These tools will no longer be maintained as of December 31, 2024. Archived website can be found here. PubMed4Hh GitHub repository can be found here. Contact NLM Customer Service if you have questions.


BIOMARKERS

Molecular Biopsy of Human Tumors

- a resource for Precision Medicine *

155 related articles for article (PubMed ID: 29998277)

  • 1. Nano-confinement of block copolymers in high accuracy topographical guiding patterns: modelling the emergence of defectivity due to incommensurability.
    Gottlieb S; Kazazis D; Mochi I; Evangelio L; Fernández-Regúlez M; Ekinci Y; Perez-Murano F
    Soft Matter; 2018 Sep; 14(33):6799-6808. PubMed ID: 29998277
    [TBL] [Abstract][Full Text] [Related]  

  • 2. Resist-Free Directed Self-Assembly Chemo-Epitaxy Approach for Line/Space Patterning.
    Giammaria TJ; Gharbi A; Paquet A; Nealey P; Tiron R
    Nanomaterials (Basel); 2020 Dec; 10(12):. PubMed ID: 33297348
    [TBL] [Abstract][Full Text] [Related]  

  • 3. Reduction of Line Edge Roughness of Polystyrene-block-Poly(methyl methacrylate) Copolymer Nanopatterns By Introducing Hydrogen Bonding at the Junction Point of Two Block Chains.
    Lee KS; Lee J; Kwak J; Moon HC; Kim JK
    ACS Appl Mater Interfaces; 2017 Sep; 9(37):31245-31251. PubMed ID: 28218827
    [TBL] [Abstract][Full Text] [Related]  

  • 4. Thermal scanning probe lithography for the directed self-assembly of block copolymers.
    Gottlieb S; Lorenzoni M; Evangelio L; Fernández-Regúlez M; Ryu YK; Rawlings C; Spieser M; Knoll AW; Perez-Murano F
    Nanotechnology; 2017 Apr; 28(17):175301. PubMed ID: 28374684
    [TBL] [Abstract][Full Text] [Related]  

  • 5. Directed Self-Assembly on Photo-Crosslinked Polystyrene Sub-Layers: Nanopattern Uniformity and Orientation.
    Koh HD; Kim MJ
    Materials (Basel); 2016 Aug; 9(8):. PubMed ID: 28773768
    [TBL] [Abstract][Full Text] [Related]  

  • 6. Ionic Liquids as Additives to Polystyrene- Block-Poly(Methyl Methacrylate) Enabling Directed Self-Assembly of Patterns with Sub-10 nm Features.
    Chen X; Zhou C; Chen SJ; Craig GSW; Rincon-Delgadillo P; Dazai T; Miyagi K; Maehashi T; Yamazaki A; Gronheid R; Stoykovich MP; Nealey PF
    ACS Appl Mater Interfaces; 2018 May; 10(19):16747-16759. PubMed ID: 29667409
    [TBL] [Abstract][Full Text] [Related]  

  • 7. Fabrication of Si and Ge nanoarrays through graphoepitaxial directed hardmask block copolymer self-assembly.
    Gangnaik AS; Ghoshal T; Georgiev YM; Morris MA; Holmes JD
    J Colloid Interface Sci; 2018 Dec; 531():533-543. PubMed ID: 30055448
    [TBL] [Abstract][Full Text] [Related]  

  • 8. Pulsed transfer etching of PS-PDMS block copolymers self-assembled in 193 nm lithography stacks.
    Girardot C; Böhme S; Archambault S; Salaün M; Latu-Romain E; Cunge G; Joubert O; Zelsmann M
    ACS Appl Mater Interfaces; 2014 Sep; 6(18):16276-82. PubMed ID: 25111901
    [TBL] [Abstract][Full Text] [Related]  

  • 9. The One-Pot Directed Assembly of Cylinder-Forming Block Copolymer on Adjacent Chemical Patterns for Bimodal Patterning.
    Chang TH; Xiong S; Liu CC; Liu D; Nealey PF; Ma Z
    Macromol Rapid Commun; 2017 Sep; 38(18):. PubMed ID: 28749034
    [TBL] [Abstract][Full Text] [Related]  

