149 related articles for article (PubMed ID: 31305057)
1. ALD HfO
Chia C; Shulaker MM; Provine J; Jeffrey SS; Howe RT
ACS Appl Mater Interfaces; 2019 Jul; 11(29):26082-26092. PubMed ID: 31305057
[TBL] [Abstract][Full Text] [Related]
2. Analysis of Al
Caldwell R; Mandal H; Sharma R; Solzbacher F; Tathireddy P; Rieth L
J Neural Eng; 2017 Aug; 14(4):046011. PubMed ID: 28351998
[TBL] [Abstract][Full Text] [Related]
3. Structural, Optical and Electrical Properties of HfO
Kim KM; Jang JS; Yoon SG; Yun JY; Chung NK
Materials (Basel); 2020 Apr; 13(9):. PubMed ID: 32344793
[TBL] [Abstract][Full Text] [Related]
4. Corrosion Protection of Copper Using Al
Daubert JS; Hill GT; Gotsch HN; Gremaud AP; Ovental JS; Williams PS; Oldham CJ; Parsons GN
ACS Appl Mater Interfaces; 2017 Feb; 9(4):4192-4201. PubMed ID: 28098440
[TBL] [Abstract][Full Text] [Related]
5. Low-Temperature Atomic Layer Deposited Oxide on Titanium Nitride Electrodes Enables Culture and Physiological Recording of Electrogenic Cells.
Dollt M; Reh M; Metzger M; Heusel G; Kriebel M; Bucher V; Zeck G
Front Neurosci; 2020; 14():552876. PubMed ID: 33071735
[TBL] [Abstract][Full Text] [Related]
6. Growth and properties of hafnicone and HfO(2)/hafnicone nanolaminate and alloy films using molecular layer deposition techniques.
Lee BH; Anderson VR; George SM
ACS Appl Mater Interfaces; 2014 Oct; 6(19):16880-7. PubMed ID: 25203487
[TBL] [Abstract][Full Text] [Related]
7. Thickness scaling of atomic-layer-deposited HfO2 films and their application to wafer-scale graphene tunnelling transistors.
Jeong SJ; Gu Y; Heo J; Yang J; Lee CS; Lee MH; Lee Y; Kim H; Park S; Hwang S
Sci Rep; 2016 Feb; 6():20907. PubMed ID: 26861833
[TBL] [Abstract][Full Text] [Related]
8. Structure and Electrical Behavior of Hafnium-Praseodymium Oxide Thin Films Grown by Atomic Layer Deposition.
Kukli K; Aarik L; Vinuesa G; Dueñas S; Castán H; García H; Kasikov A; Ritslaid P; Piirsoo HM; Aarik J
Materials (Basel); 2022 Jan; 15(3):. PubMed ID: 35160824
[TBL] [Abstract][Full Text] [Related]
9. Mesostructured HfO
Zakaria MB; Nagata T; Chikyow T
ACS Omega; 2019 Sep; 4(12):14680-14687. PubMed ID: 31552307
[TBL] [Abstract][Full Text] [Related]
10. Ultrathin ZnS and ZnO Interfacial Passivation Layers for Atomic-Layer-Deposited HfO2 Films on InP Substrates.
Kim SH; Joo SY; Jin HS; Kim WB; Park TJ
ACS Appl Mater Interfaces; 2016 Aug; 8(32):20880-4. PubMed ID: 27467383
[TBL] [Abstract][Full Text] [Related]
11. Plasma-Enhanced Atomic Layer Deposition of HfO
Beladiya V; Faraz T; Schmitt P; Munser AS; Schröder S; Riese S; Mühlig C; Schachtler D; Steger F; Botha R; Otto F; Fritz T; van Helvoirt C; Kessels WMM; Gargouri H; Szeghalmi A
ACS Appl Mater Interfaces; 2022 Mar; 14(12):14677-14692. PubMed ID: 35311275
[TBL] [Abstract][Full Text] [Related]
12. A comparative study on fabrication techniques for on-chip microelectrodes.
Temiz Y; Ferretti A; Leblebici Y; Guiducci C
Lab Chip; 2012 Nov; 12(22):4920-8. PubMed ID: 23042440
[TBL] [Abstract][Full Text] [Related]
13. Atomic Layer Deposited TiO₂ and Al₂O₃ Thin Films as Coatings for Aluminum Food Packaging Application.
Dias V; Maciel H; Fraga M; Lobo AO; Pessoa R; Marciano FR
Materials (Basel); 2019 Feb; 12(4):. PubMed ID: 30823576
[TBL] [Abstract][Full Text] [Related]
14. Preparation of Remote Plasma Atomic Layer-Deposited HfO
Yoo JH; Park WJ; Kim SW; Lee GR; Kim JH; Lee JH; Uhm SH; Lee HC
Nanomaterials (Basel); 2023 Jun; 13(11):. PubMed ID: 37299688
[TBL] [Abstract][Full Text] [Related]
15. Resistance switching characteristics of HfO2 film with electrode for resistance change random access memory.
Park IS; Lee JH; Lee S; Ahn J
J Nanosci Nanotechnol; 2007 Nov; 7(11):4139-42. PubMed ID: 18047136
[TBL] [Abstract][Full Text] [Related]
16. PEALD of HfO
Zanders D; Ciftyurek E; Subaşı E; Huster N; Bock C; Kostka A; Rogalla D; Schierbaum K; Devi A
ACS Appl Mater Interfaces; 2019 Aug; 11(31):28407-28422. PubMed ID: 31339290
[TBL] [Abstract][Full Text] [Related]
17. Structural evolution and the control of defects in atomic layer deposited HfO2-Al2O3 stacked films on GaAs.
Kang YS; Kim DK; Jeong KS; Cho MH; Kim CY; Chung KB; Kim H; Kim DC
ACS Appl Mater Interfaces; 2013 Mar; 5(6):1982-9. PubMed ID: 23438318
[TBL] [Abstract][Full Text] [Related]
18. Electrochemical platinum coatings for improving performance of implantable microelectrode arrays.
de Haro C; Mas R; Abadal G; Muñoz J; Perez-Murano F; Dominguez C
Biomaterials; 2002 Dec; 23(23):4515-21. PubMed ID: 12322971
[TBL] [Abstract][Full Text] [Related]
19. Controlled direct growth of Al2O3-doped HfO2 films on graphene by H2O-based atomic layer deposition.
Zheng L; Cheng X; Yu Y; Xie Y; Li X; Wang Z
Phys Chem Chem Phys; 2015 Feb; 17(5):3179-85. PubMed ID: 25519447
[TBL] [Abstract][Full Text] [Related]
20. Growth and Characterization of Al2O3 Atomic Layer Deposition Films on sp(2)-Graphitic Carbon Substrates Using NO2/Trimethylaluminum Pretreatment.
Young MJ; Musgrave CB; George SM
ACS Appl Mater Interfaces; 2015 Jun; 7(22):12030-7. PubMed ID: 25965097
[TBL] [Abstract][Full Text] [Related]
[Next] [New Search]