199 related articles for article (PubMed ID: 28158061)
1. Structure and extreme ultraviolet performance of Si/C multilayers deposited under different working pressures.
Yi Q; Huang Q; Wang X; Yang Y; Yang X; Zhang Z; Wang Z; Xu R; Peng T; Zhou H; Huo T
Appl Opt; 2017 Feb; 56(4):C145-C150. PubMed ID: 28158061
[TBL] [Abstract][Full Text] [Related]
2. Comparative Study on Microstructure of Mo/Si Multilayers Deposited on Large Curved Mirror with and without the Shadow Mask.
Liu X; Zhang Z; Song H; Huang Q; Huo T; Zhou H; Qi R; Zhang Z; Wang Z
Micromachines (Basel); 2023 Feb; 14(3):. PubMed ID: 36984933
[TBL] [Abstract][Full Text] [Related]
3. Analysis of buried interfaces in multilayer mirrors using grazing incidence extreme ultraviolet reflectometry near resonance edges.
Sertsu MG; Nardello M; Giglia A; Corso AJ; Maurizio C; Juschkin L; Nicolosi P
Appl Opt; 2015 Dec; 54(35):10351-8. PubMed ID: 26836858
[TBL] [Abstract][Full Text] [Related]
4. Performance of Co/Ti multilayers in a water window soft x-ray regime.
Sarkar P; Biswas A; De R; Divakar Rao K; Ghosh S; Modi MH; John S; Barshilia HC; Bhattacharyya D; Sahoo NK
Appl Opt; 2017 Sep; 56(27):7525-7532. PubMed ID: 29047727
[TBL] [Abstract][Full Text] [Related]
5. Terbium-based extreme ultraviolet multilayers.
Windt DL; Seely JF; Kjornrattanawanich B; Uspenskii YA
Opt Lett; 2005 Dec; 30(23):3186-8. PubMed ID: 16342715
[TBL] [Abstract][Full Text] [Related]
6. Interface modification of Cr/Ti multilayers with C barrier layer for enhanced reflectivity in the water window regime.
Sarkar P; Biswas A; Abharana N; Rai S; Modi MH; Bhattacharyya D
J Synchrotron Radiat; 2021 Jan; 28(Pt 1):224-230. PubMed ID: 33399572
[TBL] [Abstract][Full Text] [Related]
7. Effect of separating layer thickness on W/Si multilayer replication.
Wang F; Mu B; Jin H; Yang X; Zhu J; Wang Z
Opt Express; 2011 Aug; 19(17):15929-36. PubMed ID: 21934956
[TBL] [Abstract][Full Text] [Related]
8. Influence of barrier interlayers on the performance of Mo/Be multilayer mirrors for next-generation EUV lithography.
Svechnikov MV; Chkhalo NI; Gusev SA; Nechay AN; Pariev DE; Pestov AE; Polkovnikov VN; Tatarskiy DA; Salashchenko NN; Schäfers F; Sertsu MG; Sokolov A; Vainer YA; Zorina MV
Opt Express; 2018 Dec; 26(26):33718-33731. PubMed ID: 30650805
[TBL] [Abstract][Full Text] [Related]
9. Design, fabrication, and analysis of chirped multilayer mirrors for reflection of extreme-ultraviolet attosecond pulses.
Wonisch A; Neuhäusler U; Kabachnik NM; Uphues T; Uiberacker M; Yakovlev V; Krausz F; Drescher M; Kleineberg U; Heinzmann U
Appl Opt; 2006 Jun; 45(17):4147-56. PubMed ID: 16761058
[TBL] [Abstract][Full Text] [Related]
10. Extreme-ultraviolet-induced oxidation of Mo/Si multilayers.
Benoit N; Schröder S; Yulin S; Feigl T; Duparré A; Kaiser N; Tünnermann A
Appl Opt; 2008 Jul; 47(19):3455-62. PubMed ID: 18594592
[TBL] [Abstract][Full Text] [Related]
11. La/B(4)C multilayer mirrors with an additional wavelength suppression.
Naujok P; Yulin S; Bianco A; Mahne N; Kaiser N; Tünnermann A
Opt Express; 2015 Feb; 23(4):4289-95. PubMed ID: 25836465
[TBL] [Abstract][Full Text] [Related]
12. Combined EUV reflectance and X-ray reflectivity data analysis of periodic multilayer structures.
Yakunin SN; Makhotkin IA; Nikolaev KV; van de Kruijs RW; Chuev MA; Bijkerk F
Opt Express; 2014 Aug; 22(17):20076-86. PubMed ID: 25321217
[TBL] [Abstract][Full Text] [Related]
13. Enhancement of soft X-ray reflectivity and interface stability in nitridated Pd/Y multilayer mirrors.
Xu D; Huang Q; Wang Y; Li P; Wen M; Jonnard P; Giglia A; Kozhevnikov IV; Wang K; Zhang Z; Wang Z
Opt Express; 2015 Dec; 23(26):33018-26. PubMed ID: 26831970
[TBL] [Abstract][Full Text] [Related]
14. [Characteristics of extreme ultraviolet emission from tin plasma using CO2 laser for lithography].
Wu T; Wang XB; Wang SY; Lu PX
Guang Pu Xue Yu Guang Pu Fen Xi; 2012 Jul; 32(7):1729-33. PubMed ID: 23016313
[TBL] [Abstract][Full Text] [Related]
15. Mo/Si and Mo/Be multilayer thin films on Zerodur substrates for extreme-ultraviolet lithography.
Mirkarimi PB; Bajt S; Wall MA
Appl Opt; 2000 Apr; 39(10):1617-25. PubMed ID: 18345060
[TBL] [Abstract][Full Text] [Related]
16. Effect of background pressure on Co/C multilayers.
Wen M; Ma S; Huang Q; Jiang L; Li P; Zhang Z; Wang Z; Wang D; Cui M
Appl Opt; 2017 Feb; 56(4):C16-C20. PubMed ID: 28158045
[TBL] [Abstract][Full Text] [Related]
17. High-reflection Mo/Be/Si multilayers for EUV lithography.
Chkhalo NI; Gusev SA; Nechay AN; Pariev DE; Polkovnikov VN; Salashchenko NN; Schäfers F; Sertsu MG; Sokolov A; Svechnikov MV; Tatarsky DA
Opt Lett; 2017 Dec; 42(24):5070-5073. PubMed ID: 29240139
[TBL] [Abstract][Full Text] [Related]
18. Iridium/silicon multilayers for extreme ultraviolet applications in the 20-35 nm wavelength range.
Zuppella P; Monaco G; Corso AJ; Nicolosi P; Windt DL; Bello V; Mattei G; Pelizzo MG
Opt Lett; 2011 Apr; 36(7):1203-5. PubMed ID: 21479030
[TBL] [Abstract][Full Text] [Related]
19. Design of multilayer extreme-ultraviolet mirrors for enhanced reflectivity.
Singh M; Braat JJ
Appl Opt; 2000 May; 39(13):2189-97. PubMed ID: 18345125
[TBL] [Abstract][Full Text] [Related]
20. Extreme-ultraviolet Mo/Si multilayer mirrors deposited by radio-frequency-magnetron sputtering.
Montcalm C; Sullivan BT; Pépin H; Dobrowolski JA; Sutton M
Appl Opt; 1994 Apr; 33(10):2057-68. PubMed ID: 20885544
[TBL] [Abstract][Full Text] [Related]
[Next] [New Search]