These tools will no longer be maintained as of December 31, 2024. Archived website can be found here. PubMed4Hh GitHub repository can be found here. Contact NLM Customer Service if you have questions.


BIOMARKERS

Molecular Biopsy of Human Tumors

- a resource for Precision Medicine *

159 related articles for article (PubMed ID: 32118980)

  • 1. Intensity modulation based optical proximity optimization for the maskless lithography.
    Liu J; Liu J; Deng Q; Feng J; Zhou S; Hu S
    Opt Express; 2020 Jan; 28(1):548-557. PubMed ID: 32118980
    [TBL] [Abstract][Full Text] [Related]  

  • 2. Genetic algorithm-based optical proximity correction for DMD maskless lithography.
    Yang Z; Lin J; Liu L; Zhu Z; Zhang R; Wen S; Yin Y; Lan C; Li C; Liu Y
    Opt Express; 2023 Jul; 31(14):23598-23607. PubMed ID: 37475440
    [TBL] [Abstract][Full Text] [Related]  

  • 3. Fabrication of Micro-Optics Elements with Arbitrary Surface Profiles Based on One-Step Maskless Grayscale Lithography.
    Deng Q; Yang Y; Gao H; Zhou Y; He Y; Hu S
    Micromachines (Basel); 2017 Oct; 8(10):. PubMed ID: 30400504
    [TBL] [Abstract][Full Text] [Related]  

  • 4. Optical proximity correction of hot-spot patterns with subwavelength size in DMD maskless projection lithography.
    Guo X; Chen JT; Zhao YY; Cai SC; Duan XM
    Opt Lett; 2024 Feb; 49(4):810-813. PubMed ID: 38359188
    [TBL] [Abstract][Full Text] [Related]  

  • 5. Consistent pattern printing of the gap structure in femtosecond laser DMD projection lithography.
    Wang TW; Dong XZ; Jin F; Zhao YY; Liu XY; Zheng ML; Duan XM
    Opt Express; 2022 Sep; 30(20):36791-36801. PubMed ID: 36258601
    [TBL] [Abstract][Full Text] [Related]  

  • 6. Method for improving the speed and pattern quality of a DMD maskless lithography system using a pulse exposure method.
    Choi J; Kim G; Lee WS; Chang WS; Yoo H
    Opt Express; 2022 Jun; 30(13):22487-22500. PubMed ID: 36224945
    [TBL] [Abstract][Full Text] [Related]  

  • 7. Fine-tuned grayscale optofluidic maskless lithography for three-dimensional freeform shape microstructure fabrication.
    Song SH; Kim K; Choi SE; Han S; Lee HS; Kwon S; Park W
    Opt Lett; 2014 Sep; 39(17):5162-5. PubMed ID: 25166099
    [TBL] [Abstract][Full Text] [Related]  

  • 8. Enhancement of pattern quality in maskless plasmonic lithography via spatial loss modulation.
    Han D; Deng S; Ye T; Wei Y
    Microsyst Nanoeng; 2023; 9():40. PubMed ID: 37007604
    [TBL] [Abstract][Full Text] [Related]  

  • 9. Spatial modulation of scalable nanostructures by combining maskless plasmonic lithography and grayscale-patterned strategy.
    Han D; Ye T; Wei Y
    Nanoscale Adv; 2023 Aug; 5(17):4424-4434. PubMed ID: 37638165
    [TBL] [Abstract][Full Text] [Related]  

  • 10. Batch fabrication of functional optical elements on a fiber facet using DMD based maskless lithography.
    Kim JB; Jeong KH
    Opt Express; 2017 Jul; 25(14):16854-16859. PubMed ID: 28789184
    [TBL] [Abstract][Full Text] [Related]  

  • 11. Edge smoothing optimization method in DMD digital lithography system based on dynamic blur matching pixel overlap technique.
    Huang S; Ren B; Tang Y; Wu D; Pan J; Tian Z; Jiang C; Li Z; Huang J
    Opt Express; 2024 Jan; 32(2):2114-2123. PubMed ID: 38297748
    [TBL] [Abstract][Full Text] [Related]  

  • 12. Maskless lithography for large area patterning of three-dimensional microstructures with application on a light guiding plate.
    Syu YS; Huang YB; Jiang MZ; Wu CY; Lee YC
    Opt Express; 2023 Apr; 31(8):12232-12248. PubMed ID: 37157387
    [TBL] [Abstract][Full Text] [Related]  

  • 13. Edge smoothness enhancement in DMD scanning lithography system based on a wobulation technique.
    Chen R; Liu H; Zhang H; Zhang W; Xu J; Xu W; Li J
    Opt Express; 2017 Sep; 25(18):21958-21968. PubMed ID: 29041486
    [TBL] [Abstract][Full Text] [Related]  

  • 14. Computational rule-based approach for corner correction of non-Manhattan geometries in mask aligner photolithography.
    Vetter A; Yan C; Kirner R; Scharf T; Noell W; Voelkel R; Rockstuhl C
    Opt Express; 2019 Oct; 27(22):32523-32535. PubMed ID: 31684463
    [TBL] [Abstract][Full Text] [Related]  

  • 15. Vectorial pupil optimization to compensate polarization distortion in immersion lithography system.
    Li T; Liu Y; Sun Y; Yan X; Wei P; Li Y
    Opt Express; 2020 Feb; 28(4):4412-4425. PubMed ID: 32121678
    [TBL] [Abstract][Full Text] [Related]  

  • 16. Fabrication of hexagonal compound eye microlens array using DMD-based lithography with dose modulation.
    Yang B; Zhou J; Chen Q; Lei L; Wen K
    Opt Express; 2018 Oct; 26(22):28927-28937. PubMed ID: 30470062
    [TBL] [Abstract][Full Text] [Related]  

  • 17. Informatics-based computational lithography for phase-shifting mask optimization.
    Pan Y; Ma X
    Opt Express; 2022 Jun; 30(12):21282-21294. PubMed ID: 36224851
    [TBL] [Abstract][Full Text] [Related]  

  • 18. Nodal line-scanning method for maskless optical lithography.
    Johnson KC
    Appl Opt; 2014 Dec; 53(34):J7-18. PubMed ID: 25607977
    [TBL] [Abstract][Full Text] [Related]  

  • 19. Maskless projection lithography for the fast and flexible generation of grayscale protein patterns.
    Waldbaur A; Waterkotte B; Schmitz K; Rapp BE
    Small; 2012 May; 8(10):1570-8. PubMed ID: 22411542
    [TBL] [Abstract][Full Text] [Related]  

  • 20. Mask optimization approaches in optical lithography based on a vector imaging model.
    Ma X; Li Y; Dong L
    J Opt Soc Am A Opt Image Sci Vis; 2012 Jul; 29(7):1300-12. PubMed ID: 22751396
    [TBL] [Abstract][Full Text] [Related]  

    [Next]    [New Search]
    of 8.