These tools will no longer be maintained as of December 31, 2024. Archived website can be found here. PubMed4Hh GitHub repository can be found here. Contact NLM Customer Service if you have questions.


BIOMARKERS

Molecular Biopsy of Human Tumors

- a resource for Precision Medicine *

265 related articles for article (PubMed ID: 29111636)

  • 1. Reaction Mechanism of Area-Selective Atomic Layer Deposition for Al
    Seo S; Yeo BC; Han SS; Yoon CM; Yang JY; Yoon J; Yoo C; Kim HJ; Lee YB; Lee SJ; Myoung JM; Lee HB; Kim WH; Oh IK; Kim H
    ACS Appl Mater Interfaces; 2017 Nov; 9(47):41607-41617. PubMed ID: 29111636
    [TBL] [Abstract][Full Text] [Related]  

  • 2. Growth and Characterization of Al2O3 Atomic Layer Deposition Films on sp(2)-Graphitic Carbon Substrates Using NO2/Trimethylaluminum Pretreatment.
    Young MJ; Musgrave CB; George SM
    ACS Appl Mater Interfaces; 2015 Jun; 7(22):12030-7. PubMed ID: 25965097
    [TBL] [Abstract][Full Text] [Related]  

  • 3. Characterizing Self-Assembled Monolayer Breakdown in Area-Selective Atomic Layer Deposition.
    Liu TL; Zeng L; Nardi KL; Hausmann DM; Bent SF
    Langmuir; 2021 Oct; 37(39):11637-11645. PubMed ID: 34550696
    [TBL] [Abstract][Full Text] [Related]  

  • 4. Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide.
    Sampson MD; Emery JD; Pellin MJ; Martinson ABF
    ACS Appl Mater Interfaces; 2017 Oct; 9(39):33429-33436. PubMed ID: 28379011
    [TBL] [Abstract][Full Text] [Related]  

  • 5. Trimethylaluminum and Oxygen Atomic Layer Deposition on Hydroxyl-Free Cu(111).
    Gharachorlou A; Detwiler MD; Gu XK; Mayr L; Klötzer B; Greeley J; Reifenberger RG; Delgass WN; Ribeiro FH; Zemlyanov DY
    ACS Appl Mater Interfaces; 2015 Aug; 7(30):16428-39. PubMed ID: 26158796
    [TBL] [Abstract][Full Text] [Related]  

  • 6. Atomic layer deposition of aluminum oxide on carboxylic acid-terminated self-assembled monolayers.
    Li M; Dai M; Chabal YJ
    Langmuir; 2009 Feb; 25(4):1911-4. PubMed ID: 19140733
    [TBL] [Abstract][Full Text] [Related]  

  • 7. Molecular Mechanism of Selective Al
    Choi Y; Kim HJ; Kim E; Kang H; Park J; Do YR; Kwak K; Cho M
    ACS Appl Mater Interfaces; 2023 Aug; 15(34):41170-41179. PubMed ID: 37561063
    [TBL] [Abstract][Full Text] [Related]  

  • 8. Hydrophobic Surface Treatment and Interrupted Atomic Layer Deposition for Highly Resistive Al
    Jeon JH; Jerng SK; Akbar K; Chun SH
    ACS Appl Mater Interfaces; 2016 Nov; 8(43):29637-29641. PubMed ID: 27735182
    [TBL] [Abstract][Full Text] [Related]  

  • 9. Interface Electrical Properties of Al
    Fisichella G; Schilirò E; Di Franco S; Fiorenza P; Lo Nigro R; Roccaforte F; Ravesi S; Giannazzo F
    ACS Appl Mater Interfaces; 2017 Mar; 9(8):7761-7771. PubMed ID: 28135063
    [TBL] [Abstract][Full Text] [Related]  

  • 10. Self-Correcting Process for High Quality Patterning by Atomic Layer Deposition.
    Minaye Hashemi FS; Prasittichai C; Bent SF
    ACS Nano; 2015 Sep; 9(9):8710-7. PubMed ID: 26181140
    [TBL] [Abstract][Full Text] [Related]  

  • 11. Substrate-Dependent Study of Chain Orientation and Order in Alkylphosphonic Acid Self-Assembled Monolayers for ALD Blocking.
    Bobb-Semple D; Zeng L; Cordova I; Bergsman DS; Nordlund D; Bent SF
    Langmuir; 2020 Nov; 36(43):12849-12857. PubMed ID: 33079543
    [TBL] [Abstract][Full Text] [Related]  

  • 12. Nucleation and growth mechanisms of Al
    Zhang H; Chiappe D; Meersschaut J; Conard T; Franquet A; Nuytten T; Mannarino M; Radu I; Vandervorst W; Delabie A
    J Chem Phys; 2017 Feb; 146(5):052810. PubMed ID: 28178804
    [TBL] [Abstract][Full Text] [Related]  

  • 13. Controlled direct growth of Al2O3-doped HfO2 films on graphene by H2O-based atomic layer deposition.
    Zheng L; Cheng X; Yu Y; Xie Y; Li X; Wang Z
    Phys Chem Chem Phys; 2015 Feb; 17(5):3179-85. PubMed ID: 25519447
    [TBL] [Abstract][Full Text] [Related]  

  • 14. Charge-trapping characteristics of Al2O3/Cu/Al2O3 nanolaminate structures prepared through atomic layer deposition.
    Lee BK; Kim SH; Park BK; Lee SS; Hwang JH; Chung TM; Lee YK; Kim CG; An KS
    J Nanosci Nanotechnol; 2011 Jul; 11(7):5887-91. PubMed ID: 22121626
    [TBL] [Abstract][Full Text] [Related]  

  • 15. Uniform Atomic Layer Deposition of Al
    Vervuurt RH; Karasulu B; Verheijen MA; Kessels WE; Bol AA
    Chem Mater; 2017 Mar; 29(5):2090-2100. PubMed ID: 28405059
    [TBL] [Abstract][Full Text] [Related]  

  • 16. Competition between Al
    DuMont JW; George SM
    J Chem Phys; 2017 Feb; 146(5):052819. PubMed ID: 28178819
    [TBL] [Abstract][Full Text] [Related]  

  • 17. Reaction Temperature and Partial Pressure Induced Etching of Methylammonium Lead Iodide Perovskite by Trimethylaluminum.
    Yu X; Yan H; Peng Q
    Langmuir; 2019 May; 35(20):6522-6531. PubMed ID: 31035746
    [TBL] [Abstract][Full Text] [Related]  

  • 18. Controlling the electronic properties of SWCNT FETs via modification of the substrate surface prior to atomic layer deposition of 10 nm thick Al2O3 film.
    Kim J; Yoon J; Na J; Yee S; Kim GT; Ha JS
    Nanotechnology; 2013 Nov; 24(45):455701. PubMed ID: 24141361
    [TBL] [Abstract][Full Text] [Related]  

  • 19. In-situ synchrotron radiation photoemission spectroscopy study of the initial atomic layer deposition of Al2O3 film on Si(001) substrate.
    Kim SH; Lee BK; Baik J; Jeon C; Lee SS; Lee J; Hwang HN; Hwang CC; Park CY; An KS
    J Nanosci Nanotechnol; 2011 May; 11(5):4328-32. PubMed ID: 21780451
    [TBL] [Abstract][Full Text] [Related]  

  • 20. Initial Growth Study of Atomic-Layer Deposition of Al
    Vandalon V; Kessels WMME
    Langmuir; 2019 Aug; 35(32):10374-10382. PubMed ID: 31310143
    [TBL] [Abstract][Full Text] [Related]  

    [Next]    [New Search]
    of 14.