215 related articles for article (PubMed ID: 28825413)
1. Phosphorene-directed self-assembly of asymmetric PS-b-PMMA block copolymer for perpendicularly-oriented sub-10 nm PS nanopore arrays.
Zhang Z; Zheng L; Khurram M; Yan Q
Nanotechnology; 2017 Oct; 28(42):424001. PubMed ID: 28825413
[TBL] [Abstract][Full Text] [Related]
2. Molecular Tailoring of Poly(styrene-
Woo S; Jo S; Ryu DY; Choi SH; Choe Y; Khan A; Huh J; Bang J
ACS Macro Lett; 2017 Dec; 6(12):1386-1391. PubMed ID: 35650801
[TBL] [Abstract][Full Text] [Related]
3. Orientation Control in Thin Films of a High-χ Block Copolymer with a Surface Active Embedded Neutral Layer.
Zhang J; Clark MB; Wu C; Li M; Trefonas P; Hustad PD
Nano Lett; 2016 Jan; 16(1):728-35. PubMed ID: 26682931
[TBL] [Abstract][Full Text] [Related]
4. The effect of random copolymer on the characteristic dimensions of cylinder-forming PS-b-PMMA thin films.
Andreozzi A; Poliani E; Seguini G; Perego M
Nanotechnology; 2011 May; 22(18):185304. PubMed ID: 21415473
[TBL] [Abstract][Full Text] [Related]
5. Irreversible Physisorption of PS-
Lee W; Kim Y; Jo S; Park S; Ahn H; Ryu DY
ACS Macro Lett; 2019 May; 8(5):519-524. PubMed ID: 35619361
[TBL] [Abstract][Full Text] [Related]
6. Neutral wetting brush layers for block copolymer thin films using homopolymer blends processed at high temperatures.
Ceresoli M; Palermo M; Ferrarese Lupi F; Seguini G; Perego M; Zuccheri G; Phadatare SD; Antonioli D; Gianotti V; Sparnacci K; Laus M
Nanotechnology; 2015 Oct; 26(41):415603. PubMed ID: 26404164
[TBL] [Abstract][Full Text] [Related]
7. Surface Assembly Configurations and Packing Preferences of Fibrinogen Mediated by the Periodicity and Alignment Control of Block Copolymer Nanodomains.
Xie T; Vora A; Mulcahey PJ; Nanescu SE; Singh M; Choi DS; Huang JK; Liu CC; Sanders DP; Hahm JI
ACS Nano; 2016 Aug; 10(8):7705-20. PubMed ID: 27462904
[TBL] [Abstract][Full Text] [Related]
8. Ultrathin random copolymer-grafted layers for block copolymer self-assembly.
Sparnacci K; Antonioli D; Gianotti V; Laus M; Lupi FF; Giammaria TJ; Seguini G; Perego M
ACS Appl Mater Interfaces; 2015 May; 7(20):10944-51. PubMed ID: 25954979
[TBL] [Abstract][Full Text] [Related]
9. Perpendicular Orientation Control without Interfacial Treatment of RAFT-Synthesized High-χ Block Copolymer Thin Films with Sub-10 nm Features Prepared via Thermal Annealing.
Nakatani R; Takano H; Chandra A; Yoshimura Y; Wang L; Suzuki Y; Tanaka Y; Maeda R; Kihara N; Minegishi S; Miyagi K; Kasahara Y; Sato H; Seino Y; Azuma T; Yokoyama H; Ober CK; Hayakawa T
ACS Appl Mater Interfaces; 2017 Sep; 9(37):31266-31278. PubMed ID: 28304153
[TBL] [Abstract][Full Text] [Related]
