These tools will no longer be maintained as of December 31, 2024. Archived website can be found here. PubMed4Hh GitHub repository can be found here. Contact NLM Customer Service if you have questions.


BIOMARKERS

Molecular Biopsy of Human Tumors

- a resource for Precision Medicine *

167 related articles for article (PubMed ID: 27934166)

  • 1. Selective Deposition of Dielectrics: Limits and Advantages of Alkanethiol Blocking Agents on Metal-Dielectric Patterns.
    Minaye Hashemi FS; Birchansky BR; Bent SF
    ACS Appl Mater Interfaces; 2016 Dec; 8(48):33264-33272. PubMed ID: 27934166
    [TBL] [Abstract][Full Text] [Related]  

  • 2. Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide.
    Sampson MD; Emery JD; Pellin MJ; Martinson ABF
    ACS Appl Mater Interfaces; 2017 Oct; 9(39):33429-33436. PubMed ID: 28379011
    [TBL] [Abstract][Full Text] [Related]  

  • 3. Self-Correcting Process for High Quality Patterning by Atomic Layer Deposition.
    Minaye Hashemi FS; Prasittichai C; Bent SF
    ACS Nano; 2015 Sep; 9(9):8710-7. PubMed ID: 26181140
    [TBL] [Abstract][Full Text] [Related]  

  • 4. Real-time observation of atomic layer deposition inhibition: metal oxide growth on self-assembled alkanethiols.
    Avila JR; DeMarco EJ; Emery JD; Farha OK; Pellin MJ; Hupp JT; Martinson AB
    ACS Appl Mater Interfaces; 2014 Aug; 6(15):11891-8. PubMed ID: 25046585
    [TBL] [Abstract][Full Text] [Related]  

  • 5. Surface Initiated Polymer Thin Films for the Area Selective Deposition and Etching of Metal Oxides.
    Pattison TG; Hess AE; Arellano N; Lanzillo N; Nguyen S; Bui H; Rettner C; Truong H; Friz A; Topuria T; Fong A; Hughes B; Tek AT; DeSilva A; Miller RD; Qiao GG; Wojtecki RJ
    ACS Nano; 2020 Apr; 14(4):4276-4288. PubMed ID: 32167284
    [TBL] [Abstract][Full Text] [Related]  

  • 6. Preparation of high quality electrical insulator self-assembled monolayers on gold. Experimental investigation of the conduction mechanism through organic thin films.
    Maisch S; Buckel F; Effenberger F
    J Am Chem Soc; 2005 Dec; 127(49):17315-22. PubMed ID: 16332081
    [TBL] [Abstract][Full Text] [Related]  

  • 7. Selective atomic layer deposition of metal oxide thin films on patterned self-assembled monolayers formed by microcontact printing.
    Lee BH; Sung MM
    J Nanosci Nanotechnol; 2007 Nov; 7(11):3758-64. PubMed ID: 18047053
    [TBL] [Abstract][Full Text] [Related]  

  • 8. Area-Selective ALD of Ru on Nanometer-Scale Cu Lines through Dimerization of Amino-Functionalized Alkoxy Silane Passivation Films.
    Zyulkov I; Madhiwala V; Voronina E; Snelgrove M; Bogan J; O'Connor R; De Gendt S; Armini S
    ACS Appl Mater Interfaces; 2020 Jan; 12(4):4678-4688. PubMed ID: 31913003
    [TBL] [Abstract][Full Text] [Related]  

  • 9. Area selective molecular layer deposition of polyurea films.
    Prasittichai C; Zhou H; Bent SF
    ACS Appl Mater Interfaces; 2013 Dec; 5(24):13391-6. PubMed ID: 24229350
    [TBL] [Abstract][Full Text] [Related]  

