These tools will no longer be maintained as of December 31, 2024. Archived website can be found here. PubMed4Hh GitHub repository can be found here. Contact NLM Customer Service if you have questions.
154 related articles for article (PubMed ID: 31593424)
1. Anodic Imprint Lithography: Direct Imprinting of Single Crystalline GaAs with Anodic Stamp. Kim K; Ki B; Choi K; Oh J ACS Nano; 2019 Nov; 13(11):13465-13473. PubMed ID: 31593424 [TBL] [Abstract][Full Text] [Related]
2. Resist-Free Direct Stamp Imprinting of GaAs via Metal-Assisted Chemical Etching. Kim K; Ki B; Choi K; Lee S; Oh J ACS Appl Mater Interfaces; 2019 Apr; 11(14):13574-13580. PubMed ID: 30784266 [TBL] [Abstract][Full Text] [Related]
3. Chemical Imprinting of Crystalline Silicon with Catalytic Metal Stamp in Etch Bath. Ki B; Song Y; Choi K; Yum JH; Oh J ACS Nano; 2018 Jan; 12(1):609-616. PubMed ID: 29224336 [TBL] [Abstract][Full Text] [Related]
5. Metal-Assisted Electrochemical Nanoimprinting of Porous and Solid Silicon Wafers. Sharstniou A; Niauzorau S; Junghare A; Azeredo BP J Vis Exp; 2022 Feb; (180):. PubMed ID: 35225282 [TBL] [Abstract][Full Text] [Related]
6. Direct metal nano-imprinting using an embossed solid electrolyte stamp. Kumar A; Hsu KH; Jacobs KE; Ferreira PM; Fang NX Nanotechnology; 2011 Apr; 22(15):155302. PubMed ID: 21389570 [TBL] [Abstract][Full Text] [Related]
7. Stamping-based planarization of flexible substrate for low-pressure UV nanoimprint lithography. Altun AO; Jeong JH; Jung SU; Kim KD; Choi DG; Choi JH; Shim JY; Lee DI; Lee ES J Nanosci Nanotechnol; 2008 Nov; 8(11):5673-7. PubMed ID: 19198287 [TBL] [Abstract][Full Text] [Related]
8. Fabrication of TiO2 memristive arrays by step and flash imprint lithography. Yun DK; Kim KD; Jeong HY; Lee JH; Jeong JH; Choi SY J Nanosci Nanotechnol; 2011 Jan; 11(1):696-700. PubMed ID: 21446526 [TBL] [Abstract][Full Text] [Related]
9. Electrochemical nanoimprint lithography: when nanoimprint lithography meets metal assisted chemical etching. Zhang J; Zhang L; Han L; Tian ZW; Tian ZQ; Zhan D Nanoscale; 2017 Jun; 9(22):7476-7482. PubMed ID: 28530294 [TBL] [Abstract][Full Text] [Related]
10. Ultrasonic-Assisted Electrochemical Nanoimprint Lithography: Forcing Mass Transfer to Enhance the Localized Etching Rate of GaAs. Liu B; Han L; Xu H; Su JJ; Zhan D Chem Asian J; 2023 Sep; 18(18):e202300491. PubMed ID: 37493590 [TBL] [Abstract][Full Text] [Related]
11. Resist Filling Study for UV Nanoimprint Lithography Using Stamps with Various Micro/Nano Ratios. Yin M; Sun H; Wang H Micromachines (Basel); 2018 Jul; 9(7):. PubMed ID: 30424268 [TBL] [Abstract][Full Text] [Related]
12. Improvement of the non-uniform resist patterns in the thermal nanoimprint process using Si stamp with nanoscale rod patterns. Kim Y; Jang H; Park S; Ha D; Lee J J Nanosci Nanotechnol; 2011 Jan; 11(1):301-5. PubMed ID: 21446444 [TBL] [Abstract][Full Text] [Related]
13. Direct imprint of nanostructures in metals using porous anodic alumina stamps. Lang X; Qiu T; Long K; Han D; Nan H; Chu PK Nanotechnology; 2013 Jun; 24(25):255303. PubMed ID: 23723164 [TBL] [Abstract][Full Text] [Related]
14. Evaluation of resistless Ga⁺ beam lithography for UV NIL stamp fabrication. Rumler M; Fader R; Haas A; Rommel M; Bauer AJ; Frey L Nanotechnology; 2013 Sep; 24(36):365302. PubMed ID: 23942207 [TBL] [Abstract][Full Text] [Related]
15. Photoelectric effect accelerated electrochemical corrosion and nanoimprint processes on gallium arsenide wafers. Guo C; Zhang L; Sartin MM; Han L; Tian ZW; Tian ZQ; Zhan D Chem Sci; 2019 Jun; 10(23):5893-5897. PubMed ID: 31360393 [TBL] [Abstract][Full Text] [Related]
16. Patterned self-assembly of gold nanoparticles on chemical templates fabricated by soft UV nanoimprint lithography. Gilles S; Kaulen C; Pabst M; Simon U; Offenhäusser A; Mayer D Nanotechnology; 2011 Jul; 22(29):295301. PubMed ID: 21673378 [TBL] [Abstract][Full Text] [Related]
17. Large area patterning of residue-free metal oxide nanostructures by liquid transfer imprint lithography. Lee S; Jung SH; Jang AR; Yoon SI; Shin HS; Lee HU; Lee J Nanotechnology; 2019 Jun; 30(23):235301. PubMed ID: 30769339 [TBL] [Abstract][Full Text] [Related]
18. Contact electrification induced interfacial reactions and direct electrochemical nanoimprint lithography in n-type gallium arsenate wafer. Zhang J; Zhang L; Wang W; Han L; Jia JC; Tian ZW; Tian ZQ; Zhan D Chem Sci; 2017 Mar; 8(3):2407-2412. PubMed ID: 28451347 [TBL] [Abstract][Full Text] [Related]