These tools will no longer be maintained as of December 31, 2024. Archived website can be found here. PubMed4Hh GitHub repository can be found here. Contact NLM Customer Service if you have questions.
2. Atomic Layer Deposition of Ru Thin Films Using a New Beta-Diketonate Ru Precursor and NH3 Plasma as a Reactant. Jung JH; Lee SJ; Lee HJ; Lee MY; Cheon T; Bae SI; Saito M; Suzuki K; Nabeya S; Lee J; Kim S; Yeom S; Seo JH; Kim SH J Nanosci Nanotechnol; 2015 Nov; 15(11):8472-7. PubMed ID: 26726537 [TBL] [Abstract][Full Text] [Related]
3. Improved oxygen diffusion barrier properties of ruthenium-titanium nitride thin films prepared by plasma-enhanced atomic layer deposition. Jeong SJ; Kim DI; Kim SO; Han TH; Kwon JD; Park JS; Kwon SH J Nanosci Nanotechnol; 2011 Jan; 11(1):671-4. PubMed ID: 21446521 [TBL] [Abstract][Full Text] [Related]
4. Plasma-Enhanced Atomic Layer Deposition of Cobalt Films Using Co(EtCp) Zhu B; Ding ZJ; Wu X; Liu WJ; Zhang DW; Ding SJ Nanoscale Res Lett; 2019 Mar; 14(1):76. PubMed ID: 30830476 [TBL] [Abstract][Full Text] [Related]
5. Improved Properties of the Atomic Layer Deposited Ru Electrode for Dynamic Random-Access Memory Capacitor Using Discrete Feeding Method. Kwon DS; Jeon W; Kim DG; Kim TK; Seo H; Lim J; Hwang CS ACS Appl Mater Interfaces; 2021 May; 13(20):23915-23927. PubMed ID: 33998226 [TBL] [Abstract][Full Text] [Related]
6. Rapid Growth of Crystalline Mn5O8 by Self-Limited Multilayer Deposition using Mn(EtCp)2 and O3. Young MJ; Hare CD; Cavanagh AS; Musgrave CB; George SM ACS Appl Mater Interfaces; 2016 Jul; 8(28):18560-9. PubMed ID: 27351207 [TBL] [Abstract][Full Text] [Related]
8. Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions. Kawasaki M; Hsiao CN; Yang JR; Shiojiri M Micron; 2015 Jul; 74():8-14. PubMed ID: 25910429 [TBL] [Abstract][Full Text] [Related]
9. The Properties of Cu Thin Films on Ru Depending on the ALD Temperature. Yoon HC; Shin JH; Park HS; Suh SJ J Nanosci Nanotechnol; 2015 Feb; 15(2):1601-4. PubMed ID: 26353698 [TBL] [Abstract][Full Text] [Related]
10. Ru nanostructure fabrication using an anodic aluminum oxide nanotemplate and highly conformal Ru atomic layer deposition. Kim WH; Park SJ; Son JY; Kim H Nanotechnology; 2008 Jan; 19(4):045302. PubMed ID: 21817499 [TBL] [Abstract][Full Text] [Related]
11. Atomic layer deposition of tungsten(III) oxide thin films from W2(NMe2)6 and water: precursor-based control of oxidation state in the thin film material. Dezelah CL; El-Kadri OM; Szilágyi IM; Campbell JM; Arstila K; Niinistö L; Winter CH J Am Chem Soc; 2006 Aug; 128(30):9638-9. PubMed ID: 16866511 [TBL] [Abstract][Full Text] [Related]
12. Low-Temperature Atomic Layer Deposition of Highly Conformal Tin Nitride Thin Films for Energy Storage Devices. Ansari MZ; Nandi DK; Janicek P; Ansari SA; Ramesh R; Cheon T; Shong B; Kim SH ACS Appl Mater Interfaces; 2019 Nov; 11(46):43608-43621. PubMed ID: 31633331 [TBL] [Abstract][Full Text] [Related]
13. Ultrathin Rh films on Ru(0001): oxidation in confinement. He Y; Seitsonen AP; Over H J Chem Phys; 2006 Jan; 124(3):034706. PubMed ID: 16438599 [TBL] [Abstract][Full Text] [Related]
14. Thermal atomic layer deposition of Er Jayakodiarachchi N; Liu R; Dharmadasa CD; Hu X; Savage DE; Ward CL; Evans PG; Winter CH Dalton Trans; 2023 Aug; 52(32):11096-11103. PubMed ID: 37531167 [TBL] [Abstract][Full Text] [Related]
15. Effect of Growth Temperature during the Atomic Layer Deposition of the SrTiO Kim SH; Lee W; An CH; Kwon DS; Kim DG; Cha SH; Cho ST; Hwang CS ACS Appl Mater Interfaces; 2018 Dec; 10(48):41544-41551. PubMed ID: 30418741 [TBL] [Abstract][Full Text] [Related]
16. Oxygen-Driven Porous Film Formation of Single-Crystalline Ru Deposited on Au(111). Herd B; Langsdorf D; Sack C; He Y; Over H Langmuir; 2016 May; 32(21):5291-9. PubMed ID: 27173402 [TBL] [Abstract][Full Text] [Related]
17. Atomic layer deposition of superparamagnetic ruthenium-doped iron oxide thin film. Tamm A; Tarre A; Kozlova J; Rähn M; Jõgiaas T; Kahro T; Link J; Stern R RSC Adv; 2021 Feb; 11(13):7521-7526. PubMed ID: 35423279 [TBL] [Abstract][Full Text] [Related]
18. Growth characteristics of Ti-based fumaric acid hybrid thin films by molecular layer deposition. Cao YQ; Zhu L; Li X; Cao ZY; Wu D; Li AD Dalton Trans; 2015 Sep; 44(33):14782-92. PubMed ID: 26219386 [TBL] [Abstract][Full Text] [Related]
19. Engineering the Atomic Layer of RuO Hu Y; Luo X; Wu G; Chao T; Li Z; Qu Y; Li H; Wu Y; Jiang B; Hong X ACS Appl Mater Interfaces; 2019 Nov; 11(45):42298-42304. PubMed ID: 31642318 [TBL] [Abstract][Full Text] [Related]
20. Advanced Atomic Layer Deposition: Ultrathin and Continuous Metal Thin Film Growth and Work Function Control Using the Discrete Feeding Method. Han JW; Jin HS; Kim YJ; Heo JS; Kim WH; Ahn JH; Kim JH; Park TJ Nano Lett; 2022 Jun; 22(11):4589-4595. PubMed ID: 35536043 [TBL] [Abstract][Full Text] [Related] [Next] [New Search]