215 related articles for article (PubMed ID: 28825413)
21. Effects of the Density of Chemical Cross-links and Physical Entanglements of Ultraviolet-Irradiated Polystyrene Chains on Domain Orientation and Spatial Order of Polystyrene-
Yang WC; Wu SH; Chen YF; Nelson A; Wu CM; Sun YS
Langmuir; 2019 Oct; 35(43):14017-14030. PubMed ID: 31577149
[TBL] [Abstract][Full Text] [Related]
22. Aligned silicon nanofins via the directed self-assembly of PS-b-P4VP block copolymer and metal oxide enhanced pattern transfer.
Cummins C; Gangnaik A; Kelly RA; Borah D; O'Connell J; Petkov N; Georgiev YM; Holmes JD; Morris MA
Nanoscale; 2015 Apr; 7(15):6712-21. PubMed ID: 25798892
[TBL] [Abstract][Full Text] [Related]
23. Thermally induced self-assembly of cylindrical nanodomains in low molecular weight PS-b-PMMA thin films.
Seguini G; Giammaria TJ; Lupi FF; Sparnacci K; Antonioli D; Gianotti V; Vita F; Placentino IF; Hilhorst J; Ferrero C; Francescangeli O; Laus M; Perego M
Nanotechnology; 2014 Jan; 25(4):045301. PubMed ID: 24394198
[TBL] [Abstract][Full Text] [Related]
24. Orienting block copolymer microdomains with block copolymer brushes.
Gu W; Hong SW; Russell TP
ACS Nano; 2012 Nov; 6(11):10250-7. PubMed ID: 23092357
[TBL] [Abstract][Full Text] [Related]
25. Perpendicularly Oriented Block Copolymer Thin Films Induced by Neutral Star Copolymer Nanoparticles.
Kim S; Yoo M; Baettig J; Kang EH; Koo J; Choe Y; Choi TL; Khan A; Son JG; Bang J
ACS Macro Lett; 2015 Jan; 4(1):133-137. PubMed ID: 35596386
[TBL] [Abstract][Full Text] [Related]
26. Three-dimensional multilayered nanostructures with controlled orientation of microdomains from cross-linkable block copolymers.
Jung H; Hwang D; Kim E; Kim BJ; Lee WB; Poelma JE; Kim J; Hawker CJ; Huh J; Ryu du Y; Bang J
ACS Nano; 2011 Aug; 5(8):6164-73. PubMed ID: 21749153
[TBL] [Abstract][Full Text] [Related]
27. Orientation Control of Block Copolymers Using Surface Active, Phase-Preferential Additives.
Vora A; Schmidt K; Alva G; Arellano N; Magbitang T; Chunder A; Thompson LE; Lofano E; Pitera JW; Cheng JY; Sanders DP
ACS Appl Mater Interfaces; 2016 Nov; 8(43):29808-29817. PubMed ID: 27700028
[TBL] [Abstract][Full Text] [Related]
28. Hierarchical Order in Dewetted Block Copolymer Thin Films on Chemically Patterned Surfaces.
Ferrarese Lupi F; Giammaria TJ; Miti A; Zuccheri G; Carignano S; Sparnacci K; Seguini G; De Leo N; Boarino L; Perego M; Laus M
ACS Nano; 2018 Jul; 12(7):7076-7085. PubMed ID: 29952543
[TBL] [Abstract][Full Text] [Related]
29. High aspect ratio PS-b-PMMA block copolymer masks for lithographic applications.
Ferrarese Lupi F; Giammaria TJ; Volpe FG; Lotto F; Seguini G; Pivac B; Laus M; Perego M
ACS Appl Mater Interfaces; 2014 Dec; 6(23):21389-96. PubMed ID: 25387131
[TBL] [Abstract][Full Text] [Related]
30. Directed Block Copolymer Assembly versus Electron Beam Lithography for Bit-Patterned Media with Areal Density of 1 Terabit/inch(2) and Beyond.
