144 related articles for article (PubMed ID: 30830476)
1. Plasma-Enhanced Atomic Layer Deposition of Cobalt Films Using Co(EtCp)
Zhu B; Ding ZJ; Wu X; Liu WJ; Zhang DW; Ding SJ
Nanoscale Res Lett; 2019 Mar; 14(1):76. PubMed ID: 30830476
[TBL] [Abstract][Full Text] [Related]
2. Temperature controlled Ru and RuO
Kozodaev MG; Lebedinskii YY; Chernikova AG; Korostylev EV; Chouprik AA; Khakimov RR; Markeev AM; Hwang CS
J Chem Phys; 2019 Nov; 151(20):204701. PubMed ID: 31779314
[TBL] [Abstract][Full Text] [Related]
3. Atomic Layer Deposition of Ru Thin Films Using a New Beta-Diketonate Ru Precursor and NH3 Plasma as a Reactant.
Jung JH; Lee SJ; Lee HJ; Lee MY; Cheon T; Bae SI; Saito M; Suzuki K; Nabeya S; Lee J; Kim S; Yeom S; Seo JH; Kim SH
J Nanosci Nanotechnol; 2015 Nov; 15(11):8472-7. PubMed ID: 26726537
[TBL] [Abstract][Full Text] [Related]
4. Structural, Optical, and Electronic Properties of Cu-Doped TiN
Baron FA; Mikhlin YL; Molokeev MS; Rautskiy MV; Tarasov IA; Volochaev MN; Shanidze LV; Lukyanenko AV; Smolyarova TE; Konovalov SO; Zelenov FV; Tarasov AS; Volkov NV
ACS Appl Mater Interfaces; 2021 Jul; 13(27):32531-32541. PubMed ID: 34181393
[TBL] [Abstract][Full Text] [Related]
5. Thermal and Plasma-Enhanced Atomic Layer Deposition of Yttrium Oxide Films and the Properties of Water Wettability.
Zhao B; Mattelaer F; Rampelberg G; Dendooven J; Detavernier C
ACS Appl Mater Interfaces; 2020 Jan; 12(2):3179-3187. PubMed ID: 31860795
[TBL] [Abstract][Full Text] [Related]
6. Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application.
Kim HY; Jung EA; Mun G; Agbenyeke RE; Park BK; Park JS; Son SU; Jeon DJ; Park SK; Chung TM; Han JH
ACS Appl Mater Interfaces; 2016 Oct; 8(40):26924-26931. PubMed ID: 27673338
[TBL] [Abstract][Full Text] [Related]
7. Atomic layer deposition of tungsten(III) oxide thin films from W2(NMe2)6 and water: precursor-based control of oxidation state in the thin film material.
Dezelah CL; El-Kadri OM; Szilágyi IM; Campbell JM; Arstila K; Niinistö L; Winter CH
J Am Chem Soc; 2006 Aug; 128(30):9638-9. PubMed ID: 16866511
[TBL] [Abstract][Full Text] [Related]
8. Substrate selectivity in the low temperature atomic layer deposition of cobalt metal films from bis(1,4-di-tert-butyl-1,3-diazadienyl)cobalt and formic acid.
Kerrigan MM; Klesko JP; Rupich SM; Dezelah CL; Kanjolia RK; Chabal YJ; Winter CH
J Chem Phys; 2017 Feb; 146(5):052813. PubMed ID: 28178839
[TBL] [Abstract][Full Text] [Related]
9. Thermal atomic layer deposition of rhenium nitride and rhenium metal thin films using methyltrioxorhenium.
Cwik S; Woods KN; Perera SS; Saly MJ; Knisley TJ; Winter CH
Dalton Trans; 2021 Dec; 50(48):18202-18211. PubMed ID: 34860223
[TBL] [Abstract][Full Text] [Related]
