159 related articles for article (PubMed ID: 32118980)
1. Intensity modulation based optical proximity optimization for the maskless lithography.
Liu J; Liu J; Deng Q; Feng J; Zhou S; Hu S
Opt Express; 2020 Jan; 28(1):548-557. PubMed ID: 32118980
[TBL] [Abstract][Full Text] [Related]
2. Genetic algorithm-based optical proximity correction for DMD maskless lithography.
Yang Z; Lin J; Liu L; Zhu Z; Zhang R; Wen S; Yin Y; Lan C; Li C; Liu Y
Opt Express; 2023 Jul; 31(14):23598-23607. PubMed ID: 37475440
[TBL] [Abstract][Full Text] [Related]
3. Fabrication of Micro-Optics Elements with Arbitrary Surface Profiles Based on One-Step Maskless Grayscale Lithography.
Deng Q; Yang Y; Gao H; Zhou Y; He Y; Hu S
Micromachines (Basel); 2017 Oct; 8(10):. PubMed ID: 30400504
[TBL] [Abstract][Full Text] [Related]
4. Optical proximity correction of hot-spot patterns with subwavelength size in DMD maskless projection lithography.
Guo X; Chen JT; Zhao YY; Cai SC; Duan XM
Opt Lett; 2024 Feb; 49(4):810-813. PubMed ID: 38359188
[TBL] [Abstract][Full Text] [Related]
5. Consistent pattern printing of the gap structure in femtosecond laser DMD projection lithography.
Wang TW; Dong XZ; Jin F; Zhao YY; Liu XY; Zheng ML; Duan XM
Opt Express; 2022 Sep; 30(20):36791-36801. PubMed ID: 36258601
[TBL] [Abstract][Full Text] [Related]
6. Method for improving the speed and pattern quality of a DMD maskless lithography system using a pulse exposure method.
Choi J; Kim G; Lee WS; Chang WS; Yoo H
Opt Express; 2022 Jun; 30(13):22487-22500. PubMed ID: 36224945
[TBL] [Abstract][Full Text] [Related]
7. Fine-tuned grayscale optofluidic maskless lithography for three-dimensional freeform shape microstructure fabrication.
Song SH; Kim K; Choi SE; Han S; Lee HS; Kwon S; Park W
Opt Lett; 2014 Sep; 39(17):5162-5. PubMed ID: 25166099
[TBL] [Abstract][Full Text] [Related]
8. Enhancement of pattern quality in maskless plasmonic lithography via spatial loss modulation.
Han D; Deng S; Ye T; Wei Y
Microsyst Nanoeng; 2023; 9():40. PubMed ID: 37007604
[TBL] [Abstract][Full Text] [Related]
9. Spatial modulation of scalable nanostructures by combining maskless plasmonic lithography and grayscale-patterned strategy.
Han D; Ye T; Wei Y
Nanoscale Adv; 2023 Aug; 5(17):4424-4434. PubMed ID: 37638165
[TBL] [Abstract][Full Text] [Related]
10. Batch fabrication of functional optical elements on a fiber facet using DMD based maskless lithography.
Kim JB; Jeong KH
Opt Express; 2017 Jul; 25(14):16854-16859. PubMed ID: 28789184
[TBL] [Abstract][Full Text] [Related]
11. Edge smoothing optimization method in DMD digital lithography system based on dynamic blur matching pixel overlap technique.
Huang S; Ren B; Tang Y; Wu D; Pan J; Tian Z; Jiang C; Li Z; Huang J
Opt Express; 2024 Jan; 32(2):2114-2123. PubMed ID: 38297748
[TBL] [Abstract][Full Text] [Related]
12. Maskless lithography for large area patterning of three-dimensional microstructures with application on a light guiding plate.
Syu YS; Huang YB; Jiang MZ; Wu CY; Lee YC
Opt Express; 2023 Apr; 31(8):12232-12248. PubMed ID: 37157387
[TBL] [Abstract][Full Text] [Related]
13. Edge smoothness enhancement in DMD scanning lithography system based on a wobulation technique.
Chen R; Liu H; Zhang H; Zhang W; Xu J; Xu W; Li J
Opt Express; 2017 Sep; 25(18):21958-21968. PubMed ID: 29041486
[TBL] [Abstract][Full Text] [Related]
14. Computational rule-based approach for corner correction of non-Manhattan geometries in mask aligner photolithography.
Vetter A; Yan C; Kirner R; Scharf T; Noell W; Voelkel R; Rockstuhl C
Opt Express; 2019 Oct; 27(22):32523-32535. PubMed ID: 31684463
[TBL] [Abstract][Full Text] [Related]
15. Vectorial pupil optimization to compensate polarization distortion in immersion lithography system.
Li T; Liu Y; Sun Y; Yan X; Wei P; Li Y
Opt Express; 2020 Feb; 28(4):4412-4425. PubMed ID: 32121678
[TBL] [Abstract][Full Text] [Related]
16. Fabrication of hexagonal compound eye microlens array using DMD-based lithography with dose modulation.
Yang B; Zhou J; Chen Q; Lei L; Wen K
Opt Express; 2018 Oct; 26(22):28927-28937. PubMed ID: 30470062
[TBL] [Abstract][Full Text] [Related]
17. Informatics-based computational lithography for phase-shifting mask optimization.
Pan Y; Ma X
Opt Express; 2022 Jun; 30(12):21282-21294. PubMed ID: 36224851
[TBL] [Abstract][Full Text] [Related]
18. Nodal line-scanning method for maskless optical lithography.
Johnson KC
Appl Opt; 2014 Dec; 53(34):J7-18. PubMed ID: 25607977
[TBL] [Abstract][Full Text] [Related]
19. Maskless projection lithography for the fast and flexible generation of grayscale protein patterns.
Waldbaur A; Waterkotte B; Schmitz K; Rapp BE
Small; 2012 May; 8(10):1570-8. PubMed ID: 22411542
[TBL] [Abstract][Full Text] [Related]
20. Mask optimization approaches in optical lithography based on a vector imaging model.
Ma X; Li Y; Dong L
J Opt Soc Am A Opt Image Sci Vis; 2012 Jul; 29(7):1300-12. PubMed ID: 22751396
[TBL] [Abstract][Full Text] [Related]
[Next] [New Search]