  • 10. Fifteen Nanometer Resolved Patterns in Selective Area Atomic Layer Deposition-Defectivity Reduction by Monolayer Design.
    Wojtecki R; Mettry M; Fine Nathel NF; Friz A; De Silva A; Arellano N; Shobha H
    ACS Appl Mater Interfaces; 2018 Nov; 10(44):38630-38637. PubMed ID: 30335930
    [TBL] [Abstract][Full Text] [Related]  

  • 11. Copper-metal deposition on self assembled monolayer for making top contacts in molecular electronic devices.
    Seitz O; Dai M; Aguirre-Tostado FS; Wallace RM; Chabal YJ
    J Am Chem Soc; 2009 Dec; 131(50):18159-67. PubMed ID: 19924992
    [TBL] [Abstract][Full Text] [Related]  

  • 12. Seeding atomic layer deposition of high-k dielectrics on epitaxial graphene with organic self-assembled monolayers.
    Alaboson JM; Wang QH; Emery JD; Lipson AL; Bedzyk MJ; Elam JW; Pellin MJ; Hersam MC
    ACS Nano; 2011 Jun; 5(6):5223-32. PubMed ID: 21553842
    [TBL] [Abstract][Full Text] [Related]  

  • 13. Patterned Growth of Organic Semiconductors: Selective Nucleation of Perylene on Self-Assembled Monolayers.
    Pick A; Witte G
    Langmuir; 2016 Aug; 32(32):8019-28. PubMed ID: 27441921
    [TBL] [Abstract][Full Text] [Related]  

  • 14. Area-selective atomic layer deposition of lead sulfide: nanoscale patterning and DFT simulations.
    Lee W; Dasgupta NP; Trejo O; Lee JR; Hwang J; Usui T; Prinz FB
    Langmuir; 2010 May; 26(9):6845-52. PubMed ID: 20099790
    [TBL] [Abstract][Full Text] [Related]  

  • 15. Characterizing Self-Assembled Monolayer Breakdown in Area-Selective Atomic Layer Deposition.
    Liu TL; Zeng L; Nardi KL; Hausmann DM; Bent SF
    Langmuir; 2021 Oct; 37(39):11637-11645. PubMed ID: 34550696
    [TBL] [Abstract][Full Text] [Related]  

  • 16. Improving area-selective molecular layer deposition by selective SAM removal.
    Prasittichai C; Pickrahn KL; Hashemi FS; Bergsman DS; Bent SF
    ACS Appl Mater Interfaces; 2014 Oct; 6(20):17831-6. PubMed ID: 25290370
    [TBL] [Abstract][Full Text] [Related]  

  • 17. Electrochemical factors controlling the patterning of metals on SAM-coated substrates.
    Nelson JB; Schwartz DT
    Langmuir; 2007 Sep; 23(19):9661-6. PubMed ID: 17637069
    [TBL] [Abstract][Full Text] [Related]  

  • 18. Effect of Multilayer versus Monolayer Dodecanethiol on Selectivity and Pattern Integrity in Area-Selective Atomic Layer Deposition.
    Liu TL; Nardi KL; Draeger N; Hausmann DM; Bent SF
    ACS Appl Mater Interfaces; 2020 Sep; 12(37):42226-42235. PubMed ID: 32805867
    [TBL] [Abstract][Full Text] [Related]  

  • 19. Self-assembled monolayers of alkanethiols on InAs.
    Petrovykh DY; Smith JC; Clark TD; Stine R; Baker LA; Whitman LJ
    Langmuir; 2009 Oct; 25(20):12185-94. PubMed ID: 19778053
    [TBL] [Abstract][Full Text] [Related]  

  • 20. Toward molecular electronic circuitry: selective deposition of metals on patterned self-assembled monolayer surfaces.
    Zhou C; Nagy G; Walker AV
    J Am Chem Soc; 2005 Sep; 127(35):12160-1. PubMed ID: 16131159
    [TBL] [Abstract][Full Text] [Related]  

    [Next]    [New Search]
    of 9.