These tools will no longer be maintained as of December 31, 2024. Archived website can be found here. PubMed4Hh GitHub repository can be found here. Contact NLM Customer Service if you have questions.


BIOMARKERS

Molecular Biopsy of Human Tumors

- a resource for Precision Medicine *

484 related articles for article (PubMed ID: 28178839)

  • 1. Substrate selectivity in the low temperature atomic layer deposition of cobalt metal films from bis(1,4-di-tert-butyl-1,3-diazadienyl)cobalt and formic acid.
    Kerrigan MM; Klesko JP; Rupich SM; Dezelah CL; Kanjolia RK; Chabal YJ; Winter CH
    J Chem Phys; 2017 Feb; 146(5):052813. PubMed ID: 28178839
    [TBL] [Abstract][Full Text] [Related]  

  • 2. Low Temperature, Selective Atomic Layer Deposition of Nickel Metal Thin Films.
    Kerrigan MM; Klesko JP; Blakeney KJ; Winter CH
    ACS Appl Mater Interfaces; 2018 Apr; 10(16):14200-14208. PubMed ID: 29630338
    [TBL] [Abstract][Full Text] [Related]  

  • 3. Atomic Interdiffusion and Diffusive Stabilization of Cobalt by Copper During Atomic Layer Deposition from Bis(N-tert-butyl-N'-ethylpropionamidinato) Cobalt(II).
    Elko-Hansen TD; Dolocan A; Ekerdt JG
    J Phys Chem Lett; 2014 Apr; 5(7):1091-5. PubMed ID: 26274454
    [TBL] [Abstract][Full Text] [Related]  

  • 4. Cobalt(III) diazabutadiene precursors for metal deposition: nanoparticle and thin film growth.
    Pugh T; Cosham SD; Hamilton JA; Kingsley AJ; Johnson AL
    Inorg Chem; 2013 Dec; 52(23):13719-29. PubMed ID: 24236689
    [TBL] [Abstract][Full Text] [Related]  

  • 5. Atomic Layer Deposition of Ru Thin Films Using a New Beta-Diketonate Ru Precursor and NH3 Plasma as a Reactant.
    Jung JH; Lee SJ; Lee HJ; Lee MY; Cheon T; Bae SI; Saito M; Suzuki K; Nabeya S; Lee J; Kim S; Yeom S; Seo JH; Kim SH
    J Nanosci Nanotechnol; 2015 Nov; 15(11):8472-7. PubMed ID: 26726537
    [TBL] [Abstract][Full Text] [Related]  

  • 6. Tailoring precursors for deposition: synthesis, structure, and thermal studies of cyclopentadienylcopper(i) isocyanide complexes.
    Willcocks AM; Pugh T; Cosham SD; Hamilton J; Sung SL; Heil T; Chalker PR; Williams PA; Kociok-Köhn G; Johnson AL
    Inorg Chem; 2015 May; 54(10):4869-81. PubMed ID: 25938738
    [TBL] [Abstract][Full Text] [Related]  

  • 7. Atomic layer deposition of tungsten(III) oxide thin films from W2(NMe2)6 and water: precursor-based control of oxidation state in the thin film material.
    Dezelah CL; El-Kadri OM; Szilágyi IM; Campbell JM; Arstila K; Niinistö L; Winter CH
    J Am Chem Soc; 2006 Aug; 128(30):9638-9. PubMed ID: 16866511
    [TBL] [Abstract][Full Text] [Related]  

  • 8. Cobalt(I) Olefin Complexes: Precursors for Metal-Organic Chemical Vapor Deposition of High Purity Cobalt Metal Thin Films.
    Hamilton JA; Pugh T; Johnson AL; Kingsley AJ; Richards SP
    Inorg Chem; 2016 Jul; 55(14):7141-51. PubMed ID: 27348614
    [TBL] [Abstract][Full Text] [Related]  

  • 9. Selective Growth of Interface Layers from Reactions of Sc(MeCp)
    Rahman R; Klesko JP; Dangerfield A; Mattson EC; Chabal YJ
    ACS Appl Mater Interfaces; 2018 Sep; 10(38):32818-32827. PubMed ID: 30211529
    [TBL] [Abstract][Full Text] [Related]  

