These tools will no longer be maintained as of December 31, 2024. Archived website can be found here. PubMed4Hh GitHub repository can be found here. Contact NLM Customer Service if you have questions.
159 related articles for article (PubMed ID: 28374684)
1. Thermal scanning probe lithography for the directed self-assembly of block copolymers. Gottlieb S; Lorenzoni M; Evangelio L; Fernández-Regúlez M; Ryu YK; Rawlings C; Spieser M; Knoll AW; Perez-Murano F Nanotechnology; 2017 Apr; 28(17):175301. PubMed ID: 28374684 [TBL] [Abstract][Full Text] [Related]
2. Role of Penetrability into a Brush-Coated Surface in Directed Self-Assembly of Block Copolymers. Evangelio L; Fernández-Regúlez M; Fraxedas J; Müller M; Pérez-Murano F ACS Appl Mater Interfaces; 2019 Jan; 11(3):3571-3581. PubMed ID: 30592206 [TBL] [Abstract][Full Text] [Related]
3. Nano-confinement of block copolymers in high accuracy topographical guiding patterns: modelling the emergence of defectivity due to incommensurability. Gottlieb S; Kazazis D; Mochi I; Evangelio L; Fernández-Regúlez M; Ekinci Y; Perez-Murano F Soft Matter; 2018 Sep; 14(33):6799-6808. PubMed ID: 29998277 [TBL] [Abstract][Full Text] [Related]
4. Negative-tone block copolymer lithography by in situ surface chemical modification. Kim BH; Byeon KJ; Kim JY; Kim J; Jin HM; Cho JY; Jeong SJ; Shin J; Lee H; Kim SO Small; 2014 Oct; 10(20):4207-12. PubMed ID: 24912807 [TBL] [Abstract][Full Text] [Related]
5. Path to Move Beyond the Resolution Limit with Directed Self-Assembly. Wan L; Ruiz R ACS Appl Mater Interfaces; 2019 Jun; 11(22):20333-20340. PubMed ID: 31074615 [TBL] [Abstract][Full Text] [Related]
7. Orientation Control in Thin Films of a High-χ Block Copolymer with a Surface Active Embedded Neutral Layer. Zhang J; Clark MB; Wu C; Li M; Trefonas P; Hustad PD Nano Lett; 2016 Jan; 16(1):728-35. PubMed ID: 26682931 [TBL] [Abstract][Full Text] [Related]
8. Effect of Entrapped Solvent on the Evolution of Lateral Order in Self-Assembled P(S-r-MMA)/PS-b-PMMA Systems with Different Thicknesses. Giammaria TJ; Ferrarese Lupi F; Seguini G; Sparnacci K; Antonioli D; Gianotti V; Laus M; Perego M ACS Appl Mater Interfaces; 2017 Sep; 9(37):31215-31223. PubMed ID: 28195457 [TBL] [Abstract][Full Text] [Related]
9. Sub-10 nm resistless nanolithography for directed self-assembly of block copolymers. Fernández-Regúlez M; Evangelio L; Lorenzoni M; Fraxedas J; Pérez-Murano F ACS Appl Mater Interfaces; 2014 Dec; 6(23):21596-602. PubMed ID: 25360636 [TBL] [Abstract][Full Text] [Related]
10. Directed Self-Assembly of Polystyrene-b-poly(propylene carbonate) on Chemical Patterns via Thermal Annealing for Next Generation Lithography. Yang GW; Wu GP; Chen X; Xiong S; Arges CG; Ji S; Nealey PF; Lu XB; Darensbourg DJ; Xu ZK Nano Lett; 2017 Feb; 17(2):1233-1239. PubMed ID: 28068100 [TBL] [Abstract][Full Text] [Related]
11. Directed Self-Assembly on Photo-Crosslinked Polystyrene Sub-Layers: Nanopattern Uniformity and Orientation. Koh HD; Kim MJ Materials (Basel); 2016 Aug; 9(8):. PubMed ID: 28773768 [TBL] [Abstract][Full Text] [Related]
13. Perpendicular Orientation Control without Interfacial Treatment of RAFT-Synthesized High-χ Block Copolymer Thin Films with Sub-10 nm Features Prepared via Thermal Annealing. Nakatani R; Takano H; Chandra A; Yoshimura Y; Wang L; Suzuki Y; Tanaka Y; Maeda R; Kihara N; Minegishi S; Miyagi K; Kasahara Y; Sato H; Seino Y; Azuma T; Yokoyama H; Ober CK; Hayakawa T ACS Appl Mater Interfaces; 2017 Sep; 9(37):31266-31278. PubMed ID: 28304153 [TBL] [Abstract][Full Text] [Related]
14. Integration of nanoimprint lithography with block copolymer directed self-assembly for fabrication of a sub-20 nm template for bit-patterned media. Yang X; Xiao S; Hu W; Hwu J; van de Veerdonk R; Wago K; Lee K; Kuo D Nanotechnology; 2014 Oct; 25(39):395301. PubMed ID: 25189432 [TBL] [Abstract][Full Text] [Related]