Yang X; Wan L; Xiao S; Xu Y; Weller DK
ACS Nano; 2009 Jul; 3(7):1844-58. PubMed ID: 19572736
[TBL] [Abstract][Full Text] [Related]
31. Molecularly functionalized silicon substrates for orientation control of the microphase separation of PS-b-PMMA and PS-b-PDMS block copolymer systems.
Borah D; Ozmen M; Rasappa S; Shaw MT; Holmes JD; Morris MA
Langmuir; 2013 Mar; 29(9):2809-20. PubMed ID: 23363319
[TBL] [Abstract][Full Text] [Related]
32. High-throughput preparation of complex multi-scale patterns from block copolymer/homopolymer blend films.
Park H; Kim JU; Park S
Nanoscale; 2012 Feb; 4(4):1362-7. PubMed ID: 22241398
[TBL] [Abstract][Full Text] [Related]
33. Directed Self-Assembly of Polystyrene-b-poly(propylene carbonate) on Chemical Patterns via Thermal Annealing for Next Generation Lithography.
Yang GW; Wu GP; Chen X; Xiong S; Arges CG; Ji S; Nealey PF; Lu XB; Darensbourg DJ; Xu ZK
Nano Lett; 2017 Feb; 17(2):1233-1239. PubMed ID: 28068100
[TBL] [Abstract][Full Text] [Related]
34. The sensitivity of random polymer brush-lamellar polystyrene-b-polymethylmethacrylate block copolymer systems to process conditions.
Borah D; Rasappa S; Senthamaraikannan R; Shaw MT; Holmes JD; Morris MA
J Colloid Interface Sci; 2013 Mar; 393():192-202. PubMed ID: 23218235
[TBL] [Abstract][Full Text] [Related]
35. Sub-10-nm patterning via directed self-assembly of block copolymer films with a vapour-phase deposited topcoat.
Suh HS; Kim DH; Moni P; Xiong S; Ocola LE; Zaluzec NJ; Gleason KK; Nealey PF
Nat Nanotechnol; 2017 Jul; 12(6):575-581. PubMed ID: 28346456
[TBL] [Abstract][Full Text] [Related]
36. Reduction of Line Edge Roughness of Polystyrene-block-Poly(methyl methacrylate) Copolymer Nanopatterns By Introducing Hydrogen Bonding at the Junction Point of Two Block Chains.
Lee KS; Lee J; Kwak J; Moon HC; Kim JK
ACS Appl Mater Interfaces; 2017 Sep; 9(37):31245-31251. PubMed ID: 28218827
[TBL] [Abstract][Full Text] [Related]
37. High-Fidelity, Sub-5 nm Patterns from High-χ Block Copolymer Films with Vapor-Deposited Ultrathin, Cross-Linked Surface-Modification Layers.
Wang HS; Oh S; Choi J; Jang W; Kim KH; Arellano CL; Huh J; Bang J; Im SG
Macromol Rapid Commun; 2020 Feb; 41(4):e1900514. PubMed ID: 31958190
[TBL] [Abstract][Full Text] [Related]
38. Effect of Entrapped Solvent on the Evolution of Lateral Order in Self-Assembled P(S-r-MMA)/PS-b-PMMA Systems with Different Thicknesses.
Giammaria TJ; Ferrarese Lupi F; Seguini G; Sparnacci K; Antonioli D; Gianotti V; Laus M; Perego M
ACS Appl Mater Interfaces; 2017 Sep; 9(37):31215-31223. PubMed ID: 28195457
[TBL] [Abstract][Full Text] [Related]
39. Microdomain orientation dependence on thickness in thin films of cylinder-forming PS-b-PMMA.
Zucchi IA; Poliani E; Perego M
Nanotechnology; 2010 May; 21(18):185304. PubMed ID: 20378951
[TBL] [Abstract][Full Text] [Related]
40. Effects of block copolymer self-assembly on optical anisotropy in azobenzene-containing PS-b-PMMA films.
Orofino AB; Camezzana MF; Galante MJ; Oyanguren PA; Zucchi IA
Nanotechnology; 2012 Mar; 23(11):115604. PubMed ID: 22370564
[TBL] [Abstract][Full Text] [Related]
[Previous] [Next] [New Search]
