These tools will no longer be maintained as of December 31, 2024. Archived website can be found here. PubMed4Hh GitHub repository can be found here. Contact NLM Customer Service if you have questions.


BIOMARKERS

Molecular Biopsy of Human Tumors

- a resource for Precision Medicine *

113 related articles for article (PubMed ID: 28406498)

  • 1. Atomic layer deposition of Cu(i) oxide films using Cu(ii) bis(dimethylamino-2-propoxide) and water.
    Avila JR; Peters AW; Li Z; Ortuño MA; Martinson ABF; Cramer CJ; Hupp JT; Farha OK
    Dalton Trans; 2017 May; 46(18):5790-5795. PubMed ID: 28406498
    [TBL] [Abstract][Full Text] [Related]  

  • 2. Correction: Atomic layer deposition of Cu(i) oxide films using Cu(ii) bis(dimethylamino-2-propoxide) and water.
    Avila JR; Peters AW; Li Z; Ortuño MA; Martinson ABF; Cramer CJ; Hupp JT; Farha OK
    Dalton Trans; 2017 May; 46(18):6128. PubMed ID: 28452387
    [TBL] [Abstract][Full Text] [Related]  

  • 3. Atomic Layer Deposition of Rhenium-Aluminum Oxide Thin Films and ReO
    Rimoldi M; Hupp JT; Farha OK
    ACS Appl Mater Interfaces; 2017 Oct; 9(40):35067-35074. PubMed ID: 28929746
    [TBL] [Abstract][Full Text] [Related]  

  • 4. Atomic Layer Deposition of Tin Monosulfide Using Vapor from Liquid Bis(
    Kim SB; Zhao X; Davis LM; Jayaraman A; Yang C; Gordon RG
    ACS Appl Mater Interfaces; 2019 Dec; 11(49):45892-45902. PubMed ID: 31722176
    [TBL] [Abstract][Full Text] [Related]  

  • 5. Atomic Layer Deposition of Ultrathin Nickel Sulfide Films and Preliminary Assessment of Their Performance as Hydrogen Evolution Catalysts.
    Çimen Y; Peters AW; Avila JR; Hoffeditz WL; Goswami S; Farha OK; Hupp JT
    Langmuir; 2016 Nov; 32(46):12005-12012. PubMed ID: 27933878
    [TBL] [Abstract][Full Text] [Related]  

  • 6. Atomic Layer Deposition of Photoconductive Cu
    Iivonen T; Heikkilä MJ; Popov G; Nieminen HE; Kaipio M; Kemell M; Mattinen M; Meinander K; Mizohata K; Räisänen J; Ritala M; Leskelä M
    ACS Omega; 2019 Jun; 4(6):11205-11214. PubMed ID: 31460221
    [TBL] [Abstract][Full Text] [Related]  

  • 7. Fabrication of Thin Films of α-Fe2O3 via Atomic Layer Deposition Using Iron Bisamidinate and Water under Mild Growth Conditions.
    Avila JR; Kim DW; Rimoldi M; Farha OK; Hupp JT
    ACS Appl Mater Interfaces; 2015 Aug; 7(30):16138-42. PubMed ID: 26192606
    [TBL] [Abstract][Full Text] [Related]  

  • 8. Trimethylaluminum and Oxygen Atomic Layer Deposition on Hydroxyl-Free Cu(111).
    Gharachorlou A; Detwiler MD; Gu XK; Mayr L; Klötzer B; Greeley J; Reifenberger RG; Delgass WN; Ribeiro FH; Zemlyanov DY
    ACS Appl Mater Interfaces; 2015 Aug; 7(30):16428-39. PubMed ID: 26158796
    [TBL] [Abstract][Full Text] [Related]  

  • 9. Atomic layer etching of Al2O3 using sequential, self-limiting thermal reactions with Sn(acac)2 and hydrogen fluoride.
    Lee Y; George SM
    ACS Nano; 2015 Feb; 9(2):2061-70. PubMed ID: 25604976
    [TBL] [Abstract][Full Text] [Related]  

