127 related articles for article (PubMed ID: 27877504)
1. Hydrogen plasma treatment of very thin p-type nanocrystalline Si films grown by RF-PECVD in the presence of B(CH
Filonovich SA; Águas H; Busani T; Vicente A; Araújo A; Gaspar D; Vilarigues M; Leitão J; Fortunato E; Martins R
Sci Technol Adv Mater; 2012 Aug; 13(4):045004. PubMed ID: 27877504
[TBL] [Abstract][Full Text] [Related]
2. Role of trimethylboron to silane ratio on the properties of p-type nanocrystalline silicon thin film deposited by radio frequency plasma enhanced chemical vapour deposition.
Aguas H; Filonovich SA; Bernacka-Wojcik I; Fortunato E; Martins R
J Nanosci Nanotechnol; 2010 Apr; 10(4):2547-51. PubMed ID: 20355460
[TBL] [Abstract][Full Text] [Related]
3. Enhanced performance of flexible nanocrystalline silicon thin-film solar cells using seed layers with high hydrogen dilution.
Lee JE; Kim D; Yoon KH; Cho JS
J Nanosci Nanotechnol; 2013 Dec; 13(12):7891-4. PubMed ID: 24266159
[TBL] [Abstract][Full Text] [Related]
4. A novel method to make boron-doped microcrystalline silicon thin films with optimal crystalline volume fraction for thin films solar cell applications.
Shin C; Park J; Kim S; Park H; Jung J; Bong S; Lee YJ; Yi J
J Nanosci Nanotechnol; 2014 Dec; 14(12):9388-94. PubMed ID: 25971071
[TBL] [Abstract][Full Text] [Related]
5. Role of SiN
Wang FH; Kuo HH; Yang CF; Liu MC
Materials (Basel); 2014 Feb; 7(2):948-962. PubMed ID: 28788494
[TBL] [Abstract][Full Text] [Related]
6. High pressure growth of nanocrystalline silicon films.
Kumar S; Gope J; Kumar A; Parashar A; Rauthan CM; Dixit PN
J Nanosci Nanotechnol; 2008 Aug; 8(8):4211-7. PubMed ID: 19049205
[TBL] [Abstract][Full Text] [Related]
7. Improved amorphous/crystalline silicon interface passivation for heterojunction solar cells by low-temperature chemical vapor deposition and post-annealing treatment.
Wang F; Zhang X; Wang L; Jiang Y; Wei C; Xu S; Zhao Y
Phys Chem Chem Phys; 2014 Oct; 16(37):20202-8. PubMed ID: 25138166
[TBL] [Abstract][Full Text] [Related]
8. Effect of Sample Elevation in Radio Frequency Plasma Enhanced Chemical Vapor Deposition (RF PECVD) Reactor on Optical Properties and Deposition Rate of Silicon Nitride Thin Films.
Śmietana M; Mroczyński R; Kwietniewski N
Materials (Basel); 2014 Feb; 7(2):1249-1260. PubMed ID: 28788512
[TBL] [Abstract][Full Text] [Related]
9. Structural evolution of nanocrystalline silicon thin films synthesized in high-density, low-temperature reactive plasmas.
Cheng Q; Xu S; Ostrikov KK
Nanotechnology; 2009 May; 20(21):215606. PubMed ID: 19423937
[TBL] [Abstract][Full Text] [Related]
10. Characterization of intrinsic a-Si:H films prepared by inductively coupled plasma chemical vapor deposition for solar cell applications.
Jeong C; Boo S; Jeon M; Kamisako K
J Nanosci Nanotechnol; 2007 Nov; 7(11):4169-73. PubMed ID: 18047144
[TBL] [Abstract][Full Text] [Related]
11. Investigation of structural disorder using electron temperature in VHF-PECVD on hydrogenated amorphous silicon films for thin film solar cell applications.
Shin C; Park J; Kim S; Jang J; Jung J; Lee YJ; Yi J
J Nanosci Nanotechnol; 2014 Oct; 14(10):8110-6. PubMed ID: 25942934
[TBL] [Abstract][Full Text] [Related]
12.
Adhikari D; Junda MM; Grice CR; Marsillac SX; Collins RW; Podraza NJ
Materials (Basel); 2019 May; 12(10):. PubMed ID: 31130599
[TBL] [Abstract][Full Text] [Related]
13. Comparative Study on the Quality of Microcrystalline and Epitaxial Silicon Films Produced by PECVD Using Identical SiF
Moreno M; Ponce A; Galindo A; Ortega E; Morales A; Flores J; Ambrosio R; Torres A; Hernandez L; Vazquez-Leal H; Patriarche G; Cabarrocas PRI
Materials (Basel); 2021 Nov; 14(22):. PubMed ID: 34832349
[TBL] [Abstract][Full Text] [Related]
14. Study of nanocrystalline silicon films synthesized Below 100 degrees C by catalytic chemical vapor deposition.
Song TH; Keum KS; Hong WS
J Nanosci Nanotechnol; 2013 Nov; 13(11):7519-23. PubMed ID: 24245284
[TBL] [Abstract][Full Text] [Related]
15. Stress and crystallization of plasma enhanced chemical vapour deposition nanocrystalline silicon films.
Milne SB; Fu YQ; Luo JK; Flewitt AJ; Pisana S; Fasoli A; Milne WI
J Nanosci Nanotechnol; 2008 May; 8(5):2693-8. PubMed ID: 18572710
[TBL] [Abstract][Full Text] [Related]
16. Improvement of Electrical Properties of Carbon Nanowall by the Deposition of Thin Film.
Park JK; Kang H; Kim JH; Choi W
J Nanosci Nanotechnol; 2018 Sep; 18(9):6026-6028. PubMed ID: 29677738
[TBL] [Abstract][Full Text] [Related]
17. Microstructure and properties of silicon-incorporated DLC film fabricated using HMDS gas and RF-PECVD process.
Song BJ; Song WJ; Han JH; Kim KR; Yoon SJ; Kim TG; Kim JK; Cho H; Kim GH; Hwang DY; Kim HS
J Nanosci Nanotechnol; 2014 Dec; 14(12):9124-30. PubMed ID: 25971022
[TBL] [Abstract][Full Text] [Related]
18. Characterising a Custom-Built Radio Frequency PECVD Reactor to Vary the Mechanical Properties of TMDSO Films.
Radjef R; Jarvis KL; Hall C; Ang A; Fox BL; McArthur SL
Molecules; 2021 Sep; 26(18):. PubMed ID: 34577090
[TBL] [Abstract][Full Text] [Related]
19. Crystallization of amorphous silicon thin films deposited by PECVD on nickel-metalized porous silicon.
Ben Slama S; Hajji M; Ezzaouia H
Nanoscale Res Lett; 2012 Aug; 7(1):464. PubMed ID: 22901341
[TBL] [Abstract][Full Text] [Related]
20. Unravelling a simple method for the low temperature synthesis of silicon nanocrystals and monolithic nanocrystalline thin films.
Kim KH; Johnson EV; Kazanskii AG; Khenkin MV; Roca I Cabarrocas P
Sci Rep; 2017 Jan; 7():40553. PubMed ID: 28091562
[TBL] [Abstract][Full Text] [Related]
[Next] [New Search]