These tools will no longer be maintained as of December 31, 2024. Archived website can be found here. PubMed4Hh GitHub repository can be found here. Contact NLM Customer Service if you have questions.


BIOMARKERS

Molecular Biopsy of Human Tumors

- a resource for Precision Medicine *

148 related articles for article (PubMed ID: 31310143)

  • 1. Initial Growth Study of Atomic-Layer Deposition of Al
    Vandalon V; Kessels WMME
    Langmuir; 2019 Aug; 35(32):10374-10382. PubMed ID: 31310143
    [TBL] [Abstract][Full Text] [Related]  

  • 2. In-situ synchrotron radiation photoemission spectroscopy study of the initial atomic layer deposition of Al2O3 film on Si(001) substrate.
    Kim SH; Lee BK; Baik J; Jeon C; Lee SS; Lee J; Hwang HN; Hwang CC; Park CY; An KS
    J Nanosci Nanotechnol; 2011 May; 11(5):4328-32. PubMed ID: 21780451
    [TBL] [Abstract][Full Text] [Related]  

  • 3. Trimethylaluminum and Oxygen Atomic Layer Deposition on Hydroxyl-Free Cu(111).
    Gharachorlou A; Detwiler MD; Gu XK; Mayr L; Klötzer B; Greeley J; Reifenberger RG; Delgass WN; Ribeiro FH; Zemlyanov DY
    ACS Appl Mater Interfaces; 2015 Aug; 7(30):16428-39. PubMed ID: 26158796
    [TBL] [Abstract][Full Text] [Related]  

  • 4. Growth and Characterization of Al2O3 Atomic Layer Deposition Films on sp(2)-Graphitic Carbon Substrates Using NO2/Trimethylaluminum Pretreatment.
    Young MJ; Musgrave CB; George SM
    ACS Appl Mater Interfaces; 2015 Jun; 7(22):12030-7. PubMed ID: 25965097
    [TBL] [Abstract][Full Text] [Related]  

  • 5. Competition between Al
    DuMont JW; George SM
    J Chem Phys; 2017 Feb; 146(5):052819. PubMed ID: 28178819
    [TBL] [Abstract][Full Text] [Related]  

  • 6. Thermal Atomic Layer Etching of SiO
    DuMont JW; Marquardt AE; Cano AM; George SM
    ACS Appl Mater Interfaces; 2017 Mar; 9(11):10296-10307. PubMed ID: 28240864
    [TBL] [Abstract][Full Text] [Related]  

  • 7. Functionalization of the SiO
    Xu W; Haeve MGN; Lemaire PC; Sharma K; Hausmann DM; Agarwal S
    Langmuir; 2022 Jan; 38(2):652-660. PubMed ID: 34990131
    [TBL] [Abstract][Full Text] [Related]  

  • 8. Area-Selective Atomic Layer Deposition of ZnO on Si\SiO
    Moeini B; Avval TG; Brongersma HH; Průša S; Bábík P; Vaníčková E; Strohmeier BR; Bell DS; Eggett D; George SM; Linford MR
    Materials (Basel); 2023 Jun; 16(13):. PubMed ID: 37445002
    [TBL] [Abstract][Full Text] [Related]  

  • 9. Reaction Mechanism of Area-Selective Atomic Layer Deposition for Al
    Seo S; Yeo BC; Han SS; Yoon CM; Yang JY; Yoon J; Yoo C; Kim HJ; Lee YB; Lee SJ; Myoung JM; Lee HB; Kim WH; Oh IK; Kim H
    ACS Appl Mater Interfaces; 2017 Nov; 9(47):41607-41617. PubMed ID: 29111636
    [TBL] [Abstract][Full Text] [Related]  

  • 10. Use of Mixed CH3-/HC(O)CH2CH2-Si(111) Functionality to Control Interfacial Chemical and Electronic Properties During the Atomic-Layer Deposition of Ultrathin Oxides on Si(111).
    O'Leary LE; Strandwitz NC; Roske CW; Pyo S; Brunschwig BS; Lewis NS
    J Phys Chem Lett; 2015 Feb; 6(4):722-6. PubMed ID: 26262493
    [TBL] [Abstract][Full Text] [Related]  

