These tools will no longer be maintained as of December 31, 2024. Archived website can be found here. PubMed4Hh GitHub repository can be found here. Contact NLM Customer Service if you have questions.


BIOMARKERS

Molecular Biopsy of Human Tumors

- a resource for Precision Medicine *

145 related articles for article (PubMed ID: 30830476)

  • 41. Nitrogen-doped ZnO thin films grown on glass substrates by atomic layer deposition using NH3 as a doping source.
    Lee DH; Kim HS; Noh SJ
    J Nanosci Nanotechnol; 2011 Jan; 11(1):391-5. PubMed ID: 21446462
    [TBL] [Abstract][Full Text] [Related]  

  • 42. Low-Temperature One-Step Growth of AlON Thin Films with Homogenous Nitrogen-Doping Profile by Plasma-Enhanced Atomic Layer Deposition.
    Chen HY; Lu HL; Chen JX; Zhang F; Ji XM; Liu WJ; Yang XF; Zhang DW
    ACS Appl Mater Interfaces; 2017 Nov; 9(44):38662-38669. PubMed ID: 29039913
    [TBL] [Abstract][Full Text] [Related]  

  • 43. Novel Cyclosilazane-Type Silicon Precursor and Two-Step Plasma for Plasma-Enhanced Atomic Layer Deposition of Silicon Nitride.
    Park JM; Jang SJ; Lee SI; Lee WJ
    ACS Appl Mater Interfaces; 2018 Mar; 10(10):9155-9163. PubMed ID: 29461032
    [TBL] [Abstract][Full Text] [Related]  

  • 44. Low-temperature roll-to-roll atmospheric atomic layer deposition of Al₂O₃ thin films.
    Ali K; Choi KH
    Langmuir; 2014 Dec; 30(47):14195-203. PubMed ID: 25407477
    [TBL] [Abstract][Full Text] [Related]  

  • 45. Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N
    Faraz T; van Drunen M; Knoops HC; Mallikarjunan A; Buchanan I; Hausmann DM; Henri J; Kessels WM
    ACS Appl Mater Interfaces; 2017 Jan; 9(2):1858-1869. PubMed ID: 28059494
    [TBL] [Abstract][Full Text] [Related]  

  • 46. Co-dosing Ozone and Deionized Water as Oxidant Precursors of ZnO Thin Film Growth by Atomic Layer Deposition.
    Cheng YC; Wang HC; Feng SW; Li TP; Fung SK; Yuan KY; Chen MJ
    Nanoscale Res Lett; 2020 Jul; 15(1):154. PubMed ID: 32728964
    [TBL] [Abstract][Full Text] [Related]  

  • 47. Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition.
    Motamedi P; Bosnick K; Cui K; Cadien K; Hogan JD
    ACS Appl Mater Interfaces; 2017 Jul; 9(29):24722-24730. PubMed ID: 28671453
    [TBL] [Abstract][Full Text] [Related]  

  • 48. Atomic Layer Deposition of Ultrathin Crystalline Epitaxial Films of V
    Sreedhara MB; Ghatak J; Bharath B; Rao CN
    ACS Appl Mater Interfaces; 2017 Jan; 9(3):3178-3185. PubMed ID: 28032979
    [TBL] [Abstract][Full Text] [Related]  

  • 49. Atomic Interdiffusion and Diffusive Stabilization of Cobalt by Copper During Atomic Layer Deposition from Bis(N-tert-butyl-N'-ethylpropionamidinato) Cobalt(II).
    Elko-Hansen TD; Dolocan A; Ekerdt JG
    J Phys Chem Lett; 2014 Apr; 5(7):1091-5. PubMed ID: 26274454
    [TBL] [Abstract][Full Text] [Related]  

  • 50. Low-Temperature Plasma-Enhanced Atomic Layer Deposition of Tin(IV) Oxide from a Functionalized Alkyl Precursor: Fabrication and Evaluation of SnO
    Mai L; Zanders D; Subaşı E; Ciftyurek E; Hoppe C; Rogalla D; Gilbert W; Arcos TL; Schierbaum K; Grundmeier G; Bock C; Devi A
    ACS Appl Mater Interfaces; 2019 Jan; 11(3):3169-3180. PubMed ID: 30624887
    [TBL] [Abstract][Full Text] [Related]  

