These tools will no longer be maintained as of December 31, 2024. Archived website can be found here. PubMed4Hh GitHub repository can be found here. Contact NLM Customer Service if you have questions.


BIOMARKERS

Molecular Biopsy of Human Tumors

- a resource for Precision Medicine *

149 related articles for article (PubMed ID: 30234499)

  • 1. A multi-level memristor based on atomic layer deposition of iron oxide.
    Porro S; Bejtka K; Jasmin A; Fontana M; Milano G; Chiolerio A; Pirri CF; Ricciardi C
    Nanotechnology; 2018 Dec; 29(49):495201. PubMed ID: 30234499
    [TBL] [Abstract][Full Text] [Related]  

  • 2. Fabrication of Thin Films of α-Fe2O3 via Atomic Layer Deposition Using Iron Bisamidinate and Water under Mild Growth Conditions.
    Avila JR; Kim DW; Rimoldi M; Farha OK; Hupp JT
    ACS Appl Mater Interfaces; 2015 Aug; 7(30):16138-42. PubMed ID: 26192606
    [TBL] [Abstract][Full Text] [Related]  

  • 3. Comparison of the Atomic Layer Deposition of Tantalum Oxide Thin Films Using Ta(N
    Song SJ; Park T; Yoon KJ; Yoon JH; Kwon DE; Noh W; Lansalot-Matras C; Gatineau S; Lee HK; Gautam S; Cho DY; Lee SW; Hwang CS
    ACS Appl Mater Interfaces; 2017 Jan; 9(1):537-547. PubMed ID: 27936581
    [TBL] [Abstract][Full Text] [Related]  

  • 4. Phase discrimination through oxidant selection in low-temperature atomic layer deposition of crystalline iron oxides.
    Riha SC; Racowski JM; Lanci MP; Klug JA; Hock AS; Martinson AB
    Langmuir; 2013 Mar; 29(10):3439-45. PubMed ID: 23432093
    [TBL] [Abstract][Full Text] [Related]  

  • 5. Memory Effects in Nanolaminates of Hafnium and Iron Oxide Films Structured by Atomic Layer Deposition.
    Kalam K; Otsus M; Kozlova J; Tarre A; Kasikov A; Rammula R; Link J; Stern R; Vinuesa G; Lendínez JM; Dueñas S; Castán H; Tamm A; Kukli K
    Nanomaterials (Basel); 2022 Jul; 12(15):. PubMed ID: 35957028
    [TBL] [Abstract][Full Text] [Related]  

  • 6. Low-Temperature Plasma-Enhanced Atomic Layer Deposition of Tin(IV) Oxide from a Functionalized Alkyl Precursor: Fabrication and Evaluation of SnO
    Mai L; Zanders D; Subaşı E; Ciftyurek E; Hoppe C; Rogalla D; Gilbert W; Arcos TL; Schierbaum K; Grundmeier G; Bock C; Devi A
    ACS Appl Mater Interfaces; 2019 Jan; 11(3):3169-3180. PubMed ID: 30624887
    [TBL] [Abstract][Full Text] [Related]  

  • 7. Impedance spectroscopic analysis on effects of partial oxidation of TiN bottom electrode and microstructure of amorphous and crystalline HfO2 thin films on their bipolar resistive switching.
    Yoon JW; Yoon JH; Lee JH; Hwang CS
    Nanoscale; 2014 Jun; 6(12):6668-78. PubMed ID: 24817626
    [TBL] [Abstract][Full Text] [Related]  

  • 8. Flexible and High-Performance Amorphous Indium Zinc Oxide Thin-Film Transistor Using Low-Temperature Atomic Layer Deposition.
    Sheng J; Lee HJ; Oh S; Park JS
    ACS Appl Mater Interfaces; 2016 Dec; 8(49):33821-33828. PubMed ID: 27960372
    [TBL] [Abstract][Full Text] [Related]  

  • 9. High performance and low power consumption resistive random access memory with Ag/Fe
    Niu Y; Jiang K; Dong X; Zheng D; Liu B; Wang H
    Nanotechnology; 2021 Oct; 32(50):. PubMed ID: 34525467
    [TBL] [Abstract][Full Text] [Related]  

