These tools will no longer be maintained as of December 31, 2024. Archived website can be found here. PubMed4Hh GitHub repository can be found here. Contact NLM Customer Service if you have questions.


BIOMARKERS

Molecular Biopsy of Human Tumors

- a resource for Precision Medicine *

123 related articles for article (PubMed ID: 31663578)

  • 1. Mechanisms of alumina growth via atomic layer deposition on nickel oxide and metallic nickel surfaces.
    Ospina-Acevedo FA; Perez Beltran S; Balbuena PB
    Phys Chem Chem Phys; 2019 Nov; 21(44):24543-24553. PubMed ID: 31663578
    [TBL] [Abstract][Full Text] [Related]  

  • 2. Trimethylaluminum and Oxygen Atomic Layer Deposition on Hydroxyl-Free Cu(111).
    Gharachorlou A; Detwiler MD; Gu XK; Mayr L; Klötzer B; Greeley J; Reifenberger RG; Delgass WN; Ribeiro FH; Zemlyanov DY
    ACS Appl Mater Interfaces; 2015 Aug; 7(30):16428-39. PubMed ID: 26158796
    [TBL] [Abstract][Full Text] [Related]  

  • 3. Improving Anti-Coking Properties of Ni/Al
    Shi Y; Wang S; Li Y; Yang F; Yu H; Chu Y; Li T; Yin H
    Materials (Basel); 2022 Apr; 15(9):. PubMed ID: 35591379
    [TBL] [Abstract][Full Text] [Related]  

  • 4. Atmospheric pressure atomic layer deposition of Al₂O₃ using trimethyl aluminum and ozone.
    Mousa MB; Oldham CJ; Parsons GN
    Langmuir; 2014 Apr; 30(13):3741-8. PubMed ID: 24617608
    [TBL] [Abstract][Full Text] [Related]  

  • 5. First principles study of the atomic layer deposition of alumina by TMA-H2O-process.
    Weckman T; Laasonen K
    Phys Chem Chem Phys; 2015 Jul; 17(26):17322-34. PubMed ID: 26074271
    [TBL] [Abstract][Full Text] [Related]  

  • 6. Study on the behavior of atomic layer deposition coatings on a nickel substrate at high temperature.
    Heidary DS; Randall CA
    Nanotechnology; 2016 Jun; 27(24):245701. PubMed ID: 27152985
    [TBL] [Abstract][Full Text] [Related]  

  • 7. 3D-nanoarchitectured Pd/Ni catalysts prepared by atomic layer deposition for the electrooxidation of formic acid.
    Assaud L; Monyoncho E; Pitzschel K; Allagui A; Petit M; Hanbücken M; Baranova EA; Santinacci L
    Beilstein J Nanotechnol; 2014; 5():162-72. PubMed ID: 24605281
    [TBL] [Abstract][Full Text] [Related]  

  • 8. Initial Growth Study of Atomic-Layer Deposition of Al
    Vandalon V; Kessels WMME
    Langmuir; 2019 Aug; 35(32):10374-10382. PubMed ID: 31310143
    [TBL] [Abstract][Full Text] [Related]  

  • 9. Reaction Mechanism of Area-Selective Atomic Layer Deposition for Al
    Seo S; Yeo BC; Han SS; Yoon CM; Yang JY; Yoon J; Yoo C; Kim HJ; Lee YB; Lee SJ; Myoung JM; Lee HB; Kim WH; Oh IK; Kim H
    ACS Appl Mater Interfaces; 2017 Nov; 9(47):41607-41617. PubMed ID: 29111636
    [TBL] [Abstract][Full Text] [Related]  

  • 10. Decomposition of Nickel(Ⅱ)-Ethylenediaminetetraacetic acid by Fenton-Like reaction over oxygen vacancies-based Cu-Doped Fe
    Xie W; Zhou F; Bi X; Chen D; Huang Z; Li Y; Sun S; Liu J
    Chemosphere; 2019 Apr; 221():563-572. PubMed ID: 30677726
    [TBL] [Abstract][Full Text] [Related]  

  • 11. Nucleation and growth mechanisms of Al
    Zhang H; Chiappe D; Meersschaut J; Conard T; Franquet A; Nuytten T; Mannarino M; Radu I; Vandervorst W; Delabie A
    J Chem Phys; 2017 Feb; 146(5):052810. PubMed ID: 28178804
    [TBL] [Abstract][Full Text] [Related]  

  • 12. Competition between Al
    DuMont JW; George SM
    J Chem Phys; 2017 Feb; 146(5):052819. PubMed ID: 28178819
    [TBL] [Abstract][Full Text] [Related]  

  • 13. Uniform Atomic Layer Deposition of Al
    Vervuurt RH; Karasulu B; Verheijen MA; Kessels WE; Bol AA
    Chem Mater; 2017 Mar; 29(5):2090-2100. PubMed ID: 28405059
    [TBL] [Abstract][Full Text] [Related]  

  • 14. Interface State Reduction by Plasma-Enhanced Atomic Layer Deposition of Homogeneous Ternary Oxides.
    Vitale SA; Hu W; D'Onofrio R; Soares T; Geis MW
    ACS Appl Mater Interfaces; 2020 Sep; 12(38):43250-43256. PubMed ID: 32865960
    [TBL] [Abstract][Full Text] [Related]  

  • 15. First principles mechanistic study of self-limiting oxidative adsorption of remote oxygen plasma during the atomic layer deposition of alumina.
    Fomengia GN; Nolan M; Elliott SD
    Phys Chem Chem Phys; 2018 Sep; 20(35):22783-22795. PubMed ID: 30141800
    [TBL] [Abstract][Full Text] [Related]  

  • 16. Initial Processes of Atomic Layer Deposition of Al₂O₃ on InGaAs: Interface Formation Mechanisms and Impact on Metal-Insulator-Semiconductor Device Performance.
    Jevasuwan W; Urabe Y; Maeda T; Miyata N; Yasuda T; Yamada H; Hata M; Taoka N; Takenaka M; Takagi S
    Materials (Basel); 2012 Mar; 5(3):404-414. PubMed ID: 28817054
    [TBL] [Abstract][Full Text] [Related]  

  • 17. Growth and Characterization of Al2O3 Atomic Layer Deposition Films on sp(2)-Graphitic Carbon Substrates Using NO2/Trimethylaluminum Pretreatment.
    Young MJ; Musgrave CB; George SM
    ACS Appl Mater Interfaces; 2015 Jun; 7(22):12030-7. PubMed ID: 25965097
    [TBL] [Abstract][Full Text] [Related]  

  • 18. Quartz crystal microbalance studies of Al2O3 atomic layer deposition using trimethylaluminum and water at 125 degrees C.
    Wind RA; George SM
    J Phys Chem A; 2010 Jan; 114(3):1281-9. PubMed ID: 19757806
    [TBL] [Abstract][Full Text] [Related]  

  • 19. Highly dispersed Co deposited on Al
    Clary JM; Van Norman SA; Funke HH; Su D; Musgrave CB; Weimer AW
    Nanotechnology; 2020 Apr; 31(17):175703. PubMed ID: 31913142
    [TBL] [Abstract][Full Text] [Related]  

  • 20. CO2 reforming of CH4 over CeO2-doped Ni/Al2O3 nanocatalyst treated by non-thermal plasma.
    Rahemi N; Haghighi M; Babaluo AA; Jafari MF; Estifaee P
    J Nanosci Nanotechnol; 2013 Jul; 13(7):4896-908. PubMed ID: 23901509
    [TBL] [Abstract][Full Text] [Related]  

    [Next]    [New Search]
    of 7.