These tools will no longer be maintained as of December 31, 2024. Archived website can be found here. PubMed4Hh GitHub repository can be found here. Contact NLM Customer Service if you have questions.


BIOMARKERS

Molecular Biopsy of Human Tumors

- a resource for Precision Medicine *

154 related articles for article (PubMed ID: 28850774)

  • 1. Area-Selective Atomic Layer Deposition of SiO
    Mameli A; Merkx MJM; Karasulu B; Roozeboom F; Kessels WEMM; Mackus AJM
    ACS Nano; 2017 Sep; 11(9):9303-9311. PubMed ID: 28850774
    [TBL] [Abstract][Full Text] [Related]  

  • 2. Area-Selective Atomic Layer Deposition of Two-Dimensional WS
    Balasubramanyam S; Merkx MJM; Verheijen MA; Kessels WMM; Mackus AJM; Bol AA
    ACS Mater Lett; 2020 May; 2(5):511-518. PubMed ID: 32421046
    [TBL] [Abstract][Full Text] [Related]  

  • 3. Unfolding an Elusive Area-Selective Deposition Process: Atomic Layer Deposition of TiO
    Mameli A; Tapily K; Shen J; Roozeboom F; Lu M; O'Meara D; Semproni SP; Chen JR; Clark R; Leusink G; Clendenning S
    ACS Appl Mater Interfaces; 2024 Mar; 16(11):14288-14295. PubMed ID: 38442210
    [TBL] [Abstract][Full Text] [Related]  

  • 4. Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation.
    Singh JA; Thissen NFW; Kim WH; Johnson H; Kessels WMM; Bol AA; Bent SF; Mackus AJM
    Chem Mater; 2018 Feb; 30(3):663-670. PubMed ID: 29503508
    [TBL] [Abstract][Full Text] [Related]  

  • 5. Area-Selective Atomic Layer Deposition of ZnO on Si\SiO
    Moeini B; Avval TG; Brongersma HH; Průša S; Bábík P; Vaníčková E; Strohmeier BR; Bell DS; Eggett D; George SM; Linford MR
    Materials (Basel); 2023 Jun; 16(13):. PubMed ID: 37445002
    [TBL] [Abstract][Full Text] [Related]  

  • 6. Self-aligned patterning of tantalum oxide on Cu/SiO
    Li Y; Qi Z; Lan Y; Cao K; Wen Y; Zhang J; Gu E; Long J; Yan J; Shan B; Chen R
    Nat Commun; 2023 Jul; 14(1):4493. PubMed ID: 37495604
    [TBL] [Abstract][Full Text] [Related]  

  • 7. Selective Growth of Interface Layers from Reactions of Sc(MeCp)
    Rahman R; Klesko JP; Dangerfield A; Mattson EC; Chabal YJ
    ACS Appl Mater Interfaces; 2018 Sep; 10(38):32818-32827. PubMed ID: 30211529
    [TBL] [Abstract][Full Text] [Related]  

  • 8. Inherent area-selective atomic layer deposition of ZnS.
    Zhang C; Vehkamäki M; Leskelä M; Ritala M
    Dalton Trans; 2023 Jul; 52(28):9622-9630. PubMed ID: 37377382
    [TBL] [Abstract][Full Text] [Related]  

  • 9. Stepwise mechanism and H2O-assisted hydrolysis in atomic layer deposition of SiO2 without a catalyst.
    Fang GY; Xu LN; Wang LG; Cao YQ; Wu D; Li AD
    Nanoscale Res Lett; 2015; 10():68. PubMed ID: 25897298
    [TBL] [Abstract][Full Text] [Related]  

  • 10. First-principles study of the surface reactions of aminosilane precursors over WO
    Lee K; Shim Y
    RSC Adv; 2020 Apr; 10(28):16584-16592. PubMed ID: 35692616
    [TBL] [Abstract][Full Text] [Related]  

  • 11. Area-Selective Deposition by Cyclic Adsorption and Removal of 1-Nitropropane.
    Yarbrough J; Bent SF
    J Phys Chem A; 2023 Sep; 127(37):7858-7868. PubMed ID: 37683085
    [TBL] [Abstract][Full Text] [Related]  

  • 12. Functionalization of the SiO
    Xu W; Haeve MGN; Lemaire PC; Sharma K; Hausmann DM; Agarwal S
    Langmuir; 2022 Jan; 38(2):652-660. PubMed ID: 34990131
    [TBL] [Abstract][Full Text] [Related]  

  • 13. Surface Diffusion Control Enables Tailored-Aspect-Ratio Nanostructures in Area-Selective Atomic Layer Deposition.
    Klement P; Anders D; Gümbel L; Bastianello M; Michel F; Schörmann J; Elm MT; Heiliger C; Chatterjee S
    ACS Appl Mater Interfaces; 2021 Apr; 13(16):19398-19405. PubMed ID: 33856210
    [TBL] [Abstract][Full Text] [Related]  

  • 14. High-Throughput Area-Selective Spatial Atomic Layer Deposition of SiO
    Karasulu B; Roozeboom F; Mameli A
    Adv Mater; 2023 Jun; 35(25):e2301204. PubMed ID: 37043671
    [TBL] [Abstract][Full Text] [Related]  

  • 15. Understanding inherent substrate selectivity during atomic layer deposition: Effect of surface preparation, hydroxyl density, and metal oxide composition on nucleation mechanisms during tungsten ALD.
    Lemaire PC; King M; Parsons GN
    J Chem Phys; 2017 Feb; 146(5):052811. PubMed ID: 28178812
    [TBL] [Abstract][Full Text] [Related]  

  • 16. Self-catalysis by aminosilanes and strong surface oxidation by O2 plasma in plasma-enhanced atomic layer deposition of high-quality SiO2.
    Fang GY; Xu LN; Cao YQ; Wang LG; Wu D; Li AD
    Chem Commun (Camb); 2015 Jan; 51(7):1341-4. PubMed ID: 25485760
    [TBL] [Abstract][Full Text] [Related]  

  • 17. Area-Selective ALD of Ru on Nanometer-Scale Cu Lines through Dimerization of Amino-Functionalized Alkoxy Silane Passivation Films.
    Zyulkov I; Madhiwala V; Voronina E; Snelgrove M; Bogan J; O'Connor R; De Gendt S; Armini S
    ACS Appl Mater Interfaces; 2020 Jan; 12(4):4678-4688. PubMed ID: 31913003
    [TBL] [Abstract][Full Text] [Related]  

  • 18. Area-Selective Atomic Layer Deposition of TiN Using Trimethoxy(octadecyl)silane as a Passivation Layer.
    Zheng L; He W; Spampinato V; Franquet A; Sergeant S; Gendt S; Armini S
    Langmuir; 2020 Nov; 36(44):13144-13154. PubMed ID: 33104359
    [TBL] [Abstract][Full Text] [Related]  

  • 19. Machine learning-based exploration of molecular design descriptors for area-selective atomic layer deposition (AS-ALD) precursors.
    Ngoc Van TT; Kim C; Lee H; Kim J; Shong B
    J Mol Model; 2023 Dec; 30(1):10. PubMed ID: 38093140
    [TBL] [Abstract][Full Text] [Related]  

  • 20. Self-Correcting Process for High Quality Patterning by Atomic Layer Deposition.
    Minaye Hashemi FS; Prasittichai C; Bent SF
    ACS Nano; 2015 Sep; 9(9):8710-7. PubMed ID: 26181140
    [TBL] [Abstract][Full Text] [Related]  

    [Next]    [New Search]
    of 8.