These tools will no longer be maintained as of December 31, 2024. Archived website can be found here. PubMed4Hh GitHub repository can be found here. Contact NLM Customer Service if you have questions.
256 related articles for article (PubMed ID: 29629742)
1. Morphology and Optical Properties of RF Sputtering Deposited Indium Nitride Layers Under Different N₂/Ar Ratio. Li HZ; Li RP; Liu JH; Han JH; Huang MJ J Nanosci Nanotechnol; 2017 Jan; 17(1):524-29. PubMed ID: 29629742 [TBL] [Abstract][Full Text] [Related]
2. Third-Order Nonlinear Optical Properties of InN Thin Films Under 532 nm Nanosecond Laser Pulses. Wang JY; Jin ZM; Sun KX; Sun JD; Yao CB; Sun WJ J Nanosci Nanotechnol; 2017 Feb; 17(2):1460-463. PubMed ID: 29687985 [TBL] [Abstract][Full Text] [Related]
3. Effect of sputtering power on structural and optical properties of radio frequency-sputtered In2S3 thin films. Hwang DH; Cho S; Hui KN; Son YG J Nanosci Nanotechnol; 2014 Dec; 14(12):8978-81. PubMed ID: 25970994 [TBL] [Abstract][Full Text] [Related]
4. Study of surface morphology control and investigation of hexagonal indium nitride nanorods grown on GaN/sapphire substrate. Kuo SY; Chen WC; Lai FI; Lin WT; Wang HY; Hsiao CN J Nanosci Nanotechnol; 2012 Feb; 12(2):1620-3. PubMed ID: 22630014 [TBL] [Abstract][Full Text] [Related]
5. Deposition of ZnO thin films with different powers using RF magnetron sputtering method: Structural, electrical and optical study. Abdallah B; Zetoun W; Tello A Heliyon; 2024 Mar; 10(6):e27606. PubMed ID: 38524526 [TBL] [Abstract][Full Text] [Related]
6. Indium doped ZnO films prepared by RF magnetron sputtering: effect of substrate temperature on the strain-induced band gap. Daniel GP; Kumar DD; Justinvictor VB; Nair PB; Joy K; Koshy P; Thomas PV J Nanosci Nanotechnol; 2012 Mar; 12(3):2503-8. PubMed ID: 22755081 [TBL] [Abstract][Full Text] [Related]
7. [Influence of annealing and sputtering ambience on the photoluminescence of silicon nitride thin films]. Jia XY; Xu Z; Zhao SL; Zhang FJ; Zhao DW; Tang Y; Li Y; Zhou CL; Wang WJ Guang Pu Xue Yu Guang Pu Fen Xi; 2008 Nov; 28(11):2494-7. PubMed ID: 19271474 [TBL] [Abstract][Full Text] [Related]
8. Comparison of the Material Quality of Al Sun M; Blasco R; Nwodo J; de la Mata M; Molina SI; Ajay A; Monroy E; Valdueza-Felip S; Naranjo FB Materials (Basel); 2022 Oct; 15(20):. PubMed ID: 36295439 [TBL] [Abstract][Full Text] [Related]
9. Optimal Growth Conditions for Forming Liu WS; Gururajan B; Wu SH; Huang LC; Chi CK; Jiang YL; Kuo HC Micromachines (Basel); 2022 Sep; 13(9):. PubMed ID: 36144169 [TBL] [Abstract][Full Text] [Related]
10. Influence of Oxygen to Argon Ratio on the Optical Band Gap of Bi3.25La0.75Fe1Ti2O12 Thin Films Deposited by RF Sputtering. Han JY; Bark CW J Nanosci Nanotechnol; 2015 Oct; 15(10):8228-32. PubMed ID: 26726493 [TBL] [Abstract][Full Text] [Related]
11. [Comparative study on thin films of cadmium sulfide prepared by chemical bath deposition and radio frequency magnetron sputtering]. Wang SL; Wang XJ; Wang WZ; Liang CJ; Wang Z; Qi Z Guang Pu Xue Yu Guang Pu Fen Xi; 2012 Apr; 32(4):1094-7. PubMed ID: 22715792 [TBL] [Abstract][Full Text] [Related]
12. Elucidating the role of nitrogen plasma composition in the low-temperature self-limiting growth of indium nitride thin films. Ilhom S; Mohammad A; Shukla D; Grasso J; Willis BG; Okyay AK; Biyikli N RSC Adv; 2020 Jul; 10(46):27357-27368. PubMed ID: 35516968 [TBL] [Abstract][Full Text] [Related]
13. [Photoluminescence of Silicon Nitride-Based ZnO Thin Film Developed with RF Magnetron Sputtering]. Chen JH; Yao WQ; Zhu YF Guang Pu Xue Yu Guang Pu Fen Xi; 2017 Feb; 37(2):391-3. PubMed ID: 30264967 [TBL] [Abstract][Full Text] [Related]
14. Processing and Study of Optical and Electrical Properties of (Mg, Al) Co-Doped ZnO Thin Films Prepared by RF Magnetron Sputtering for Photovoltaic Application. Abed C; Fernández S; Aouida S; Elhouichet H; Priego F; Castro Y; Gómez-Mancebo MB; Munuera C Materials (Basel); 2020 May; 13(9):. PubMed ID: 32384783 [TBL] [Abstract][Full Text] [Related]
15. Structural and optical properties of ZnS thin films deposited by RF magnetron sputtering. Hwang DH; Ahn JH; Hui KN; Hui KS; Son YG Nanoscale Res Lett; 2012 Jan; 7(1):26. PubMed ID: 22221917 [TBL] [Abstract][Full Text] [Related]
16. Influence of deposition pressure on N-doped ZnO films by RF magnetron sputtering. Wang J; Elamurugu E; Franco N; Alves E; Botelho do Rego AM; Gonçalves G; Martins R; Fortunato E J Nanosci Nanotechnol; 2010 Apr; 10(4):2674-8. PubMed ID: 20355483 [TBL] [Abstract][Full Text] [Related]
17. Investigation of Antireflection Nb₂O₅ Thin Films by the Sputtering Method under Different Deposition Parameters. Chen KN; Hsu CM; Liu J; Liou YC; Yang CF Micromachines (Basel); 2016 Sep; 7(9):. PubMed ID: 30404326 [TBL] [Abstract][Full Text] [Related]
18. Characterization of crystalline structure and morphology of NiO thin films. Shin H; Choi SB; Yu CJ; Kim JY J Nanosci Nanotechnol; 2011 May; 11(5):4629-32. PubMed ID: 21780511 [TBL] [Abstract][Full Text] [Related]
19. Electrical, Optical and Thermal Properties of Ge-Si-Sn-O Thin Films. Vadakepurathu F; Rana M Materials (Basel); 2024 Jul; 17(13):. PubMed ID: 38998402 [TBL] [Abstract][Full Text] [Related]
20. Effects of NIR annealing on the characteristics of al-doped ZnO thin films prepared by RF sputtering. Jun MC; Koh JH Nanoscale Res Lett; 2012 Jun; 7(1):294. PubMed ID: 22673232 [TBL] [Abstract][Full Text] [Related] [Next] [New Search]