166 related articles for article (PubMed ID: 32013437)
1. Direct Growth of Continuous and Uniform MoS
Li G; Wang X; Han B; Zhang W; Qi S; Zhang Y; Qiu J; Gao P; Guo S; Long R; Tan Z; Song XZ; Liu N
J Phys Chem Lett; 2020 Feb; 11(4):1570-1577. PubMed ID: 32013437
[TBL] [Abstract][Full Text] [Related]
2. Centimeter-Scale CVD Growth of Highly Crystalline Single-Layer MoS
Tao L; Chen K; Chen Z; Chen W; Gui X; Chen H; Li X; Xu JB
ACS Appl Mater Interfaces; 2017 Apr; 9(13):12073-12081. PubMed ID: 28297598
[TBL] [Abstract][Full Text] [Related]
3. High-mobility three-atom-thick semiconducting films with wafer-scale homogeneity.
Kang K; Xie S; Huang L; Han Y; Huang PY; Mak KF; Kim CJ; Muller D; Park J
Nature; 2015 Apr; 520(7549):656-60. PubMed ID: 25925478
[TBL] [Abstract][Full Text] [Related]
4. Ammonium Salts: New Synergistic Additive for Chemical Vapor Deposition Growth of MoS
Li G; Zhang W; Zhang Y; Lee Y; Zhao Z; Song XZ; Tan Z; Kim K; Liu N
J Phys Chem Lett; 2021 Dec; 12(51):12384-12390. PubMed ID: 34939821
[TBL] [Abstract][Full Text] [Related]
5. Chemical vapor deposition merges MoS
Singh M; Ghosh R; Chen YS; Yen ZL; Hofmann M; Chen YF; Hsieh YP
RSC Adv; 2022 Feb; 12(10):5990-5996. PubMed ID: 35424587
[TBL] [Abstract][Full Text] [Related]
6. In-Plane Mosaic Potential Growth of Large-Area 2D Layered Semiconductors MoS
Chen X; Qiu Y; Yang H; Liu G; Zheng W; Feng W; Cao W; Hu W; Hu P
ACS Appl Mater Interfaces; 2017 Jan; 9(2):1684-1691. PubMed ID: 28008759
[TBL] [Abstract][Full Text] [Related]
7. Statistical study of deep submicron dual-gated field-effect transistors on monolayer chemical vapor deposition molybdenum disulfide films.
Liu H; Si M; Najmaei S; Neal AT; Du Y; Ajayan PM; Lou J; Ye PD
Nano Lett; 2013 Jun; 13(6):2640-6. PubMed ID: 23679044
[TBL] [Abstract][Full Text] [Related]
8. Shape-Uniform, High-Quality Monolayered MoS
Zhang X; Nan H; Xiao S; Wan X; Ni Z; Gu X; Ostrikov K
ACS Appl Mater Interfaces; 2017 Dec; 9(48):42121-42130. PubMed ID: 29111648
[TBL] [Abstract][Full Text] [Related]
9. Barrier-assisted vapor phase CVD of large-area MoS
Durairaj S; Krishnamoorthy P; Raveendran N; Ryu BD; Hong CH; Seo TH; Chandramohan S
Nanoscale Adv; 2020 Sep; 2(9):4106-4116. PubMed ID: 36132761
[TBL] [Abstract][Full Text] [Related]
10. Layer-controlled CVD growth of large-area two-dimensional MoS2 films.
Jeon J; Jang SK; Jeon SM; Yoo G; Jang YH; Park JH; Lee S
Nanoscale; 2015 Feb; 7(5):1688-95. PubMed ID: 25385535
[TBL] [Abstract][Full Text] [Related]
11. Wafer-scale production of highly uniform two-dimensional MoS
Kim T; Mun J; Park H; Joung D; Diware M; Won C; Park J; Jeong SH; Kang SW
Nanotechnology; 2017 May; 28(18):18LT01. PubMed ID: 28346218
[TBL] [Abstract][Full Text] [Related]
12. Chemical Vapor Deposition of Uniform and Large-Domain Molybdenum Disulfide Crystals on Glass/Al
Gao Q; Lu J; Chen S; Chen L; Xu Z; Lin D; Xu S; Liu P; Zhang X; Cai W; Zhang C
Nanomaterials (Basel); 2022 Aug; 12(15):. PubMed ID: 35957148
[TBL] [Abstract][Full Text] [Related]
13. Growth of large-scale and thickness-modulated MoSâ‚‚ nanosheets.
Choudhary N; Park J; Hwang JY; Choi W
ACS Appl Mater Interfaces; 2014 Dec; 6(23):21215-22. PubMed ID: 25382854
[TBL] [Abstract][Full Text] [Related]
14. Remarkable quality improvement of as-grown monolayer MoS
Yang P; Shan Y; Chen J; Ekoya G; Han J; Qiu ZJ; Sun J; Chen F; Wang H; Bao W; Hu L; Zhang RJ; Liu R; Cong C
Nanoscale; 2020 Jan; 12(3):1958-1966. PubMed ID: 31909408
[TBL] [Abstract][Full Text] [Related]
15. Eight In. Wafer-Scale Epitaxial Monolayer MoS
Yu H; Huang L; Zhou L; Peng Y; Li X; Yin P; Zhao J; Zhu M; Wang S; Liu J; Du H; Tang J; Zhang S; Zhou Y; Lu N; Liu K; Li N; Zhang G
Adv Mater; 2024 Apr; ():e2402855. PubMed ID: 38683952
[TBL] [Abstract][Full Text] [Related]
16. Uniform Vapor-Pressure-Based Chemical Vapor Deposition Growth of MoS
Withanage SS; Kalita H; Chung HS; Roy T; Jung Y; Khondaker SI
ACS Omega; 2018 Dec; 3(12):18943-18949. PubMed ID: 31458458
[TBL] [Abstract][Full Text] [Related]
17. Towards Low-Temperature CVD Synthesis and Characterization of Mono- or Few-Layer Molybdenum Disulfide.
Shendokar S; Aryeetey F; Hossen MF; Ignatova T; Aravamudhan S
Micromachines (Basel); 2023 Sep; 14(9):. PubMed ID: 37763921
[TBL] [Abstract]