  • 11. In situ auger electron spectroscopy study of atomic layer deposition: growth initiation and interface formation reactions during ruthenium ALD on Si-H, SiO2, and HfO2 surfaces.
    Park KJ; Terry DB; Stewart SM; Parsons GN
    Langmuir; 2007 May; 23(11):6106-12. PubMed ID: 17461600
    [TBL] [Abstract][Full Text] [Related]  

  • 12. Oxidation precursor dependence of atomic layer deposited Al2O3 films in a-Si:H(i)/Al2O3 surface passivation stacks.
    Xiang Y; Zhou C; Jia E; Wang W
    Nanoscale Res Lett; 2015; 10():137. PubMed ID: 25852428
    [TBL] [Abstract][Full Text] [Related]  

  • 13. Surface Chemistry during Atomic Layer Deposition of Pt Studied with Vibrational Sum-Frequency Generation.
    Vandalon V; Mackus AJM; Kessels WMM
    J Phys Chem C Nanomater Interfaces; 2022 Feb; 126(5):2463-2474. PubMed ID: 35178137
    [TBL] [Abstract][Full Text] [Related]  

  • 14.
    Li J; Zhao R; Wang X
    Nanotechnology; 2023 Mar; 34(24):. PubMed ID: 36917851
    [TBL] [Abstract][Full Text] [Related]  

  • 15. Chemical vapor deposition of monolayer-thin WS
    Groven B; Claes D; Nalin Mehta A; Bender H; Vandervorst W; Heyns M; Caymax M; Radu I; Delabie A
    J Chem Phys; 2019 Mar; 150(10):104703. PubMed ID: 30876349
    [TBL] [Abstract][Full Text] [Related]  

  • 16. Structural Properties of Al-O Monolayers in SiO
    Hiller D; Göttlicher J; Steininger R; Huthwelker T; Julin J; Munnik F; Wahl M; Bock W; Schoenaers B; Stesmans A; König D
    ACS Appl Mater Interfaces; 2018 Sep; 10(36):30495-30505. PubMed ID: 30110151
    [TBL] [Abstract][Full Text] [Related]  

  • 17. Modeling and in Situ Probing of Surface Reactions in Atomic Layer Deposition.
    Zheng Y; Hong S; Psofogiannakis G; Rayner GB; Datta S; van Duin ACT; Engel-Herbert R
    ACS Appl Mater Interfaces; 2017 May; 9(18):15848-15856. PubMed ID: 28380291
    [TBL] [Abstract][Full Text] [Related]  

  • 18. Stepwise mechanism and H2O-assisted hydrolysis in atomic layer deposition of SiO2 without a catalyst.
    Fang GY; Xu LN; Wang LG; Cao YQ; Wu D; Li AD
    Nanoscale Res Lett; 2015; 10():68. PubMed ID: 25897298
    [TBL] [Abstract][Full Text] [Related]  

  • 19. Nucleation and growth mechanisms of Al
    Zhang H; Chiappe D; Meersschaut J; Conard T; Franquet A; Nuytten T; Mannarino M; Radu I; Vandervorst W; Delabie A
    J Chem Phys; 2017 Feb; 146(5):052810. PubMed ID: 28178804
    [TBL] [Abstract][Full Text] [Related]  

  • 20. Al2O3 on Black Phosphorus by Atomic Layer Deposition: An in Situ Interface Study.
    Zhu H; McDonnell S; Qin X; Azcatl A; Cheng L; Addou R; Kim J; Ye PD; Wallace RM
    ACS Appl Mater Interfaces; 2015 Jun; 7(23):13038-43. PubMed ID: 26016806
    [TBL] [Abstract][Full Text] [Related]  

    [Next]    [New Search]
    of 8.