These tools will no longer be maintained as of December 31, 2024. Archived website can be found here. PubMed4Hh GitHub repository can be found here. Contact NLM Customer Service if you have questions.


BIOMARKERS

Molecular Biopsy of Human Tumors

- a resource for Precision Medicine *

206 related articles for article (PubMed ID: 32182972)

  • 1. Effects of Ion Beam Etching on the Nanoscale Damage Precursor Evolution of Fused Silica.
    Zhong Y; Dai Y; Shi F; Song C; Tian Y; Lin Z; Zhang W; Shen Y
    Materials (Basel); 2020 Mar; 13(6):. PubMed ID: 32182972
    [TBL] [Abstract][Full Text] [Related]  

  • 2. Detailed near-surface nanoscale damage precursor measurement and characterization of fused silica optics assisted by ion beam etching.
    Zhong Y; Shi F; Tian Y; Dai Y; Song C; Zhang W; Lin Z
    Opt Express; 2019 Apr; 27(8):10826-10838. PubMed ID: 31052937
    [TBL] [Abstract][Full Text] [Related]  

  • 3. Investigation of surface damage precursor evolutions and laser-induced damage threshold improvement mechanism during Ion beam etching of fused silica.
    Shi F; Zhong Y; Dai Y; Peng X; Xu M; Sui T
    Opt Express; 2016 Sep; 24(18):20842-54. PubMed ID: 27607688
    [TBL] [Abstract][Full Text] [Related]  

  • 4. Reaction ion etching process for improving laser damage resistance of fused silica optical surface.
    Sun L; Liu H; Huang J; Ye X; Xia H; Li Q; Jiang X; Wu W; Yang L; Zheng W
    Opt Express; 2016 Jan; 24(1):199-211. PubMed ID: 26832251
    [TBL] [Abstract][Full Text] [Related]  

  • 5. Effects of combined process of reactive ion etching and dynamic chemical etching on UV laser damage resistance and surface quality of fused silica optics.
    Sun L; Huang J; Shao T; Ye X; Li Q; Jiang X; Wu W; Yang L; Zheng W
    Opt Express; 2018 Jul; 26(14):18006-18018. PubMed ID: 30114081
    [TBL] [Abstract][Full Text] [Related]  

  • 6. Role of each step in the combined treatment of reactive ion etching and dynamic chemical etching for improving the laser-induced damage resistance of fused silica.
    Shao T; Shi Z; Sun L; Ye X; Huang J; Li B; Yang L; Zheng W
    Opt Express; 2021 Apr; 29(8):12365-12380. PubMed ID: 33984998
    [TBL] [Abstract][Full Text] [Related]  

  • 7. Research on the mitigation of redeposition defects on the fused silica surface during wet etching process.
    Li C; Yang K; Zhang Z; Qian Y; Liu T; Yan H; Huang J; Yao L; Zheng Y; Jiang X; Zheng W
    Opt Express; 2024 Mar; 32(6):8638-8656. PubMed ID: 38571118
    [TBL] [Abstract][Full Text] [Related]  

  • 8. Understanding the effect of HF-based wet shallow etching on optical performance of reactive-ion-etched fused silica optics.
    Sun L; Shao T; Zhou X; Li W; Li F; Ye X; Huang J; Chen S; Li B; Yang L; Zheng W
    RSC Adv; 2021 Sep; 11(47):29323-29332. PubMed ID: 35479536
    [TBL] [Abstract][Full Text] [Related]  

  • 9. Study on the Absorption Characteristics and Laser Damage Properties of Fused Silica Optics under Flexible Polishing and Shallow DCE Process.
    Zhang W; Shi F; Song C; Tian Y; Shen Y
    Micromachines (Basel); 2021 Oct; 12(10):. PubMed ID: 34683277
    [TBL] [Abstract][Full Text] [Related]  

  • 10. Ultraviolet Laser Damage Dependence on Contamination Concentration in Fused Silica Optics during Reactive Ion Etching Process.
    Sun L; Shao T; Shi Z; Huang J; Ye X; Jiang X; Wu W; Yang L; Zheng W
    Materials (Basel); 2018 Apr; 11(4):. PubMed ID: 29642571
    [TBL] [Abstract][Full Text] [Related]  