  • 10. Structural, Optical, and Electronic Properties of Cu-Doped TiN
    Baron FA; Mikhlin YL; Molokeev MS; Rautskiy MV; Tarasov IA; Volochaev MN; Shanidze LV; Lukyanenko AV; Smolyarova TE; Konovalov SO; Zelenov FV; Tarasov AS; Volkov NV
    ACS Appl Mater Interfaces; 2021 Jul; 13(27):32531-32541. PubMed ID: 34181393
    [TBL] [Abstract][Full Text] [Related]  

  • 11. Low-Temperature Atomic Layer Deposition of Highly Conformal Tin Nitride Thin Films for Energy Storage Devices.
    Ansari MZ; Nandi DK; Janicek P; Ansari SA; Ramesh R; Cheon T; Shong B; Kim SH
    ACS Appl Mater Interfaces; 2019 Nov; 11(46):43608-43621. PubMed ID: 31633331
    [TBL] [Abstract][Full Text] [Related]  

  • 12. Rhenium Metal and Rhenium Nitride Thin Films Grown by Atomic Layer Deposition.
    Hämäläinen J; Mizohata K; Meinander K; Mattinen M; Vehkamäki M; Räisänen J; Ritala M; Leskelä M
    Angew Chem Int Ed Engl; 2018 Oct; 57(44):14538-14542. PubMed ID: 30048031
    [TBL] [Abstract][Full Text] [Related]  

  • 13. Thermal atomic layer deposition of Er
    Jayakodiarachchi N; Liu R; Dharmadasa CD; Hu X; Savage DE; Ward CL; Evans PG; Winter CH
    Dalton Trans; 2023 Aug; 52(32):11096-11103. PubMed ID: 37531167
    [TBL] [Abstract][Full Text] [Related]  

  • 14. Improving the electrical properties of lanthanum silicate films on ge metal oxide semiconductor capacitors by adopting interfacial barrier and capping layers.
    Choi YJ; Lim H; Lee S; Suh S; Kim JR; Jung HS; Park S; Lee JH; Kim SG; Hwang CS; Kim H
    ACS Appl Mater Interfaces; 2014 May; 6(10):7885-94. PubMed ID: 24780393
    [TBL] [Abstract][Full Text] [Related]  

  • 15. Thermal atomic layer deposition of rhenium nitride and rhenium metal thin films using methyltrioxorhenium.
    Cwik S; Woods KN; Perera SS; Saly MJ; Knisley TJ; Winter CH
    Dalton Trans; 2021 Dec; 50(48):18202-18211. PubMed ID: 34860223
    [TBL] [Abstract][Full Text] [Related]  

  • 16. CVD of pure copper films from novel iso-ureate complexes.
    Willcocks AM; Pugh T; Hamilton JA; Johnson AL; Richards SP; Kingsley AJ
    Dalton Trans; 2013 Apr; 42(15):5554-65. PubMed ID: 23425976
    [TBL] [Abstract][Full Text] [Related]  

  • 17. The Properties of Cu Thin Films on Ru Depending on the ALD Temperature.
    Yoon HC; Shin JH; Park HS; Suh SJ
    J Nanosci Nanotechnol; 2015 Feb; 15(2):1601-4. PubMed ID: 26353698
    [TBL] [Abstract][Full Text] [Related]  

  • 18. Carrier properties of B atomic-layer-doped Si films grown by ECR Ar plasma-enhanced CVD without substrate heating.
    Sakuraba M; Sugawara K; Nosaka T; Akima H; Sato S
    Sci Technol Adv Mater; 2017; 18(1):294-306. PubMed ID: 28567175
    [TBL] [Abstract][Full Text] [Related]  

  • 19. Growth characteristics of Ti-based fumaric acid hybrid thin films by molecular layer deposition.
    Cao YQ; Zhu L; Li X; Cao ZY; Wu D; Li AD
    Dalton Trans; 2015 Sep; 44(33):14782-92. PubMed ID: 26219386
    [TBL] [Abstract][Full Text] [Related]  

  • 20. High density nonmagnetic cobalt in thin films.
    Banu N; Singh S; Basu S; Roy A; Movva HCP; Lauter V; Satpati B; Dev BN
    Nanotechnology; 2018 May; 29(19):195703. PubMed ID: 29461256
    [TBL] [Abstract][Full Text] [Related]  

    [Next]    [New Search]
    of 25.