10. Atomic-Layer-Deposition of Indium Oxide Nano-films for Thin-Film Transistors.
Ma Q; Zheng HM; Shao Y; Zhu B; Liu WJ; Ding SJ; Zhang DW
Nanoscale Res Lett; 2018 Jan; 13(1):4. PubMed ID: 29318402
[TBL] [Abstract][Full Text] [Related]
11. Plasma-Enhanced Atomic Layer Deposition of Nanostructured Gold Near Room Temperature.
Van Daele M; Griffiths MBE; Raza A; Minjauw MM; Solano E; Feng JY; Ramachandran RK; Clemmen S; Baets R; Barry ST; Detavernier C; Dendooven J
ACS Appl Mater Interfaces; 2019 Oct; 11(40):37229-37238. PubMed ID: 31523948
[TBL] [Abstract][Full Text] [Related]
12. Low-Temperature Atomic Layer Deposition of Highly Conformal Tin Nitride Thin Films for Energy Storage Devices.
Ansari MZ; Nandi DK; Janicek P; Ansari SA; Ramesh R; Cheon T; Shong B; Kim SH
ACS Appl Mater Interfaces; 2019 Nov; 11(46):43608-43621. PubMed ID: 31633331
[TBL] [Abstract][Full Text] [Related]
13. Low Temperature, Selective Atomic Layer Deposition of Nickel Metal Thin Films.
Kerrigan MM; Klesko JP; Blakeney KJ; Winter CH
ACS Appl Mater Interfaces; 2018 Apr; 10(16):14200-14208. PubMed ID: 29630338
[TBL] [Abstract][Full Text] [Related]
14. Characteristics of Cobalt Thin Films Deposited by Very High Frequency Plasma Enhanced Atomic Layer Deposition (60 and 100 MHz) Using Cobaltocene (Co(Cp)₂)/NH₃.
Yeom WG; Song CH; Cho CH; You SJ; Yeom GY
J Nanosci Nanotechnol; 2021 Mar; 21(3):1826-1832. PubMed ID: 33404456
[TBL] [Abstract][Full Text] [Related]
15. Highly conductive and stable Co
Mattinen M; Hatanpää T; Mizohata K; Räisänen J; Leskelä M; Ritala M
Dalton Trans; 2021 Oct; 50(38):13264-13275. PubMed ID: 34608915
[TBL] [Abstract][Full Text] [Related]
16. Growth characteristics of Ti-based fumaric acid hybrid thin films by molecular layer deposition.
Cao YQ; Zhu L; Li X; Cao ZY; Wu D; Li AD
Dalton Trans; 2015 Sep; 44(33):14782-92. PubMed ID: 26219386
[TBL] [Abstract][Full Text] [Related]
17. Atomic layer deposition of rhodium and palladium thin film using low-concentration ozone.
Zou Y; Cheng C; Guo Y; Ong AJ; Goei R; Li S; Yoong Tok AI
RSC Adv; 2021 Jun; 11(37):22773-22779. PubMed ID: 35480446
[TBL] [Abstract][Full Text] [Related]
18. Comparison of the Atomic Layer Deposition of Tantalum Oxide Thin Films Using Ta(N
Song SJ; Park T; Yoon KJ; Yoon JH; Kwon DE; Noh W; Lansalot-Matras C; Gatineau S; Lee HK; Gautam S; Cho DY; Lee SW; Hwang CS
ACS Appl Mater Interfaces; 2017 Jan; 9(1):537-547. PubMed ID: 27936581
[TBL] [Abstract][Full Text] [Related]
19. Self-limiting nitrogen/hydrogen plasma radical chemistry in plasma-enhanced atomic layer deposition of cobalt.
Liu J; Lu H; Zhang DW; Nolan M
Nanoscale; 2022 Mar; 14(12):4712-4725. PubMed ID: 35266469
[TBL] [Abstract][Full Text] [Related]
20. Atomic Layer Deposition of Cobalt Using H
Vos MFJ; van Straaten G; Kessels WMME; Mackus AJM
J Phys Chem C Nanomater Interfaces; 2018 Oct; 122(39):22519-22529. PubMed ID: 30319724
[TBL] [Abstract][Full Text] [Related]
[Next] [New Search]
