmichev DS; Chizhov PS; Lebedinskii YY; Hwang CS; Markeev AM ACS Appl Mater Interfaces; 2017 Apr; 9(15):13286-13292. PubMed ID: 28350159 [TBL] [Abstract][Full Text] [Related]
47. Low Temperature Reactive Sputtering of Thin Aluminum Nitride Films on Metallic Nanocomposites. Ramadan KS; Evoy S PLoS One; 2015; 10(7):e0133479. PubMed ID: 26193701 [TBL] [Abstract][Full Text] [Related]
49. Role of Surface Termination in Atomic Layer Deposition of Silicon Nitride. Ande CK; Knoops HC; de Peuter K; van Drunen M; Elliott SD; Kessels WM J Phys Chem Lett; 2015 Sep; 6(18):3610-4. PubMed ID: 26722730 [TBL] [Abstract][Full Text] [Related]
50. AlN Surface Passivation of GaN-Based High Electron Mobility Transistors by Plasma-Enhanced Atomic Layer Deposition. Tzou AJ; Chu KH; Lin IF; Østreng E; Fang YS; Wu XP; Wu BW; Shen CH; Shieh JM; Yeh WK; Chang CY; Kuo HC Nanoscale Res Lett; 2017 Dec; 12(1):315. PubMed ID: 28454481 [TBL] [Abstract][Full Text] [Related]
51. Corrosion Resistance of Atomic Layer Deposition-Generated Amorphous Thin Films. Anderson MD; Aitchison B; Johnson DC ACS Appl Mater Interfaces; 2016 Nov; 8(44):30644-30648. PubMed ID: 27749042 [TBL] [Abstract][Full Text] [Related]
52. Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer deposition. Shih HY; Lin MC; Chen LY; Chen MJ Nanotechnology; 2015 Jan; 26(1):014002. PubMed ID: 25494474 [TBL] [Abstract][Full Text] [Related]
53. Plasma-enhanced atomic layer deposition of nanoscale yttria-stabilized zirconia electrolyte for solid oxide fuel cells with porous substrate. Ji S; Cho GY; Yu W; Su PC; Lee MH; Cha SW ACS Appl Mater Interfaces; 2015 Feb; 7(5):2998-3002. PubMed ID: 25625537 [TBL] [Abstract][Full Text] [Related]
54. Integrating AlN with GdN Thin Films in an in Situ CVD Process: Influence on the Oxidation and Crystallinity of GdN. Cwik S; Beer SMJ; Hoffmann S; Krasnopolski M; Rogalla D; Becker HW; Peeters D; Ney A; Devi A ACS Appl Mater Interfaces; 2017 Aug; 9(32):27036-27044. PubMed ID: 28782941 [TBL] [Abstract][Full Text] [Related]
55. Silicide-induced multi-wall carbon nanotube growth on silicon nanowires. Lee JH; Lund IN; Eisenbraun ET; Geer RE Nanotechnology; 2011 Feb; 22(8):085603. PubMed ID: 21242615 [TBL] [Abstract][Full Text] [Related]
56. AlN PEALD with TMA and forming gas: study of plasma reaction mechanisms. Miao M; Cadien K RSC Adv; 2021 Mar; 11(20):12235-12248. PubMed ID: 35423742 [TBL] [Abstract][Full Text] [Related]
57. Thermally evaporated SiO thin films as a versatile interlayer for plasma-based OLED passivation. Yun WM; Jang J; Nam S; Kim LH; Seo SJ; Park CE ACS Appl Mater Interfaces; 2012 Jun; 4(6):3247-53. PubMed ID: 22646486 [TBL] [Abstract][Full Text] [Related]
58. Characteristics of Cobalt Thin Films Deposited by Very High Frequency Plasma Enhanced Atomic Layer Deposition (60 and 100 MHz) Using Cobaltocene (Co(Cp)₂)/NH₃. Yeom WG; Song CH; Cho CH; You SJ; Yeom GY J Nanosci Nanotechnol; 2021 Mar; 21(3):1826-1832. PubMed ID: 33404456 [TBL] [Abstract][Full Text] [Related]
59. Integrated silicon nitride electro-optic modulators with atomic layer deposited overlays. Hermans A; Van Daele M; Dendooven J; Clemmen S; Detavernier C; Baets R Opt Lett; 2019 Mar; 44(5):1112-1115. PubMed ID: 30821783 [TBL] [Abstract][Full Text] [Related]
60. Biocompatible Co-organic Composite Thin Film Deposited by VHF Plasma-Enhanced Atomic Layer Deposition at a Low Temperature. Yeom WK; Lee JW; Bae JA; Sung DI; Kim T; Lee JH; Yeom GY ACS Omega; 2024 Aug; 9(31):33735-33742. PubMed ID: 39130588 [TBL] [Abstract][Full Text] [Related] [Previous] [Next] [New Search]