332 related articles for article (PubMed ID: 30704091)
1. Microstructure and Oxidation Behavior of Metal V Films Deposited by Magnetron Sputtering.
Zhang S; Wang T; Zhang Z; Li J; Tu R; Shen Q; Wang C; Luo G; Zhang L
Materials (Basel); 2019 Jan; 12(3):. PubMed ID: 30704091
[TBL] [Abstract][Full Text] [Related]
2. Regulation of Substrate-Target Distance on the Microstructural, Optical and Electrical Properties of CdTe Films by Magnetron Sputtering.
Gu P; Zhu X; Wu H; Yang D
Materials (Basel); 2018 Dec; 11(12):. PubMed ID: 30544801
[TBL] [Abstract][Full Text] [Related]
3. [Photoluminescence of Silicon Nitride-Based ZnO Thin Film Developed with RF Magnetron Sputtering].
Chen JH; Yao WQ; Zhu YF
Guang Pu Xue Yu Guang Pu Fen Xi; 2017 Feb; 37(2):391-3. PubMed ID: 30264967
[TBL] [Abstract][Full Text] [Related]
4. Deposition of ZnO thin films with different powers using RF magnetron sputtering method: Structural, electrical and optical study.
Abdallah B; Zetoun W; Tello A
Heliyon; 2024 Mar; 10(6):e27606. PubMed ID: 38524526
[TBL] [Abstract][Full Text] [Related]
5. Mechanical and Structural Behavior of HfN Thin Films Deposited by Direct Current and Mid-Frequency Magnetron Sputtering.
Chun SY
J Nanosci Nanotechnol; 2021 Jul; 21(7):4125-4128. PubMed ID: 33715758
[TBL] [Abstract][Full Text] [Related]
6. Quantitative SEM characterisation of ceramic target prior and after magnetron sputtering: a case study of aluminium zinc oxide.
Jahangiri AR; Rajabi Kalvani P; Shapouri S; Sari A; ŢĂlu Ş; Jalili YS
J Microsc; 2021 Mar; 281(3):190-201. PubMed ID: 32926411
[TBL] [Abstract][Full Text] [Related]
7. Influence of substrate temperature on the properties of ZnTe:Cu films prepared by a magnetron co-sputtering method.
Li H; Huang H; Lina A; Tang K; Chen Z; Zhang Z; Xu K; Ding K; Wang L; Huang J
Heliyon; 2024 Jan; 10(1):e23349. PubMed ID: 38173527
[TBL] [Abstract][Full Text] [Related]
8. TiN Films Deposited on Uranium by High Power Pulsed Magnetron Sputtering under Low Temperature.
Ding J; Yin X; Fang L; Meng X; Yin A
Materials (Basel); 2018 Aug; 11(8):. PubMed ID: 30103416
[TBL] [Abstract][Full Text] [Related]
9. Chemical and Morphological Characterization of Magnetron Sputtered at Different Bias Voltages Cr-Al-C Coatings.
Obrosov A; Gulyaev R; Zak A; Ratzke M; Naveed M; Dudzinski W; Weiß S
Materials (Basel); 2017 Feb; 10(2):. PubMed ID: 28772516
[TBL] [Abstract][Full Text] [Related]
10. Surface Stoichiometry and Depth Profile of Ti
Mukhopadhyay AK; Roy A; Bhattacharjee G; Das SC; Majumdar A; Wulff H; Hippler R
Materials (Basel); 2021 Jun; 14(12):. PubMed ID: 34207839
[TBL] [Abstract][Full Text] [Related]
11. Effects of Heating Mode and Temperature on the Microstructures, Electrical and Optical Properties of Molybdenum Thin Films.
Zhao H; Xie J; Mao A; Wang A; Chen Y; Liang T; Ma D
Materials (Basel); 2018 Sep; 11(9):. PubMed ID: 30200622
[TBL] [Abstract][Full Text] [Related]
12. Room Temperature Deposition of Nanocrystalline SiC Thin Films by DCMS/HiPIMS Co-Sputtering Technique.
Tiron V; Ursu EL; Cristea D; Bulai G; Stoian G; Matei T; Velicu IL
Nanomaterials (Basel); 2022 Feb; 12(3):. PubMed ID: 35159857
[TBL] [Abstract][Full Text] [Related]
13. Characteristic corrosion resistance of nanocrystalline TiN films prepared by high density plasma reactive magnetron sputtering.
Kim JH; Kang CG; Kim YT; Cheong WS; Song PK
J Nanosci Nanotechnol; 2013 Jul; 13(7):4601-7. PubMed ID: 23901480
[TBL] [Abstract][Full Text] [Related]
14. Heteroepitaxial growth of TiN film on MgO (100) by reactive magnetron sputtering.
Chen WC; Peng CY; Chang L
Nanoscale Res Lett; 2014; 9(1):551. PubMed ID: 25324706
[TBL] [Abstract][Full Text] [Related]
15. Light-Sensing Properties of Amorphous Vanadium Oxide Films Prepared by RF Sputtering.
Plugaru R; Mihalache I; Romaniţan C; Comanescu F; Vulpe S; Craciun G; Plugaru N; Djourelov N
Sensors (Basel); 2023 Feb; 23(4):. PubMed ID: 36850358
[TBL] [Abstract][Full Text] [Related]
16. HRTEM Microstructural Characterization of β-WO3 Thin Films Deposited by Reactive RF Magnetron Sputtering.
Faudoa-Arzate A; Arteaga-Durán A; Saenz-Hernández RJ; Botello-Zubiate ME; Realyvazquez-Guevara PR; Matutes-Aquino JA
Materials (Basel); 2017 Feb; 10(2):. PubMed ID: 28772559
[TBL] [Abstract][Full Text] [Related]
17. Influence of W Addition on Microstructure and Resistance to Brittle Cracking of TiB
Chudzik-Poliszak E; Cieniek Ł; Moskalewicz T; Kowalski K; Kopia A; Smolik J
Materials (Basel); 2021 Aug; 14(16):. PubMed ID: 34443185
[TBL] [Abstract][Full Text] [Related]
18. Influence of Heat Treatment Conditions on the Properties of Vanadium Oxide Thin Films for Thermochromic Applications.
Kim D; Kwon S; Park Y; Boo JH; Nam SH; Joo YT; Kim M; Lee J
J Nanosci Nanotechnol; 2016 May; 16(5):4968-72. PubMed ID: 27483853
[TBL] [Abstract][Full Text] [Related]
19. Structural and mechanical properties of Si-doped CrN coatings deposited by magnetron sputtering technique.
Vyas A; Aliyu A
Heliyon; 2023 Feb; 9(2):e13461. PubMed ID: 36816227
[TBL] [Abstract][Full Text] [Related]
20. Low Resistivity Hafnium Nitride Thin Films Deposited by Inductively Coupled Plasma Assisted Magnetron Sputtering in Microelectronics.
Chun SY
J Nanosci Nanotechnol; 2021 Jul; 21(7):4129-4132. PubMed ID: 33715759
[TBL] [Abstract][Full Text] [Related]
[Next] [New Search]
