These tools will no longer be maintained as of December 31, 2024. Archived website can be found here. PubMed4Hh GitHub repository can be found here. Contact NLM Customer Service if you have questions.


BIOMARKERS

Molecular Biopsy of Human Tumors

- a resource for Precision Medicine *

109 related articles for article (PubMed ID: 32805802)

  • 1. Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics.
    Giordano MC; Baumgaertl K; Escobar Steinvall S; Gay J; Vuichard M; Fontcuberta I Morral A; Grundler D
    ACS Appl Mater Interfaces; 2020 Sep; 12(36):40443-40452. PubMed ID: 32805802
    [TBL] [Abstract][Full Text] [Related]  

  • 2. Ni
    Giordano MC; Escobar Steinvall S; Watanabe S; Fontcuberta I Morral A; Grundler D
    Nanoscale; 2021 Aug; 13(31):13451-13462. PubMed ID: 34477750
    [TBL] [Abstract][Full Text] [Related]  

  • 3. Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition.
    Motamedi P; Bosnick K; Cui K; Cadien K; Hogan JD
    ACS Appl Mater Interfaces; 2017 Jul; 9(29):24722-24730. PubMed ID: 28671453
    [TBL] [Abstract][Full Text] [Related]  

  • 4. Atomic Layer Deposition of Nickel Carbide from a Nickel Amidinate Precursor and Hydrogen Plasma.
    Guo Q; Guo Z; Shi J; Xiong W; Zhang H; Chen Q; Liu Z; Wang X
    ACS Appl Mater Interfaces; 2018 Mar; 10(9):8384-8390. PubMed ID: 29443492
    [TBL] [Abstract][Full Text] [Related]  

  • 5. Ru nanostructure fabrication using an anodic aluminum oxide nanotemplate and highly conformal Ru atomic layer deposition.
    Kim WH; Park SJ; Son JY; Kim H
    Nanotechnology; 2008 Jan; 19(4):045302. PubMed ID: 21817499
    [TBL] [Abstract][Full Text] [Related]  

  • 6. Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N
    Faraz T; van Drunen M; Knoops HC; Mallikarjunan A; Buchanan I; Hausmann DM; Henri J; Kessels WM
    ACS Appl Mater Interfaces; 2017 Jan; 9(2):1858-1869. PubMed ID: 28059494
    [TBL] [Abstract][Full Text] [Related]  

  • 7. Temperature-dependent magnetic properties of Ni nanotubes synthesized by atomic layer deposition.
    Pereira A; Palma JL; Denardin JC; Escrig J
    Nanotechnology; 2016 Aug; 27(34):345709. PubMed ID: 27454022
    [TBL] [Abstract][Full Text] [Related]  

  • 8. Magnetic and electrical characterization of nickel-rich NiFe thin films synthesized by atomic layer deposition and subsequent thermal reduction.
    Espejo AP; Zierold R; Gooth J; Dendooven J; Detavernier C; Escrig J; Nielsch K
    Nanotechnology; 2016 Aug; 27(34):345707. PubMed ID: 27454574
    [TBL] [Abstract][Full Text] [Related]  

  • 9. Low-Temperature Atomic Layer Deposition of Highly Conformal Tin Nitride Thin Films for Energy Storage Devices.
    Ansari MZ; Nandi DK; Janicek P; Ansari SA; Ramesh R; Cheon T; Shong B; Kim SH
    ACS Appl Mater Interfaces; 2019 Nov; 11(46):43608-43621. PubMed ID: 31633331
    [TBL] [Abstract][Full Text] [Related]  

  • 10. Plasma-Enhanced Atomic Layer Deposition of Nanostructured Gold Near Room Temperature.
    Van Daele M; Griffiths MBE; Raza A; Minjauw MM; Solano E; Feng JY; Ramachandran RK; Clemmen S; Baets R; Barry ST; Detavernier C; Dendooven J
    ACS Appl Mater Interfaces; 2019 Oct; 11(40):37229-37238. PubMed ID: 31523948
    [TBL] [Abstract][Full Text] [Related]  

  • 11. Low Temperature, Selective Atomic Layer Deposition of Nickel Metal Thin Films.
    Kerrigan MM; Klesko JP; Blakeney KJ; Winter CH
    ACS Appl Mater Interfaces; 2018 Apr; 10(16):14200-14208. PubMed ID: 29630338
    [TBL] [Abstract][Full Text] [Related]  

  • 12. Atomic layer deposition of nickel-cobalt spinel thin films.
    Hagen DJ; Tripathi TS; Karppinen M
    Dalton Trans; 2017 Apr; 46(14):4796-4805. PubMed ID: 28345704
    [TBL] [Abstract][Full Text] [Related]  

  • 13. Highly Uniform Atomic Layer-Deposited MoS
    Nandi DK; Sahoo S; Sinha S; Yeo S; Kim H; Bulakhe RN; Heo J; Shim JJ; Kim SH
    ACS Appl Mater Interfaces; 2017 Nov; 9(46):40252-40264. PubMed ID: 29099166
    [TBL] [Abstract][Full Text] [Related]  

  • 14. Atomic layer deposition of aluminum oxide films for carbon nanotube network transistor passivation.
    Grigoras K; Zavodchikova MY; Nasibulin AG; Kauppinen EI; Ermolov V; Franssila S
    J Nanosci Nanotechnol; 2011 Oct; 11(10):8818-25. PubMed ID: 22400265
    [TBL] [Abstract][Full Text] [Related]  

  • 15. Influence of NiO ALD Coatings on the Field Emission Characteristic of CNT Arrays.
    Chumak MA; Filatov LA; Ezhov IS; Kolosko AG; Filippov SV; Popov EO; Maximov MY
    Nanomaterials (Basel); 2022 Oct; 12(19):. PubMed ID: 36234591
    [TBL] [Abstract][Full Text] [Related]  

  • 16. Magnetic Properties of CoFe
    Pham CD; Chang J; Zurbuchen MA; Chang JP
    ACS Appl Mater Interfaces; 2017 Oct; 9(42):36980-36988. PubMed ID: 28925262
    [TBL] [Abstract][Full Text] [Related]  

  • 17. Atomic Layer Deposition of Nickel Using a Heteroleptic Ni Precursor with NH
    Kim M; Nabeya S; Nandi DK; Suzuki K; Kim HM; Cho SY; Kim KB; Kim SH
    ACS Omega; 2019 Jun; 4(6):11126-11134. PubMed ID: 31460211
    [TBL] [Abstract][Full Text] [Related]  

  • 18. Plasma enhanced atomic layer deposition of plasmonic TiN ultrathin films using TDMATi and NH
    Hansen K; Cardona M; Dutta A; Yang C
    Materials (Basel); 2020 Feb; 13(5):. PubMed ID: 32120834
    [TBL] [Abstract][Full Text] [Related]  

  • 19. Metallic Ni
    Ho TA; Bae C; Nam H; Kim E; Lee SY; Park JH; Shin H
    ACS Appl Mater Interfaces; 2018 Apr; 10(15):12807-12815. PubMed ID: 29578327
    [TBL] [Abstract][Full Text] [Related]  

  • 20. Preparation of taN thin film by H2 plasma assisted atomic layer deposition using tert-butylimino-tris-ethylmethylamino tantalum.
    Kim DK; Kim BH; Woo HG; Kim DH; Shin HK
    J Nanosci Nanotechnol; 2006 Nov; 6(11):3392-5. PubMed ID: 17252773
    [TBL] [Abstract][Full Text] [Related]  

    [Next]    [New Search]
    of 6.