10. Resist free patterning of nonpreferential buffer layers for block copolymer lithography.
Han E; Leolukman M; Kim M; Gopalan P
ACS Nano; 2010 Nov; 4(11):6527-34. PubMed ID: 20958012
[TBL] [Abstract][Full Text] [Related]
11. Enhanced Lateral Ordering in Cylinder Forming PS-b-PMMA Block Copolymers Exploiting the Entrapped Solvent.
Seguini G; Zanenga F; Giammaria TJ; Ceresoli M; Sparnacci K; Antonioli D; Gianotti V; Laus M; Perego M
ACS Appl Mater Interfaces; 2016 Mar; 8(12):8280-8. PubMed ID: 26959626
[TBL] [Abstract][Full Text] [Related]
12. Collective behavior of block copolymer thin films within periodic topographical structures.
Perego M; Andreozzi A; Vellei A; Ferrarese Lupi F; Seguini G
Nanotechnology; 2013 Jun; 24(24):245301. PubMed ID: 23680847
[TBL] [Abstract][Full Text] [Related]
13. The One-Pot Directed Assembly of Cylinder-Forming Block Copolymer on Adjacent Chemical Patterns for Bimodal Patterning.
Chang TH; Xiong S; Liu CC; Liu D; Nealey PF; Ma Z
Macromol Rapid Commun; 2017 Sep; 38(18):. PubMed ID: 28749034
[TBL] [Abstract][Full Text] [Related]
14. Thickness and Microdomain Orientation of Asymmetric PS-b-PMMA Block Copolymer Films Inside Periodic Gratings.
Ferrarese Lupi F; Aprile G; Giammaria TJ; Seguini G; Zuccheri G; De Leo N; Boarino L; Laus M; Perego M
ACS Appl Mater Interfaces; 2015 Oct; 7(42):23615-22. PubMed ID: 26439144
[TBL] [Abstract][Full Text] [Related]
15. Carbohydrate-based block copolymer systems: directed self-assembly for nanolithography applications.
Otsuka I; Nilsson N; Suyatin DB; Maximov I; Borsali R
Soft Matter; 2017 Oct; 13(40):7406-7411. PubMed ID: 28959807
[TBL] [Abstract][Full Text] [Related]
16. Solvothermal Vapor Annealing of Lamellar Poly(styrene)-block-poly(d,l-lactide) Block Copolymer Thin Films for Directed Self-Assembly Application.
Cummins C; Mokarian-Tabari P; Andreazza P; Sinturel C; Morris MA
ACS Appl Mater Interfaces; 2016 Mar; 8(12):8295-304. PubMed ID: 26950246
[TBL] [Abstract][Full Text] [Related]
17. Shear-Rolling Process for Unidirectionally and Perpendicularly Oriented Sub-10-nm Block Copolymer Patterns on the 4 in Scale.
Oh J; Shin M; Kim IS; Suh HS; Kim Y; Kim JK; Bang J; Yeom B; Son JG
ACS Nano; 2021 May; 15(5):8549-8558. PubMed ID: 33979144
[TBL] [Abstract][Full Text] [Related]
18. Focused solar annealing for block copolymer fast self-assembly.
Hu XH; Zhang R; Zhang X; Wu Z; Zhou J; Li W; Xiong S
Heliyon; 2024 Jan; 10(2):e24016. PubMed ID: 38293481
[TBL] [Abstract][Full Text] [Related]
19. Spatial arrangement of block copolymer nanopatterns using a photoactive homopolymer substrate.
Jiang Z; Alam MM; Cheng HH; Blakey I; Whittaker AK
Nanoscale Adv; 2019 Aug; 1(8):3078-3085. PubMed ID: 36133582
[TBL] [Abstract][Full Text] [Related]
20. Tuning polymer-surface chemistries and interfacial interactions with UV irradiated polystyrene chains to control domain orientations in thin films of PS-b-PMMA.
Sun YS; Wang CT; Liou JY
Soft Matter; 2016 Mar; 12(11):2923-31. PubMed ID: 26890311
[TBL] [Abstract][Full Text] [Related]
[Next] [New Search]