These tools will no longer be maintained as of December 31, 2024. Archived website can be found here. PubMed4Hh GitHub repository can be found here. Contact NLM Customer Service if you have questions.


BIOMARKERS

Molecular Biopsy of Human Tumors

- a resource for Precision Medicine *

135 related articles for article (PubMed ID: 32110866)

  • 1. Study of Si and Ge Atoms Termination Using H-Dilution in SiGe:H Alloys Deposited by Radio Frequency (13.56 MHz) Plasma Discharge at Low Temperature.
    Cosme I; Kosarev A; Zarate-Galvez S; Martinez HE; Mansurova S; Kudriavtsev Y
    Materials (Basel); 2020 Feb; 13(5):. PubMed ID: 32110866
    [TBL] [Abstract][Full Text] [Related]  

  • 2. Nonthermal plasma synthesized freestanding silicon-germanium alloy nanocrystals.
    Pi XD; Kortshagen U
    Nanotechnology; 2009 Jul; 20(29):295602. PubMed ID: 19567968
    [TBL] [Abstract][Full Text] [Related]  

  • 3. Deposition of Very-Low-Hydrogen-Containing Silicon at a Low Temperature Using Very-High-Frequency (162 MHz) SiH
    Kim KS; Ji YJ; Kim KH; Kang JE; Ellingboe AR; Yeom GY
    Micromachines (Basel); 2022 Jan; 13(2):. PubMed ID: 35208298
    [TBL] [Abstract][Full Text] [Related]  

  • 4. Tuning Hydrogenated Silicon, Germanium, and SiGe Nanocluster Properties Using Theoretical Calculations and a Machine Learning Approach.
    Choi Y; Adamczyk AJ
    J Phys Chem A; 2018 Dec; 122(51):9851-9868. PubMed ID: 30484641
    [TBL] [Abstract][Full Text] [Related]  

  • 5. Electrical and Optical Properties of Si-Incorporated a-C:H Films via the Radio Frequency Plasma-Enhanced Chemical Vapor Deposition Method.
    Kim IJ; Choi WS; Hong B
    J Nanosci Nanotechnol; 2016 May; 16(5):5394-7. PubMed ID: 27483937
    [TBL] [Abstract][Full Text] [Related]  

  • 6. Comparative Study of Hydrogen and Argon Dilution Effects in Amorphous SiC Thin Films Deposited by Plasma Enhanced Chemical Vapor Deposition.
    Zhao T; Qin Y; Wang B; Yang JF
    J Nanosci Nanotechnol; 2015 Sep; 15(9):7371-5. PubMed ID: 26716338
    [TBL] [Abstract][Full Text] [Related]  

  • 7. Effects of boron addition on a-Si(90)Ge(10):H films obtained by low frequency plasma enhanced chemical vapour deposition.
    Pérez AM; Renero FJ; Zúñiga C; Torres A; Santiago C
    J Phys Condens Matter; 2005 Jun; 17(25):3975-83. PubMed ID: 21690712
    [TBL] [Abstract][Full Text] [Related]  

  • 8. Raman microscopy and infrared optical properties of SiGe Mie resonators formed on SiO
    Poborchii V; Bouabdellaoui M; Uchida N; Ronda A; Berbezier I; David T; Ruiz CM; Zazoui M; Sena RP; Abbarchi M; Favre L
    Nanotechnology; 2020 May; 31(19):195602. PubMed ID: 31931487
    [TBL] [Abstract][Full Text] [Related]  

  • 9. Crystallization of Electrodeposited Germanium Thin Film on Silicon (100).
    Abidin MSZ; Matsumura R; Anisuzzaman M; Park JH; Muta S; Mahmood MR; Sadoh T; Hashim AM
    Materials (Basel); 2013 Nov; 6(11):5047-5057. PubMed ID: 28788375
    [TBL] [Abstract][Full Text] [Related]  

  • 10. Highly conducting phosphorous doped Nc-Si:H thin films deposited at high deposition rate by hot-wire chemical vapor deposition method.
    Waman VS; Kamble MM; Ghosh SS; Mayabadi A; Sathe VG; Amalnekar DP; Pathan HM; Jadkar SR
    J Nanosci Nanotechnol; 2012 Nov; 12(11):8459-66. PubMed ID: 23421231
    [TBL] [Abstract][Full Text] [Related]  

