These tools will no longer be maintained as of December 31, 2024. Archived website can be found here. PubMed4Hh GitHub repository can be found here. Contact NLM Customer Service if you have questions.
113 related articles for article (PubMed ID: 33032272)
41. Atomic Layer Deposition of Ru Thin Films Using a New Beta-Diketonate Ru Precursor and NH3 Plasma as a Reactant. Jung JH; Lee SJ; Lee HJ; Lee MY; Cheon T; Bae SI; Saito M; Suzuki K; Nabeya S; Lee J; Kim S; Yeom S; Seo JH; Kim SH J Nanosci Nanotechnol; 2015 Nov; 15(11):8472-7. PubMed ID: 26726537 [TBL] [Abstract][Full Text] [Related]
42. Structural investigation of Ru/Pt nanocomposite films prepared by plasma-enhanced atomic layer depositions. Kawasaki M; Hsiao CN; Yang JR; Shiojiri M Micron; 2015 Jul; 74():8-14. PubMed ID: 25910429 [TBL] [Abstract][Full Text] [Related]
43. Influence of ruthenium doping on UV- and visible-light photoelectrocatalytic color removal from dye solutions using a TiO García-Ramírez P; Ramírez-Morales E; Solis Cortazar JC; Sirés I; Silva-Martínez S Chemosphere; 2021 Mar; 267():128925. PubMed ID: 33213874 [TBL] [Abstract][Full Text] [Related]
44. The impact of thickness and thermal annealing on refractive index for aluminum oxide thin films deposited by atomic layer deposition. Wang ZY; Zhang RJ; Lu HL; Chen X; Sun Y; Zhang Y; Wei YF; Xu JP; Wang SY; Zheng YX; Chen LY Nanoscale Res Lett; 2015; 10():46. PubMed ID: 25852343 [TBL] [Abstract][Full Text] [Related]
45. Atomic Layer Deposition of TiO2 for a High-Efficiency Hole-Blocking Layer in Hole-Conductor-Free Perovskite Solar Cells Processed in Ambient Air. Hu H; Dong B; Hu H; Chen F; Kong M; Zhang Q; Luo T; Zhao L; Guo Z; Li J; Xu Z; Wang S; Eder D; Wan L ACS Appl Mater Interfaces; 2016 Jul; 8(28):17999-8007. PubMed ID: 27340730 [TBL] [Abstract][Full Text] [Related]
46. Structural, Optical and Electrical Properties of HfO Kim KM; Jang JS; Yoon SG; Yun JY; Chung NK Materials (Basel); 2020 Apr; 13(9):. PubMed ID: 32344793 [TBL] [Abstract][Full Text] [Related]
47. Link between Gas Phase Reaction Chemistry and the Electronic Conductivity of Atomic Layer Deposited Titanium Oxide Thin Films. Babadi AS; Tang-Kong R; McIntyre PC J Phys Chem Lett; 2021 Apr; 12(14):3625-3632. PubMed ID: 33825465 [TBL] [Abstract][Full Text] [Related]
49. Characterization of lead zirconate titanate--lanthanum ruthenate thin film structures prepared by chemical solution deposition. Bencan A; Malic B; Drazic G; Vukadinović M; Kosec M Scanning; 2007; 29(6):287-93. PubMed ID: 18076056 [TBL] [Abstract][Full Text] [Related]
50. Field-Effect Device Using Quasi-Two-Dimensional Electron Gas in Mass-Producible Atomic-Layer-Deposited Al Seok TJ; Liu Y; Jung HJ; Kim SB; Kim DH; Kim SM; Jang JH; Cho DY; Lee SW; Park TJ ACS Nano; 2018 Oct; 12(10):10403-10409. PubMed ID: 30204410 [TBL] [Abstract][Full Text] [Related]
51. Photoelectrocatalytic degradation of recalcitrant organic pollutants using TiO2 film electrodes: an overview. Zhang Y; Xiong X; Han Y; Zhang X; Shen F; Deng S; Xiao H; Yang X; Yang G; Peng H Chemosphere; 2012 Jun; 88(2):145-54. PubMed ID: 22483728 [TBL] [Abstract][Full Text] [Related]
52. Preparation of Nafion-Ru(bpy)3(2+)-chitosan/gold nanoparticles composite film and its electrochemiluminescence application. Qu Y; Liu X; Zheng X; Guo Z Anal Sci; 2012; 28(6):571-6. PubMed ID: 22729042 [TBL] [Abstract][Full Text] [Related]
53. Superior and stable ferroelectric properties of hafnium-zirconium-oxide thin films deposited Kim HB; Jung M; Oh Y; Lee SW; Suh D; Ahn JH Nanoscale; 2021 May; 13(18):8524-8530. PubMed ID: 33908540 [TBL] [Abstract][Full Text] [Related]
54. Fabrication of junction-free Cu nanowire networks via Ru-catalyzed electroless deposition and their application to transparent conducting electrodes. Song J; Kim MR; Kim Y; Seo D; Ha K; Song TE; Lee WG; Lee Y; Kim KC; Ahn CW; Han H Nanotechnology; 2021 Nov; 33(6):. PubMed ID: 34724650 [TBL] [Abstract][Full Text] [Related]
55. Retention of surface structure causes lower density in atomic layer deposition of amorphous titanium oxide thin films. Rich BB; Etinger-Geller Y; Ciatto G; Katsman A; Pokroy B Phys Chem Chem Phys; 2021 Mar; 23(11):6600-6612. PubMed ID: 33704311 [TBL] [Abstract][Full Text] [Related]
56. Interfacial reaction and electrical properties of HfO2 film gate dielectric prepared by pulsed laser deposition in nitrogen: role of rapid thermal annealing and gate electrode. Wang Y; Wang H; Ye C; Zhang J; Wang H; Jiang Y ACS Appl Mater Interfaces; 2011 Oct; 3(10):3813-8. PubMed ID: 21910462 [TBL] [Abstract][Full Text] [Related]
57. Sub-0.5 nm equivalent oxide thickness scaling for Si-doped Zr1-xHfxO2 thin film without using noble metal electrode. Ahn JH; Kwon SH ACS Appl Mater Interfaces; 2015 Jul; 7(28):15587-92. PubMed ID: 26125098 [TBL] [Abstract][Full Text] [Related]
58. Investigation of the Hydrophobic Nature of Metal Oxide Surfaces Created by Atomic Layer Deposition. Bae J; Samek IA; Stair PC; Snurr RQ Langmuir; 2019 Apr; 35(17):5762-5769. PubMed ID: 30970206 [TBL] [Abstract][Full Text] [Related]
59. Influence of Surface Potential on the Capacitive Performance of the TiO Tan W; Gao T; Wang Y Langmuir; 2020 Apr; 36(14):3836-3842. PubMed ID: 32227853 [TBL] [Abstract][Full Text] [Related]
60. Nitric Oxide Reduction by Carbon Monoxide over Supported Hexaruthenium Cluster Catalysts. 1. The Active Site Structure That Depends on Supporting Metal Oxide and Catalytic Reaction Conditions. Minato T; Izumi Y; Aika K; Ishiguro A; Nakajima T; Wakatsuki Y J Phys Chem B; 2003 Aug; 107(34):9022-8. PubMed ID: 26313135 [TBL] [Abstract][Full Text] [Related] [Previous] [Next] [New Search]