These tools will no longer be maintained as of December 31, 2024. Archived website can be found here. PubMed4Hh GitHub repository can be found here. Contact NLM Customer Service if you have questions.
298 related articles for article (PubMed ID: 28774125)
1. Atomic Layer Deposition of Silicon Nitride Thin Films: A Review of Recent Progress, Challenges, and Outlooks. Meng X; Byun YC; Kim HS; Lee JS; Lucero AT; Cheng L; Kim J Materials (Basel); 2016 Dec; 9(12):. PubMed ID: 28774125 [TBL] [Abstract][Full Text] [Related]
2. Silicon Nitride and Hydrogenated Silicon Nitride Thin Films: A Review of Fabrication Methods and Applications. Hegedüs N; Balázsi K; Balázsi C Materials (Basel); 2021 Sep; 14(19):. PubMed ID: 34640056 [TBL] [Abstract][Full Text] [Related]
3. Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N Faraz T; van Drunen M; Knoops HC; Mallikarjunan A; Buchanan I; Hausmann DM; Henri J; Kessels WM ACS Appl Mater Interfaces; 2017 Jan; 9(2):1858-1869. PubMed ID: 28059494 [TBL] [Abstract][Full Text] [Related]
4. Low-Temperature Conformal Atomic Layer Deposition of SiNx Films Using Si₂Cl₆ and NH₃ Plasma. Ovanesyan RA; Hausmann DM; Agarwal S ACS Appl Mater Interfaces; 2015 May; 7(20):10806-13. PubMed ID: 25927250 [TBL] [Abstract][Full Text] [Related]
5. Low-Temperature Plasma-Assisted Atomic Layer Deposition of Silicon Nitride Moisture Permeation Barrier Layers. Andringa AM; Perrotta A; de Peuter K; Knoops HC; Kessels WM; Creatore M ACS Appl Mater Interfaces; 2015 Oct; 7(40):22525-32. PubMed ID: 26393381 [TBL] [Abstract][Full Text] [Related]
6. Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma. Knoops HC; Braeken EM; de Peuter K; Potts SE; Haukka S; Pore V; Kessels WM ACS Appl Mater Interfaces; 2015 Sep; 7(35):19857-62. PubMed ID: 26305370 [TBL] [Abstract][Full Text] [Related]
7. Plasma-Enhanced Atomic Layer Deposition of SiN-AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid. Kim Y; Provine J; Walch SP; Park J; Phuthong W; Dadlani AL; Kim HJ; Schindler P; Kim K; Prinz FB ACS Appl Mater Interfaces; 2016 Jul; 8(27):17599-605. PubMed ID: 27295338 [TBL] [Abstract][Full Text] [Related]
8. Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies. Faraz T; Knoops HCM; Verheijen MA; van Helvoirt CAA; Karwal S; Sharma A; Beladiya V; Szeghalmi A; Hausmann DM; Henri J; Creatore M; Kessels WMM ACS Appl Mater Interfaces; 2018 Apr; 10(15):13158-13180. PubMed ID: 29554799 [TBL] [Abstract][Full Text] [Related]
9. Role of SiN Wang FH; Kuo HH; Yang CF; Liu MC Materials (Basel); 2014 Feb; 7(2):948-962. PubMed ID: 28788494 [TBL] [Abstract][Full Text] [Related]
10. Structural, Optical and Electrical Properties of HfO Kim KM; Jang JS; Yoon SG; Yun JY; Chung NK Materials (Basel); 2020 Apr; 13(9):. PubMed ID: 32344793 [TBL] [Abstract][Full Text] [Related]
11. Effect of reaction mechanism on precursor exposure time in atomic layer deposition of silicon oxide and silicon nitride. Murray CA; Elliott SD; Hausmann D; Henri J; LaVoie A ACS Appl Mater Interfaces; 2014 Jul; 6(13):10534-41. PubMed ID: 24915469 [TBL] [Abstract][Full Text] [Related]
12. Liquid atomic layer deposition as emergent technology for the fabrication of thin films. Graniel O; Puigmartí-Luis J; Muñoz-Rojas D Dalton Trans; 2021 May; 50(19):6373-6381. PubMed ID: 34002750 [TBL] [Abstract][Full Text] [Related]
13. Role of Surface Termination in Atomic Layer Deposition of Silicon Nitride. Ande CK; Knoops HC; de Peuter K; van Drunen M; Elliott SD; Kessels WM J Phys Chem Lett; 2015 Sep; 6(18):3610-4. PubMed ID: 26722730 [TBL] [Abstract][Full Text] [Related]
14. Plasma-Enhanced Atomic Layer Deposition of Silicon Nitride Using a Novel Silylamine Precursor. Park JM; Jang SJ; Yusup LL; Lee WJ; Lee SI ACS Appl Mater Interfaces; 2016 Aug; 8(32):20865-71. PubMed ID: 27447839 [TBL] [Abstract][Full Text] [Related]
15. Atomic layer deposition on dental materials: Processing conditions and surface functionalization to improve physical, chemical, and clinical properties - A review. Hashemi Astaneh S; Faverani LP; Sukotjo C; Takoudis CG Acta Biomater; 2021 Feb; 121():103-118. PubMed ID: 33227485 [TBL] [Abstract][Full Text] [Related]
16. Low-Temperature Atomic Layer Deposition of Highly Conformal Tin Nitride Thin Films for Energy Storage Devices. Ansari MZ; Nandi DK; Janicek P; Ansari SA; Ramesh R; Cheon T; Shong B; Kim SH ACS Appl Mater Interfaces; 2019 Nov; 11(46):43608-43621. PubMed ID: 31633331 [TBL] [Abstract][Full Text] [Related]
17. Plasma Enhanced Atomic Layer Deposition of Silicon Nitride for Two Different Aminosilane Precursors Using Very High Frequency (162 MHz) Plasma Source. Ji YJ; Kim HI; Choi SY; Kang JE; Ellingboe AR; Chandra H; Lee CW; Yeom GY ACS Appl Mater Interfaces; 2023 Jun; 15(23):28763-28771. PubMed ID: 37269552 [TBL] [Abstract][Full Text] [Related]
18. Investigation on the passivated Si/Al2O3 interface fabricated by non-vacuum spatial atomic layer deposition system. Lien SY; Yang CH; Wu KC; Kung CY Nanoscale Res Lett; 2015; 10():93. PubMed ID: 25852389 [TBL] [Abstract][Full Text] [Related]
19. The Applications of Ultra-Thin Nanofilm for Aerospace Advanced Manufacturing Technology. Xie G; Bai H; Miao G; Feng G; Yang J; He Y; Li X; Li Y Nanomaterials (Basel); 2021 Dec; 11(12):. PubMed ID: 34947631 [TBL] [Abstract][Full Text] [Related]
20. Plasma-Assisted Nanofabrication: The Potential and Challenges in Atomic Layer Deposition and Etching. Chiappim W; Neto BB; Shiotani M; Karnopp J; Gonçalves L; Chaves JP; Sobrinho ADS; Leitão JP; Fraga M; Pessoa R Nanomaterials (Basel); 2022 Oct; 12(19):. PubMed ID: 36234624 [TBL] [Abstract][Full Text] [Related] [Next] [New Search]