  • 11. Improved amorphous/crystalline silicon interface passivation for heterojunction solar cells by low-temperature chemical vapor deposition and post-annealing treatment.
    Wang F; Zhang X; Wang L; Jiang Y; Wei C; Xu S; Zhao Y
    Phys Chem Chem Phys; 2014 Oct; 16(37):20202-8. PubMed ID: 25138166
    [TBL] [Abstract][Full Text] [Related]  

  • 12. Theoretical studies of the passivants' effect on the Si(x)Ge(1-x) nanowires: composition profiles, diameter, shape, and electronic properties.
    Yang XB; Zhao YJ; Xu H
    J Chem Phys; 2013 Oct; 139(15):154713. PubMed ID: 24160539
    [TBL] [Abstract][Full Text] [Related]  

  • 13. Secondary growth mechanism of SiGe islands deposited on a mixed-phase microcrystalline Si by ion beam co-sputtering.
    Ke SY; Yang J; Qiu F; Wang ZQ; Wang C; Yang Y
    Nanotechnology; 2015 Nov; 26(44):445602. PubMed ID: 26457572
    [TBL] [Abstract][Full Text] [Related]  

  • 14. Role of trimethylboron to silane ratio on the properties of p-type nanocrystalline silicon thin film deposited by radio frequency plasma enhanced chemical vapour deposition.
    Aguas H; Filonovich SA; Bernacka-Wojcik I; Fortunato E; Martins R
    J Nanosci Nanotechnol; 2010 Apr; 10(4):2547-51. PubMed ID: 20355460
    [TBL] [Abstract][Full Text] [Related]  

  • 15. Structural evolution in amorphous silicon and germanium thin films.
    Chen LJ; Cheng SL; Yu CH; Su PY; Lin HH; Chi KS
    Microsc Microanal; 2002 Aug; 8(4):268-73. PubMed ID: 12533224
    [TBL] [Abstract][Full Text] [Related]  

  • 16. Ion-Beam-Induced Atomic Mixing in Ge, Si, and SiGe, Studied by Means of Isotope Multilayer Structures.
    Radek M; Liedke B; Schmidt B; Voelskow M; Bischoff L; Hansen JL; Larsen AN; Bougeard D; Böttger R; Prucnal S; Posselt M; Bracht H
    Materials (Basel); 2017 Jul; 10(7):. PubMed ID: 28773172
    [TBL] [Abstract][Full Text] [Related]  

  • 17. Effects of low argon dilution ratio on the nanocrystallization and properties of a-Si:H thin films.
    Li Z; Li W; Cai H; Gong Y; Jiang Y
    J Nanosci Nanotechnol; 2010 Nov; 10(11):7667-70. PubMed ID: 21138006
    [TBL] [Abstract][Full Text] [Related]  

  • 18. Investigation of structural disorder using electron temperature in VHF-PECVD on hydrogenated amorphous silicon films for thin film solar cell applications.
    Shin C; Park J; Kim S; Jang J; Jung J; Lee YJ; Yi J
    J Nanosci Nanotechnol; 2014 Oct; 14(10):8110-6. PubMed ID: 25942934
    [TBL] [Abstract][Full Text] [Related]  

  • 19. Short range order and stability of amorphous Ge(x)Te(100-x) alloys (12 ≤ x ≤ 44.6).
    Jóvári P; Piarristeguy A; Escalier R; Kaban I; Bednarčik J; Pradel A
    J Phys Condens Matter; 2013 May; 25(19):195401. PubMed ID: 23604168
    [TBL] [Abstract][Full Text] [Related]  

  • 20. Characterization of intrinsic a-Si:H films prepared by inductively coupled plasma chemical vapor deposition for solar cell applications.
    Jeong C; Boo S; Jeon M; Kamisako K
    J Nanosci Nanotechnol; 2007 Nov; 7(11):4169-73. PubMed ID: 18047144
    [TBL] [Abstract][Full Text] [Related]  

    [Next]    [New Search]
    of 7.