157 related articles for article (PubMed ID: 28638901)
1. An innovative scheme for sub-50 nm patterning via electrohydrodynamic lithography.
Lee S; Jung S; Jang AR; Hwang J; Shin HS; Lee J; Kang DJ
Nanoscale; 2017 Aug; 9(33):11881-11887. PubMed ID: 28638901
[TBL] [Abstract][Full Text] [Related]
2. Fabrication of an inorganic nano structure for a large area via electrohydrodynamic lithography (EHL).
Kim HN; Lee SO; Kang DJ; Lee JJ
J Nanosci Nanotechnol; 2012 Jul; 12(7):5307-12. PubMed ID: 22966562
[TBL] [Abstract][Full Text] [Related]
3. Multilength Scale Patterning of Functional Layers by Roll-to-Roll Ultraviolet-Light-Assisted Nanoimprint Lithography.
Leitgeb M; Nees D; Ruttloff S; Palfinger U; Götz J; Liska R; Belegratis MR; Stadlober B
ACS Nano; 2016 May; 10(5):4926-41. PubMed ID: 27023664
[TBL] [Abstract][Full Text] [Related]
4. Fabrication of Uniaxially Aligned Silica Nanogrooves with Sub-5 nm Periodicity on Centimeter-Scale Si Substrate Using Poly(dimethylsiloxane) Stamps.
Hirota K; Hara S; Wada H; Shimojima A; Kuroda K
ACS Nano; 2019 Mar; 13(3):2795-2803. PubMed ID: 30626184
[TBL] [Abstract][Full Text] [Related]
5. Nanoscale patterning of organic monolayers by catalytic stamp lithography: scope and limitations.
Mizuno H; Buriak JM
ACS Appl Mater Interfaces; 2009 Dec; 1(12):2711-20. PubMed ID: 20356148
[TBL] [Abstract][Full Text] [Related]
6. Utilization of Resist Stencil Lithography for Multidimensional Fabrication on a Curved Surface.
Cai H; Meng Q; Ding H; Zhang K; Lin Y; Ren W; Yu X; Wu Y; Zhang G; Li M; Pan N; Qi Z; Tian Y; Luo Y; Wang X
ACS Nano; 2018 Sep; 12(9):9626-9632. PubMed ID: 30189134
[TBL] [Abstract][Full Text] [Related]
7. Fabrication of sub-20 nm patterns using dopamine chemistry in self-aligned double patterning.
Li Y; Choi J; Sun Z; Russell TP; Carter KR
Nanoscale; 2018 Nov; 10(44):20779-20784. PubMed ID: 30402646
[TBL] [Abstract][Full Text] [Related]
8. Stamp design effect on 100 nm feature size for 8 inch NanoImprint lithography.
Landis S; Chaix N; Gourgon C; Perret C; Leveder T
Nanotechnology; 2006 May; 17(10):2701-9. PubMed ID: 21727527
[TBL] [Abstract][Full Text] [Related]
9. Universal Nanopatterning Technique Combining Secondary Sputtering with Nanoscale Electroplating for Fabricating Size-Controllable Ultrahigh-Resolution Nanostructures.
Song TE; Ahn CW; Jeon HJ
Langmuir; 2017 Aug; 33(33):8260-8266. PubMed ID: 28756666
[TBL] [Abstract][Full Text] [Related]
10. Dissolvable Template Nanoimprint Lithography: A Facile and Versatile Nanoscale Replication Technique.
Oh J; Hoffman JB; Hong S; Jo KD; Román-Kustas J; Reed JH; Dana CE; Cropek DM; Alleyne M; Miljkovic N
Nano Lett; 2020 Oct; 20(10):6989-6997. PubMed ID: 32790414
[TBL] [Abstract][Full Text] [Related]
11. Polymer-Pen Chemical Lift-Off Lithography.
Xu X; Yang Q; Cheung KM; Zhao C; Wattanatorn N; Belling JN; Abendroth JM; Slaughter LS; Mirkin CA; Andrews AM; Weiss PS
Nano Lett; 2017 May; 17(5):3302-3311. PubMed ID: 28409640
[TBL] [Abstract][Full Text] [Related]
12. Plasma-assisted filling electron beam lithography for high throughput patterning of large area closed polygon nanostructures.
Tan YS; Liu H; Ruan Q; Wang H; Yang JKW
Nanoscale; 2020 May; 12(19):10584-10591. PubMed ID: 32373857
[TBL] [Abstract][Full Text] [Related]
13. Creating self-organized submicrometer contact instability patterns in soft elastic bilayers with a topographically patterned stamp.
Mukherjee R; Sharma A
ACS Appl Mater Interfaces; 2012 Jan; 4(1):355-62. PubMed ID: 22148714
[TBL] [Abstract][Full Text] [Related]
14. Resist-Free Direct Stamp Imprinting of GaAs via Metal-Assisted Chemical Etching.
Kim K; Ki B; Choi K; Lee S; Oh J
ACS Appl Mater Interfaces; 2019 Apr; 11(14):13574-13580. PubMed ID: 30784266
[TBL] [Abstract][Full Text] [Related]
15. Resists for sub-20-nm electron beam lithography with a focus on HSQ: state of the art.
Grigorescu AE; Hagen CW
Nanotechnology; 2009 Jul; 20(29):292001. PubMed ID: 19567961
[TBL] [Abstract][Full Text] [Related]
16. Versatile pattern generation of periodic, high aspect ratio Si nanostructure arrays with sub-50-nm resolution on a wafer scale.
Ho JW; Wee Q; Dumond J; Tay A; Chua SJ
Nanoscale Res Lett; 2013 Dec; 8(1):506. PubMed ID: 24289275
[TBL] [Abstract][Full Text] [Related]
17. Tunable superapolar Lotus-to-Rose hierarchical nanosurfaces via vertical carbon nanotubes driven electrohydrodynamic lithography.
Busà C; Rickard JJS; Chun E; Chong Y; Navaratnam V; Goldberg Oppenheimer P
Nanoscale; 2017 Jan; 9(4):1625-1636. PubMed ID: 28074956
[TBL] [Abstract][Full Text] [Related]
18. Programmable Nanopatterns by Controlled Debonding of Soft Elastic Films.
Bhandaru N; Sharma A; Mukherjee R
ACS Appl Mater Interfaces; 2017 Jun; 9(23):19409-19416. PubMed ID: 28610425
[TBL] [Abstract][Full Text] [Related]
19. Sub-10 nm feature chromium photomasks for contact lithography patterning of square metal ring arrays.
Park W; Rhie J; Kim NY; Hong S; Kim DS
Sci Rep; 2016 Mar; 6():23823. PubMed ID: 27025277
[TBL] [Abstract][Full Text] [Related]
20. Rapid fabrication of nano-structured quartz stamps.
Chuo Y; Landrock C; Omrane B; Hohertz D; Grayli SV; Kavanagh K; Kaminska B
Nanotechnology; 2013 Feb; 24(5):055304. PubMed ID: 23324651
[TBL] [Abstract][Full Text] [Related]
[Next] [New Search]