  • 10. Interface Electrical Properties of Al
    Fisichella G; Schilirò E; Di Franco S; Fiorenza P; Lo Nigro R; Roccaforte F; Ravesi S; Giannazzo F
    ACS Appl Mater Interfaces; 2017 Mar; 9(8):7761-7771. PubMed ID: 28135063
    [TBL] [Abstract][Full Text] [Related]  

  • 11. In Situ Hydrogen Plasma Exposure for Varying the Stoichiometry of Atomic Layer Deposited Niobium Oxide Films for Use in Neuromorphic Computing Applications.
    Kozen AC; Robinson ZR; Glaser ER; Twigg M; Larrabee TJ; Cho H; Prokes SM; Ruppalt LB
    ACS Appl Mater Interfaces; 2020 Apr; 12(14):16639-16647. PubMed ID: 32223206
    [TBL] [Abstract][Full Text] [Related]  

  • 12. Growth of iron cobalt oxides by atomic layer deposition.
    Lie M; Barnholt Klepper K; Nilsen O; Fjellvåg H; Kjekshus A
    Dalton Trans; 2008 Jan; (2):253-9. PubMed ID: 18097492
    [TBL] [Abstract][Full Text] [Related]  

  • 13. Iron-based inorganic-organic hybrid and superlattice thin films by ALD/MLD.
    Tanskanen A; Karppinen M
    Dalton Trans; 2015 Nov; 44(44):19194-9. PubMed ID: 26486269
    [TBL] [Abstract][Full Text] [Related]  

  • 14. Atomic layer deposition of GeSe films using HGeCl
    Kim W; Yoo S; Yoo C; Park ES; Jeon J; Kwon YJ; Woo KS; Kim HJ; Lee YK; Hwang CS
    Nanotechnology; 2018 Sep; 29(36):365202. PubMed ID: 29920183
    [TBL] [Abstract][Full Text] [Related]  

  • 15. Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application.
    Kim HY; Jung EA; Mun G; Agbenyeke RE; Park BK; Park JS; Son SU; Jeon DJ; Park SK; Chung TM; Han JH
    ACS Appl Mater Interfaces; 2016 Oct; 8(40):26924-26931. PubMed ID: 27673338
    [TBL] [Abstract][Full Text] [Related]  

  • 16. Fabrication of Aluminum Oxide Thin-Film Devices Based on Atomic Layer Deposition and Pulsed Discrete Feed Method.
    Lin SC; Wang CC; Tien CL; Tung FC; Wang HF; Lai SH
    Micromachines (Basel); 2023 Jan; 14(2):. PubMed ID: 36837979
    [TBL] [Abstract][Full Text] [Related]  

  • 17. Understanding the Coexistence of Two Bipolar Resistive Switching Modes with Opposite Polarity in Pt/TiO
    Zhang H; Yoo S; Menzel S; Funck C; Cüppers F; Wouters DJ; Hwang CS; Waser R; Hoffmann-Eifert S
    ACS Appl Mater Interfaces; 2018 Sep; 10(35):29766-29778. PubMed ID: 30088755
    [TBL] [Abstract][Full Text] [Related]  

  • 18. Atomic Layer Deposition of Zirconium-Based High-k Metal Gate Oxide: Effect of Si Containing Zr Precursor.
    Cho JH; Lee SI; Kim JH; Yim SJ; Shin HS; Han MJ; Chae WM; Lee SD; Ahn CY; Kim MW
    J Nanosci Nanotechnol; 2015 Jan; 15(1):382-5. PubMed ID: 26328365
    [TBL] [Abstract][Full Text] [Related]  

  • 19. Atomic layer deposited nanolaminates of zirconium oxide and manganese oxide from manganese(III)acetylacetonate and ozone.
    Kalam K; Rammula R; Ritslaid P; Käämbre T; Link J; Stern R; Vinuesa G; Dueñas S; Castán H; Tamm A; Kukli K
    Nanotechnology; 2021 May; 32(33):. PubMed ID: 33962408
    [TBL] [Abstract][Full Text] [Related]  

  • 20. Atomic Layer Deposition of an Indium Gallium Oxide Thin Film for Thin-Film Transistor Applications.
    Sheng J; Park EJ; Shong B; Park JS
    ACS Appl Mater Interfaces; 2017 Jul; 9(28):23934-23940. PubMed ID: 28644010
    [TBL] [Abstract][Full Text] [Related]  

    [Next]    [New Search]
    of 8.