These tools will no longer be maintained as of December 31, 2024. Archived website can be found here. PubMed4Hh GitHub repository can be found here. Contact NLM Customer Service if you have questions.
2. Effects of Oxygen Flow during Fabrication by Magnetron Sputtering on Structure and Performance of Zr-Doped HfO Xi Y; Liu L; Zhao J; Qin X; Zhang J; Zhang C; Liu W Materials (Basel); 2023 Aug; 16(16):. PubMed ID: 37629850 [TBL] [Abstract][Full Text] [Related]
3. Controlled direct growth of Al2O3-doped HfO2 films on graphene by H2O-based atomic layer deposition. Zheng L; Cheng X; Yu Y; Xie Y; Li X; Wang Z Phys Chem Chem Phys; 2015 Feb; 17(5):3179-85. PubMed ID: 25519447 [TBL] [Abstract][Full Text] [Related]
4. Comparative Study of Plasma-Enhanced-Atomic-Layer-Deposited Al Lin Z; Song C; Liu T; Shao J; Zhu M ACS Appl Mater Interfaces; 2024 Jun; 16(24):31756-31767. PubMed ID: 38837185 [TBL] [Abstract][Full Text] [Related]
5. Structural evolution and the control of defects in atomic layer deposited HfO2-Al2O3 stacked films on GaAs. Kang YS; Kim DK; Jeong KS; Cho MH; Kim CY; Chung KB; Kim H; Kim DC ACS Appl Mater Interfaces; 2013 Mar; 5(6):1982-9. PubMed ID: 23438318 [TBL] [Abstract][Full Text] [Related]
6. Physical Properties of an Ultrathin Al Xu Y; Chen H; Xu H; Chen M; Zhou P; Li S; Zhang G; Shi W; Yang X; Ding X; Wei B ACS Appl Mater Interfaces; 2023 Apr; 15(13):16874-16881. PubMed ID: 36942855 [TBL] [Abstract][Full Text] [Related]
8. Border Trap Characterizations of Al Rahman MM; Kim DH; Kim TW Nanomaterials (Basel); 2020 Mar; 10(3):. PubMed ID: 32183413 [TBL] [Abstract][Full Text] [Related]
9. Electrical properties and thermal stability in stack structure of HfO Baik M; Kang HK; Kang YS; Jeong KS; An Y; Choi S; Kim H; Song JD; Cho MH Sci Rep; 2017 Sep; 7(1):11337. PubMed ID: 28900097 [TBL] [Abstract][Full Text] [Related]
10. Plasma-Enhanced Atomic Layer Deposition of HfO Beladiya V; Faraz T; Schmitt P; Munser AS; Schröder S; Riese S; Mühlig C; Schachtler D; Steger F; Botha R; Otto F; Fritz T; van Helvoirt C; Kessels WMM; Gargouri H; Szeghalmi A ACS Appl Mater Interfaces; 2022 Mar; 14(12):14677-14692. PubMed ID: 35311275 [TBL] [Abstract][Full Text] [Related]
14. Incorporation of Si and Zr into Pure HfO₂ and Its Effects on Dielectric Integrity. Kim H; Choi P; Lee N; Kim S; Koo K; Lee J; Choi B J Nanosci Nanotechnol; 2018 Sep; 18(9):5899-5903. PubMed ID: 29677713 [TBL] [Abstract][Full Text] [Related]
15. Magneto-ionic control of magnetism in two-oxide nanocomposite thin films comprising mesoporous cobalt ferrite conformally nanocoated with HfO Robbennolt S; Yu P; Nicolenco A; Mercier Fernandez P; Coll M; Sort J Nanoscale; 2020 Mar; 12(10):5987-5994. PubMed ID: 32108848 [TBL] [Abstract][Full Text] [Related]
16. Environmentally stable flexible metal-insulator-metal capacitors using zirconium-silicate and hafnium-silicate thin film composite materials as gate dielectrics. Meena JS; Chu MC; Wu CS; Ravipati S; Ko FH J Nanosci Nanotechnol; 2011 Aug; 11(8):6858-67. PubMed ID: 22103091 [TBL] [Abstract][Full Text] [Related]
18. Preparation of Remote Plasma Atomic Layer-Deposited HfO Yoo JH; Park WJ; Kim SW; Lee GR; Kim JH; Lee JH; Uhm SH; Lee HC Nanomaterials (Basel); 2023 Jun; 13(11):. PubMed ID: 37299688 [TBL] [Abstract][Full Text] [Related]
19. Impedance spectroscopic analysis on effects of partial oxidation of TiN bottom electrode and microstructure of amorphous and crystalline HfO2 thin films on their bipolar resistive switching. Yoon JW; Yoon JH; Lee JH; Hwang CS Nanoscale; 2014 Jun; 6(12):6668-78. PubMed ID: 24817626 [TBL] [Abstract][Full Text] [Related]
20. Selective Pulsed Chemical Vapor Deposition of Water-Free TiO Huang J; Cho Y; Zhang Z; Jan A; Wong KT; Nemani SD; Yieh E; Kummel AC ACS Appl Mater Interfaces; 2022 Apr; 14(13):15716-15727. PubMed ID: 35316031 [TBL] [Abstract][Full Text] [Related] [Next] [New Search]