These tools will no longer be maintained as of December 31, 2024. Archived website can be found here. PubMed4Hh GitHub repository can be found here. Contact NLM Customer Service if you have questions.
146 related articles for article (PubMed ID: 30399967)
1. A table-top EUV focusing optical system with high energy density using a modified Schwarzschild objective and a laser-plasma light source. Zhang Z; Li W; Huang Q; Zhang Z; Yi S; Pan L; Xie C; Wachulak P; Fiedorowicz H; Wang Z Rev Sci Instrum; 2018 Oct; 89(10):103109. PubMed ID: 30399967 [TBL] [Abstract][Full Text] [Related]
2. Damage threshold measurements on EUV optics using focused radiation from a table-top laser produced plasma source. Barkusky F; Bayer A; Döring S; Grossmann P; Mann K Opt Express; 2010 Mar; 18(5):4346-55. PubMed ID: 20389446 [TBL] [Abstract][Full Text] [Related]
4. Effect of focal spot size on in-band 13.5 nm extreme ultraviolet emission from laser-produced Sn plasma. Tao Y; Harilal SS; Tillack MS; Sequoia KL; O'Shay B; Najmabadi F Opt Lett; 2006 Aug; 31(16):2492-4. PubMed ID: 16880866 [TBL] [Abstract][Full Text] [Related]
5. Note: Thickness determination of freestanding ultra-thin foils using a table top laboratory extreme ultraviolet source. Braenzel J; Pratsch C; Hilz P; Kreuzer C; Schnürer M; Stiel H; Sandner W Rev Sci Instrum; 2013 May; 84(5):056109. PubMed ID: 23742607 [TBL] [Abstract][Full Text] [Related]
6. Radiation damage resistance of AlGaN detectors for applications in the extreme-ultraviolet spectral range. Barkusky F; Peth C; Bayer A; Mann K; John J; Malinowski PE Rev Sci Instrum; 2009 Sep; 80(9):093102. PubMed ID: 19791927 [TBL] [Abstract][Full Text] [Related]
7. Fabrication of nanoscale patterns in lithium fluoride crystal using a 13.5 nm Schwarzschild objective and a laser produced plasma source. Wang X; Mu B; Jiang L; Zhu J; Yi S; Wang Z; He P Rev Sci Instrum; 2011 Dec; 82(12):123702. PubMed ID: 22225219 [TBL] [Abstract][Full Text] [Related]
8. Broadband extreme ultraviolet dispersion measurements using a high-harmonic source. Jansen GSM; Liu X; Eikema KSE; Witte S Opt Lett; 2019 Aug; 44(15):3625-3628. PubMed ID: 31368928 [TBL] [Abstract][Full Text] [Related]
9. EUV polarimetry for thin film and surface characterization and EUV phase retarder reflector development. Gaballah AEH; Nicolosi P; Ahmed N; Jimenez K; Pettinari G; Gerardino A; Zuppella P Rev Sci Instrum; 2018 Jan; 89(1):015108. PubMed ID: 29390727 [TBL] [Abstract][Full Text] [Related]
10. High-resolution laboratory reflectometer for the study of x-ray optical elements in the soft and extreme ultraviolet wavelength ranges. Garakhin SA; Chkhalo NI; Kas'kov IA; Lopatin AY; Malyshev IV; Nechay AN; Pestov AE; Polkovnikov VN; Salashchenko NN; Svechnikov MV; Tsybin NN; Zabrodin IG; Zuev SY Rev Sci Instrum; 2020 Jun; 91(6):063103. PubMed ID: 32611061 [TBL] [Abstract][Full Text] [Related]
11. Wavefront Sensing for Evaluation of Extreme Ultraviolet Microscopy. Ruiz-Lopez M; Mehrjoo M; Keitel B; Plönjes E; Alj D; Dovillaire G; Li L; Zeitoun P Sensors (Basel); 2020 Nov; 20(22):. PubMed ID: 33182797 [TBL] [Abstract][Full Text] [Related]
13. Ultrafast Time-Resolved Pump-Probe Investigation of Nanosecond Extreme Ultraviolet-Light-Induced Damage Dynamics on B Pan L; Li S; Cao J; Wu J; Zhang Z; Wang K; Huang Q; Ma B; Li W; Wang Z Nano Lett; 2022 Jul; 22(13):5260-5268. PubMed ID: 35759364 [TBL] [Abstract][Full Text] [Related]
14. Experimental study of EUV mirror radiation damage resistance under long-term free-electron laser exposures below the single-shot damage threshold. Makhotkin IA; Sobierajski R; Chalupský J; Tiedtke K; de Vries G; Störmer M; Scholze F; Siewert F; van de Kruijs RWE; Milov I; Louis E; Jacyna I; Jurek M; Klinger D; Nittler L; Syryanyy Y; Juha L; Hájková V; Vozda V; Burian T; Saksl K; Faatz B; Keitel B; Plönjes E; Schreiber S; Toleikis S; Loch R; Hermann M; Strobel S; Nienhuys HK; Gwalt G; Mey T; Enkisch H J Synchrotron Radiat; 2018 Jan; 25(Pt 1):77-84. PubMed ID: 29271755 [TBL] [Abstract][Full Text] [Related]
15. Structured Mo/Si multilayers for IR-suppression in laser-produced EUV light sources. Trost M; Schröder S; Duparré A; Risse S; Feigl T; Zeitner UD; Tünnermann A Opt Express; 2013 Nov; 21(23):27852-64. PubMed ID: 24514302 [TBL] [Abstract][Full Text] [Related]
16. A Soft X-Ray/EUV Reflectometer Based on a Laser Produced Plasma Source. Gullikson EM; Underwood JH; Batson PC; Nikitin V J Xray Sci Technol; 1992 Jan; 3(4):283-99. PubMed ID: 21307445 [TBL] [Abstract][Full Text] [Related]
17. [Characteristics of extreme ultraviolet emission from tin plasma using CO2 laser for lithography]. Wu T; Wang XB; Wang SY; Lu PX Guang Pu Xue Yu Guang Pu Fen Xi; 2012 Jul; 32(7):1729-33. PubMed ID: 23016313 [TBL] [Abstract][Full Text] [Related]