  • 51. Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition.
    Kim HJK; Kaplan KE; Schindler P; Xu S; Winterkorn MM; Heinz DB; English TS; Provine J; Prinz FB; Kenny TW
    ACS Appl Mater Interfaces; 2019 Mar; 11(9):9594-9599. PubMed ID: 30707831
    [TBL] [Abstract][Full Text] [Related]  

  • 52. The Properties of Cu Thin Films on Ru Depending on the ALD Temperature.
    Yoon HC; Shin JH; Park HS; Suh SJ
    J Nanosci Nanotechnol; 2015 Feb; 15(2):1601-4. PubMed ID: 26353698
    [TBL] [Abstract][Full Text] [Related]  

  • 53. Laser damage properties of TiO2/Al2O3 thin films grown by atomic layer deposition.
    Wei Y; Liu H; Sheng O; Liu Z; Chen S; Yang L
    Appl Opt; 2011 Aug; 50(24):4720-7. PubMed ID: 21857693
    [TBL] [Abstract][Full Text] [Related]  

  • 54. Annealing-Based Electrical Tuning of Cobalt-Carbon Deposits Grown by Focused-Electron-Beam-Induced Deposition.
    Puydinger Dos Santos MV; Velo MF; Domingos RD; Zhang Y; Maeder X; Guerra-Nuñez C; Best JP; Béron F; Pirota KR; Moshkalev S; Diniz JA; Utke I
    ACS Appl Mater Interfaces; 2016 Nov; 8(47):32496-32503. PubMed ID: 27933832
    [TBL] [Abstract][Full Text] [Related]  

  • 55. Effects of HiPIMS Duty Cycle on Plasma Discharge and the Properties of Cu Film.
    Ren Y; Bai H; Liu X; Li J; Liu X
    Materials (Basel); 2024 May; 17(10):. PubMed ID: 38793378
    [TBL] [Abstract][Full Text] [Related]  

  • 56. Microstructures of HfO
    Kim SY; Jung YC; Seong S; Lee T; Park IS; Ahn J
    Materials (Basel); 2021 Dec; 14(23):. PubMed ID: 34885632
    [TBL] [Abstract][Full Text] [Related]  

  • 57. Inherently Area-Selective Atomic Layer Deposition of Manganese Oxide through Electronegativity-Induced Adsorption.
    Li YC; Cao K; Lan YX; Zhang JM; Gong M; Wen YW; Shan B; Chen R
    Molecules; 2021 May; 26(10):. PubMed ID: 34065464
    [TBL] [Abstract][Full Text] [Related]  

  • 58. Atomic Layer Deposition of Nickel Using a Heteroleptic Ni Precursor with NH
    Kim M; Nabeya S; Nandi DK; Suzuki K; Kim HM; Cho SY; Kim KB; Kim SH
    ACS Omega; 2019 Jun; 4(6):11126-11134. PubMed ID: 31460211
    [TBL] [Abstract][Full Text] [Related]  

  • 59. Study of nitrogen diffusion profile of low resistivity diffusion barrier by resputtering technology.
    Tsao JC; Liu CP; Wang YL; Chen KW
    J Nanosci Nanotechnol; 2009 Feb; 9(2):759-63. PubMed ID: 19441387
    [TBL] [Abstract][Full Text] [Related]  

  • 60. Molecular Layer Deposition of a Highly Stable Silicon Oxycarbide Thin Film Using an Organic Chlorosilane and Water.
    Closser RG; Bergsman DS; Bent SF
    ACS Appl Mater Interfaces; 2018 Jul; 10(28):24266-24274. PubMed ID: 29965720
    [TBL] [Abstract][Full Text] [Related]  

    [Previous]   [Next]    [New Search]
    of 8.