  • 10. Atomic layer deposition, characterization, and growth mechanistic studies of TiO2 thin films.
    Kaipio M; Blanquart T; Tomczak Y; Niinistö J; Gavagnin M; Longo V; Wanzenböck HD; Pallem VR; Dussarrat C; Puukilainen E; Ritala M; Leskelä M
    Langmuir; 2014 Jul; 30(25):7395-404. PubMed ID: 24896967
    [TBL] [Abstract][Full Text] [Related]  

  • 11. Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy.
    Vandenbroucke SST; Levrau E; Minjauw MM; Van Daele M; Solano E; Vos R; Dendooven J; Detavernier C
    Phys Chem Chem Phys; 2020 May; 22(17):9262-9271. PubMed ID: 32307490
    [TBL] [Abstract][Full Text] [Related]  

  • 12. Atomic/molecular layer deposition of Cu-organic thin films.
    Hagen DJ; Mai L; Devi A; Sainio J; Karppinen M
    Dalton Trans; 2018 Nov; 47(44):15791-15800. PubMed ID: 30357190
    [TBL] [Abstract][Full Text] [Related]  

  • 13. Low-temperature atomic layer deposition of copper metal thin films: self-limiting surface reaction of copper dimethylamino-2-propoxide with diethylzinc.
    Lee BH; Hwang JK; Nam JW; Lee SU; Kim JT; Koo SM; Baunemann A; Fischer RA; Sung MM
    Angew Chem Int Ed Engl; 2009; 48(25):4536-9. PubMed ID: 19444843
    [TBL] [Abstract][Full Text] [Related]  

  • 14. Atomic Interdiffusion and Diffusive Stabilization of Cobalt by Copper During Atomic Layer Deposition from Bis(N-tert-butyl-N'-ethylpropionamidinato) Cobalt(II).
    Elko-Hansen TD; Dolocan A; Ekerdt JG
    J Phys Chem Lett; 2014 Apr; 5(7):1091-5. PubMed ID: 26274454
    [TBL] [Abstract][Full Text] [Related]  

  • 15. Molecular Layer Deposition of a Highly Stable Silicon Oxycarbide Thin Film Using an Organic Chlorosilane and Water.
    Closser RG; Bergsman DS; Bent SF
    ACS Appl Mater Interfaces; 2018 Jul; 10(28):24266-24274. PubMed ID: 29965720
    [TBL] [Abstract][Full Text] [Related]  

  • 16. Substrate selectivity in the low temperature atomic layer deposition of cobalt metal films from bis(1,4-di-tert-butyl-1,3-diazadienyl)cobalt and formic acid.
    Kerrigan MM; Klesko JP; Rupich SM; Dezelah CL; Kanjolia RK; Chabal YJ; Winter CH
    J Chem Phys; 2017 Feb; 146(5):052813. PubMed ID: 28178839
    [TBL] [Abstract][Full Text] [Related]  

  • 17. β-Ketoiminato-based copper(ii) complexes as CVD precursors for copper and copper oxide layer formation.
    Pousaneh E; Korb M; Dzhagan V; Weber M; Noll J; Mehring M; Zahn DRT; Schulz SE; Lang H
    Dalton Trans; 2018 Jul; 47(30):10002-10016. PubMed ID: 29916515
    [TBL] [Abstract][Full Text] [Related]  

  • 18. Low temperature growth of gallium oxide thin films via plasma enhanced atomic layer deposition.
    O'Donoghue R; Rechmann J; Aghaee M; Rogalla D; Becker HW; Creatore M; Wieck AD; Devi A
    Dalton Trans; 2017 Dec; 46(47):16551-16561. PubMed ID: 29160880
    [TBL] [Abstract][Full Text] [Related]  

  • 19. Atomic layer deposited tungsten nitride thin films as a new lithium-ion battery anode.
    Nandi DK; Sen UK; Sinha S; Dhara A; Mitra S; Sarkar SK
    Phys Chem Chem Phys; 2015 Jul; 17(26):17445-53. PubMed ID: 26076771
    [TBL] [Abstract][Full Text] [Related]  

  • 20. Growth and properties of hafnicone and HfO(2)/hafnicone nanolaminate and alloy films using molecular layer deposition techniques.
    Lee BH; Anderson VR; George SM
    ACS Appl Mater Interfaces; 2014 Oct; 6(19):16880-7. PubMed ID: 25203487
    [TBL] [Abstract][Full Text] [Related]  

    [Next]    [New Search]
    of 6.