  • 11. Advanced Mitigation Process (AMP) for Improving Laser Damage Threshold of Fused Silica Optics.
    Ye X; Huang J; Liu H; Geng F; Sun L; Jiang X; Wu W; Qiao L; Zu X; Zheng W
    Sci Rep; 2016 Aug; 6():31111. PubMed ID: 27484188
    [TBL] [Abstract][Full Text] [Related]  

  • 12. Non-destructive evaluation of UV pulse laser-induced damage performance of fused silica optics.
    Huang J; Wang F; Liu H; Geng F; Jiang X; Sun L; Ye X; Li Q; Wu W; Zheng W; Sun D
    Sci Rep; 2017 Nov; 7(1):16239. PubMed ID: 29176659
    [TBL] [Abstract][Full Text] [Related]  

  • 13. Traceless mitigation of laser damage precursors on a fused silica surface by combining reactive ion beam etching with dynamic chemical etching.
    Sun L; Shao T; Xu J; Zhou X; Ye X; Huang J; Bai J; Jiang X; Zheng W; Yang L
    RSC Adv; 2018 Sep; 8(57):32417-32422. PubMed ID: 35547680
    [TBL] [Abstract][Full Text] [Related]  

  • 14. Post-processing of fused silica and its effects on damage resistance to nanosecond pulsed UV lasers.
    Ye H; Li Y; Zhang Q; Wang W; Yuan Z; Wang J; Xu Q
    Appl Opt; 2016 Apr; 55(11):3017-25. PubMed ID: 27139869
    [TBL] [Abstract][Full Text] [Related]  

  • 15. Detailed subsurface damage measurement and efficient damage-free fabrication of fused silica optics assisted by ion beam sputtering.
    Liao W; Dai Y; Liu Z; Xie X; Nie X; Xu M
    Opt Express; 2016 Feb; 24(4):4247-57. PubMed ID: 26907072
    [TBL] [Abstract][Full Text] [Related]  

  • 16. Subsurface defects of fused silica optics and laser induced damage at 351 nm.
    Hongjie L; Jin H; Fengrui W; Xinda Z; Xin Y; Xiaoyan Z; Laixi S; Xiaodong J; Zhan S; Wanguo Z
    Opt Express; 2013 May; 21(10):12204-17. PubMed ID: 23736441
    [TBL] [Abstract][Full Text] [Related]  

  • 17. Capping a glass thin layer on the etched surface via plasma chemical vapor deposition for improving the laser damage performance of fused silica.
    Li C; Sun Y; Song X; Zhang X; Shi Z; Wang F; Ye X; Chen S; Sun L; Huang J; Wu W; Jiang X
    Opt Express; 2019 Feb; 27(3):2268-2280. PubMed ID: 30732266
    [TBL] [Abstract][Full Text] [Related]  

  • 18. Role of defects in laser-induced modifications of silica coatings and fused silica using picosecond pulses at 1053 nm: II. Scaling laws and the density of precursors.
    Laurence TA; Negres RA; Ly S; Shen N; Carr CW; Alessi DA; Rigatti A; Bude JD
    Opt Express; 2017 Jun; 25(13):15381-15401. PubMed ID: 28788965
    [TBL] [Abstract][Full Text] [Related]  

  • 19. Surface molecular structure defects and laser-induced damage threshold of fused silica during a manufacturing process.
    Li Y; Yan H; Yang K; Yao C; Wang Z; Zou X; Yan C; Yuan X; Ju X; Yang L
    Sci Rep; 2017 Dec; 7(1):17870. PubMed ID: 29259296
    [TBL] [Abstract][Full Text] [Related]  

  • 20. Ground fused silica processed by combined chemical etching and CO
    Cao Z; Wei C; Cheng X; Zhao Y; Peng X; Jiang Z; Shao J
    Opt Lett; 2020 Nov; 45(21):6014-6017. PubMed ID: 33137057
    [TBL] [Abstract][Full Text] [Related]  

    [Next]    [New Search]
    of 11.