141 related articles for article (PubMed ID: 30327068)
1. Beryllium-Based Multilayer Mirrors and Filters for the Extreme Ultraviolet Range.
Nikolay C; Alexey L; Andrey N; Dmitriy P; Alexey P; Vladimir P; Nikolay S; Franz S; Mewael S; Andrey S; Mikhail S; Nikolay T; Sergey Z
J Nanosci Nanotechnol; 2019 Jan; 19(1):546-553. PubMed ID: 30327068
[TBL] [Abstract][Full Text] [Related]
2. Thin film multilayer filters for solar EUV telescopes.
Chkhalo NI; Drozdov MN; Kluenkov EB; Kuzin SV; Lopatin AY; Luchin VI; Salashchenko NN; Tsybin NN; Zuev SY
Appl Opt; 2016 Jun; 55(17):4683-90. PubMed ID: 27409026
[TBL] [Abstract][Full Text] [Related]
3. Ultrasmooth beryllium substrates for solar astronomy in extreme ultraviolet wavelengths.
Chkhalo NI; Mikhailenko MS; Pestov AE; Polkovnikov VN; Zorina MV; Zuev SY; Kazakov DS; Milkov AV; Strulya IL; Filichkina VA; Kozlov AS
Appl Opt; 2019 May; 58(13):3652-3658. PubMed ID: 31044861
[TBL] [Abstract][Full Text] [Related]
4. Mo/Si and Mo/Be multilayer thin films on Zerodur substrates for extreme-ultraviolet lithography.
Mirkarimi PB; Bajt S; Wall MA
Appl Opt; 2000 Apr; 39(10):1617-25. PubMed ID: 18345060
[TBL] [Abstract][Full Text] [Related]
5. Stress, reflectance, and stability of Ru/Be multilayer coatings with Mo interlayers near the 11 nm wavelength.
Smertin R; Chkhalo N; Garakhin S; Polkovnikov V; Zuev S
Opt Lett; 2024 Jul; 49(13):3690-3692. PubMed ID: 38950243
[TBL] [Abstract][Full Text] [Related]
6. Advanced materials for multilayer mirrors for extreme ultraviolet solar astronomy.
Bogachev SA; Chkhalo NI; Kuzin SV; Pariev DE; Polkovnikov VN; Salashchenko NN; Shestov SV; Zuev SY
Appl Opt; 2016 Mar; 55(9):2126-35. PubMed ID: 27140543
[TBL] [Abstract][Full Text] [Related]
7. Narrowband and tunable anomalous transmission filters for spectral monitoring in the extreme ultraviolet wavelength region.
Barreaux JLP; Kozhevnikov IV; Bayraktar M; Van De Kruijs RWE; Bastiaens HMJ; Bijkerk F; Boller KJ
Opt Express; 2017 Feb; 25(3):1993-2008. PubMed ID: 29519048
[TBL] [Abstract][Full Text] [Related]
8. Design of multilayer extreme-ultraviolet mirrors for enhanced reflectivity.
Singh M; Braat JJ
Appl Opt; 2000 May; 39(13):2189-97. PubMed ID: 18345125
[TBL] [Abstract][Full Text] [Related]
9. High-reflection Mo/Be/Si multilayers for EUV lithography.
Chkhalo NI; Gusev SA; Nechay AN; Pariev DE; Polkovnikov VN; Salashchenko NN; Schäfers F; Sertsu MG; Sokolov A; Svechnikov MV; Tatarsky DA
Opt Lett; 2017 Dec; 42(24):5070-5073. PubMed ID: 29240139
[TBL] [Abstract][Full Text] [Related]
10. Structure and extreme ultraviolet performance of Si/C multilayers deposited under different working pressures.
Yi Q; Huang Q; Wang X; Yang Y; Yang X; Zhang Z; Wang Z; Xu R; Peng T; Zhou H; Huo T
Appl Opt; 2017 Feb; 56(4):C145-C150. PubMed ID: 28158061
[TBL] [Abstract][Full Text] [Related]
11. Short period La/B and LaN/B multilayer mirrors for ~6.8 nm wavelength.
Makhotkin IA; Zoethout E; van de Kruijs R; Yakunin SN; Louis E; Yakunin AM; Banine V; Müllender S; Bijkerk F
Opt Express; 2013 Dec; 21(24):29894-904. PubMed ID: 24514540
[TBL] [Abstract][Full Text] [Related]
12. Angular and Spectral Bandwidth of Extreme UV Multilayers Near Spacer Material Absorption Edges.
Zameshin AA; Yakshin AE; Chandrasekaran A; Bijkerk F
J Nanosci Nanotechnol; 2019 Jan; 19(1):602-608. PubMed ID: 30327075
[TBL] [Abstract][Full Text] [Related]
13. Structural properties of Al/Mo/SiC multilayers with high reflectivity for extreme ultraviolet light.
Hu MH; Le Guen K; André JM; Jonnard P; Meltchakov E; Delmotte F; Galtayries A
Opt Express; 2010 Sep; 18(19):20019-28. PubMed ID: 20940893
[TBL] [Abstract][Full Text] [Related]
14. Influence of barrier interlayers on the performance of Mo/Be multilayer mirrors for next-generation EUV lithography.
Svechnikov MV; Chkhalo NI; Gusev SA; Nechay AN; Pariev DE; Pestov AE; Polkovnikov VN; Tatarskiy DA; Salashchenko NN; Schäfers F; Sertsu MG; Sokolov A; Vainer YA; Zorina MV
Opt Express; 2018 Dec; 26(26):33718-33731. PubMed ID: 30650805
[TBL] [Abstract][Full Text] [Related]
15. Wavelength separation from extreme ultraviolet mirrors using phaseshift reflection.
van den Boogaard AJ; van Goor FA; Louis E; Bijkerk F
Opt Lett; 2012 Jan; 37(2):160-2. PubMed ID: 22854453
[TBL] [Abstract][Full Text] [Related]
16. [Multilayer mirrors used for the moon-based EUV imager].
Liu Z; Gao JS; Chen B; Wang TT; Wang XY; Shen ZF; Chen H
Guang Pu Xue Yu Guang Pu Fen Xi; 2013 Jan; 33(1):283-6. PubMed ID: 23586274
[TBL] [Abstract][Full Text] [Related]
17. Design of reflective phase retarders in the extreme ultraviolet based on chirped Mo/Si multilayer mirrors.
Yang S; Chen S; Lin C
J Synchrotron Radiat; 2021 Sep; 28(Pt 5):1437-1443. PubMed ID: 34475291
[TBL] [Abstract][Full Text] [Related]
18. Performance, structure, and stability of SiC/Al multilayer films for extreme ultraviolet applications.
Windt DL; Bellotti JA
Appl Opt; 2009 Sep; 48(26):4932-41. PubMed ID: 19745857
[TBL] [Abstract][Full Text] [Related]
19. Structural characterization and lifetime stability of Mo/Y extreme-ultraviolet multilayer mirrors.
Kjornrattanawanich B; Bajt S
Appl Opt; 2004 Nov; 43(32):5955-62. PubMed ID: 15587723
[TBL] [Abstract][Full Text] [Related]
20. Interface morphology of Mo/Si multilayer systems with varying Mo layer thickness studied by EUV diffuse scattering.
Haase A; Soltwisch V; Braun S; Laubis C; Scholze F
Opt Express; 2017 Jun; 25(13):15441-15455. PubMed ID: 28788969
[TBL] [Abstract][Full Text] [Related]
[Next] [New Search]