  • 10. Sub-10 nm resistless nanolithography for directed self-assembly of block copolymers.
    Fernández-Regúlez M; Evangelio L; Lorenzoni M; Fraxedas J; Pérez-Murano F
    ACS Appl Mater Interfaces; 2014 Dec; 6(23):21596-602. PubMed ID: 25360636
    [TBL] [Abstract][Full Text] [Related]  

  • 11. Directed self-assembly of silicon-containing block copolymer thin films.
    Maher MJ; Rettner CT; Bates CM; Blachut G; Carlson MC; Durand WJ; Ellison CJ; Sanders DP; Cheng JY; Willson CG
    ACS Appl Mater Interfaces; 2015 Feb; 7(5):3323-8. PubMed ID: 25594107
    [TBL] [Abstract][Full Text] [Related]  

  • 12. Self-Aligned Assembly of a Poly(2-vinylpyridine)-
    Zhou J; Thapar V; Chen Y; Wu BX; Craig GSW; Nealey PF; Hur SM; Chang TH; Xiong S
    ACS Appl Mater Interfaces; 2021 Sep; 13(34):41190-41199. PubMed ID: 34470104
    [TBL] [Abstract][Full Text] [Related]  

  • 13. Double-Patterned Sidewall Directed Self-Assembly and Pattern Transfer of Sub-10 nm PTMSS-b-PMOST.
    Cushen J; Wan L; Blachut G; Maher MJ; Albrecht TR; Ellison CJ; Willson CG; Ruiz R
    ACS Appl Mater Interfaces; 2015 Jun; 7(24):13476-83. PubMed ID: 26004013
    [TBL] [Abstract][Full Text] [Related]  

  • 14. Role of Penetrability into a Brush-Coated Surface in Directed Self-Assembly of Block Copolymers.
    Evangelio L; Fernández-Regúlez M; Fraxedas J; Müller M; Pérez-Murano F
    ACS Appl Mater Interfaces; 2019 Jan; 11(3):3571-3581. PubMed ID: 30592206
    [TBL] [Abstract][Full Text] [Related]  

  • 15. Enhanced etching resolution of self-assembled PS-b-PMMA block copolymer films by ionic liquid additives.
    Hao H; Chen S; Ren J; Chen X; Nealey P
    Nanotechnology; 2023 Mar; 34(20):. PubMed ID: 36709513
    [TBL] [Abstract][Full Text] [Related]  

  • 16. Directed Self-Assembly of Polystyrene-b-poly(propylene carbonate) on Chemical Patterns via Thermal Annealing for Next Generation Lithography.
    Yang GW; Wu GP; Chen X; Xiong S; Arges CG; Ji S; Nealey PF; Lu XB; Darensbourg DJ; Xu ZK
    Nano Lett; 2017 Feb; 17(2):1233-1239. PubMed ID: 28068100
    [TBL] [Abstract][Full Text] [Related]  

  • 17. Controlled Anisotropic Wetting by Plasma Treatment for Directed Self-Assembly of High-χ Block Copolymers.
    Putranto AF; Petit-Etienne C; Cavalaglio S; Cabannes-Boué B; Panabiere M; Forcina G; Fleury G; Kogelschatz M; Zelsmann M
    ACS Appl Mater Interfaces; 2024 May; 16(21):27841-27849. PubMed ID: 38758246
    [TBL] [Abstract][Full Text] [Related]  

  • 18. Chemical patterns from surface grafted resists for directed assembly of block copolymers.
    Han E; Kim M; Gopalan P
    ACS Nano; 2012 Feb; 6(2):1823-9. PubMed ID: 22243029
    [TBL] [Abstract][Full Text] [Related]  

  • 19. Extreme ultraviolet lithography reaches 5 nm resolution.
    Giannopoulos I; Mochi I; Vockenhuber M; Ekinci Y; Kazazis D
    Nanoscale; 2024 Aug; 16(33):15533-15543. PubMed ID: 39133026
    [TBL] [Abstract][Full Text] [Related]  

  • 20. Line-Edge Roughness Stochastics for 5-nm Pattern Formation in the Extreme Ultraviolet Lithography.
    Kim SK
    J Nanosci Nanotechnol; 2019 Aug; 19(8):4657-4660. PubMed ID: 30913764
    [TBL] [Abstract][Full Text] [Related]  

    [Next]    [New Search]
    of 8.