These tools will no longer be maintained as of December 31, 2024. Archived website can be found here. PubMed4Hh GitHub repository can be found here. Contact NLM Customer Service if you have questions.


BIOMARKERS

Molecular Biopsy of Human Tumors

- a resource for Precision Medicine *

147 related articles for article (PubMed ID: 28895558)

  • 1. Combination photo and electron beam lithography with polymethyl methacrylate (PMMA) resist.
    Carbaugh DJ; Pandya SG; Wright JT; Kaya S; Rahman F
    Nanotechnology; 2017 Nov; 28(45):455301. PubMed ID: 28895558
    [TBL] [Abstract][Full Text] [Related]  

  • 2. Using low-contrast negative-tone PMMA at cryogenic temperatures for 3D electron beam lithography.
    Schnauber P; Schmidt R; Kaganskiy A; Heuser T; Gschrey M; Rodt S; Reitzenstein S
    Nanotechnology; 2016 May; 27(19):195301. PubMed ID: 27023850
    [TBL] [Abstract][Full Text] [Related]  

  • 3. Resists for sub-20-nm electron beam lithography with a focus on HSQ: state of the art.
    Grigorescu AE; Hagen CW
    Nanotechnology; 2009 Jul; 20(29):292001. PubMed ID: 19567961
    [TBL] [Abstract][Full Text] [Related]  

  • 4. Preparing patterned carbonaceous nanostructures directly by overexposure of PMMA using electron-beam lithography.
    Duan H; Zhao J; Zhang Y; Xie E; Han L
    Nanotechnology; 2009 Apr; 20(13):135306. PubMed ID: 19420497
    [TBL] [Abstract][Full Text] [Related]  

  • 5. Study of a chemically amplified resist for X-ray lithography by Fourier transform infrared spectroscopy.
    Tan TL; Wong D; Lee P; Rawat RS; Patran A
    Appl Spectrosc; 2004 Nov; 58(11):1288-94. PubMed ID: 18070406
    [TBL] [Abstract][Full Text] [Related]  

  • 6. Single Layer Surface-Grafted PMMA as a Negative-Tone e-Beam Resist.
    Yamada H; Aydinoglu F; Liu Y; Dey RK; Cui B
    Langmuir; 2017 Dec; 33(48):13790-13796. PubMed ID: 29131642
    [TBL] [Abstract][Full Text] [Related]  

  • 7. Development of Nickel-Based Negative Tone Metal Oxide Cluster Resists for Sub-10 nm Electron Beam and Helium Ion Beam Lithography.
    Kumar R; Chauhan M; Moinuddin MG; Sharma SK; Gonsalves KE
    ACS Appl Mater Interfaces; 2020 Apr; 12(17):19616-19624. PubMed ID: 32267144
    [TBL] [Abstract][Full Text] [Related]  

  • 8. Development characteristics of polymethyl methacrylate in alcohol/water mixtures: a lithography and Raman spectroscopy study.
    Ocola LE; Costales M; Gosztola DJ
    Nanotechnology; 2016 Jan; 27(3):035302. PubMed ID: 26656030
    [TBL] [Abstract][Full Text] [Related]  

  • 9. Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography.
    Rananavare SB; Morakinyo MK
    J Vis Exp; 2017 Feb; (120):. PubMed ID: 28287523
    [TBL] [Abstract][Full Text] [Related]  

  • 10. Vapor-Phase Nanopatterning of Aminosilanes with Electron Beam Lithography: Understanding and Minimizing Background Functionalization.
    Fetterly CR; Olsen BC; Luber EJ; Buriak JM
    Langmuir; 2018 Apr; 34(16):4780-4792. PubMed ID: 29614858
    [TBL] [Abstract][Full Text] [Related]  

  • 11. Aberration-Corrected Electron Beam Lithography at the One Nanometer Length Scale.
    Manfrinato VR; Stein A; Zhang L; Nam CY; Yager KG; Stach EA; Black CT
    Nano Lett; 2017 Aug; 17(8):4562-4567. PubMed ID: 28418673
    [TBL] [Abstract][Full Text] [Related]  

  • 12. Line edge roughness after development in a positive-tone chemically amplified resist of post-optical lithography investigated by Monte Carlo simulation and a dissolution model.
    Saeki A; Kozawa T; Tagawa S; Cao HB; Deng H; Leeson MJ
    Nanotechnology; 2008 Jan; 19(1):015705. PubMed ID: 21730546
    [TBL] [Abstract][Full Text] [Related]  

  • 13. Self-organization of random copolymers to nanopatterns by localized e-beam dosing.
    Pandey A; Maity S; Murmu K; Middya S; Bandyopadhyay D; Gooh Pattader PS
    Nanotechnology; 2021 Apr; 32(28):. PubMed ID: 33761481
    [TBL] [Abstract][Full Text] [Related]  

  • 14. A high resolution water soluble fullerene molecular resist for electron beam lithography.
    Chen X; Palmer RE; Robinson AP
    Nanotechnology; 2008 Jul; 19(27):275308. PubMed ID: 21828704
    [TBL] [Abstract][Full Text] [Related]  

  • 15. mr-EBL: ultra-high sensitivity negative-tone electron beam resist for highly selective silicon etching and large-scale direct patterning of permanent structures.
    Taal AJ; Rabinowitz J; Shepard KL
    Nanotechnology; 2021 Mar; 32(24):. PubMed ID: 33706291
    [TBL] [Abstract][Full Text] [Related]  

  • 16. Manipulation of nanoscale phase separation and optical properties of P3HT/PMMA polymer blends for photoluminescent electron beam resist.
    Wu MC; Liao HC; Chou Y; Hsu CP; Yen WC; Chuang CM; Lin YY; Chen CW; Chen YF; Su WF
    J Phys Chem B; 2010 Aug; 114(32):10277-84. PubMed ID: 20666566
    [TBL] [Abstract][Full Text] [Related]  

  • 17. Molecular Layer Deposition of a Hafnium-Based Hybrid Thin Film as an Electron Beam Resist.
    Shi J; Ravi A; Richey NE; Gong H; Bent SF
    ACS Appl Mater Interfaces; 2022 Jun; ():. PubMed ID: 35653232
    [TBL] [Abstract][Full Text] [Related]  

  • 18. Polystyrene negative resist for high-resolution electron beam lithography.
    Ma S; Con C; Yavuz M; Cui B
    Nanoscale Res Lett; 2011 Jul; 6(1):446. PubMed ID: 21749679
    [TBL] [Abstract][Full Text] [Related]  

  • 19. Phenyl-bridged polysilsesquioxane positive and negative resist for electron beam lithography.
    Brigo L; Auzelyte V; Lister KA; Brugger J; Brusatin G
    Nanotechnology; 2012 Aug; 23(32):325302. PubMed ID: 22825028
    [TBL] [Abstract][Full Text] [Related]  

  • 20. Electron beam lithography with feedback using in situ self-developed resist.
    Dey RK; Cui B
    Nanoscale Res Lett; 2014; 9(1):184. PubMed ID: 24739818
    [TBL] [Abstract][Full Text] [Related]  

    [Next]    [New Search]
    of 8.