These tools will no longer be maintained as of December 31, 2024. Archived website can be found here. PubMed4Hh GitHub repository can be found here. Contact NLM Customer Service if you have questions.
2. Electron irradiation induced amorphous SiO Gurbán S; Petrik P; Serényi M; Sulyok A; Menyhárd M; Baradács E; Parditka B; Cserháti C; Langer GA; Erdélyi Z Sci Rep; 2018 Feb; 8(1):2124. PubMed ID: 29391562 [TBL] [Abstract][Full Text] [Related]
3. Structural Properties of Al-O Monolayers in SiO Hiller D; Göttlicher J; Steininger R; Huthwelker T; Julin J; Munnik F; Wahl M; Bock W; Schoenaers B; Stesmans A; König D ACS Appl Mater Interfaces; 2018 Sep; 10(36):30495-30505. PubMed ID: 30110151 [TBL] [Abstract][Full Text] [Related]
4. Interface Electrical Properties of Al Fisichella G; Schilirò E; Di Franco S; Fiorenza P; Lo Nigro R; Roccaforte F; Ravesi S; Giannazzo F ACS Appl Mater Interfaces; 2017 Mar; 9(8):7761-7771. PubMed ID: 28135063 [TBL] [Abstract][Full Text] [Related]
5. Chemical vapor deposition of monolayer-thin WS Groven B; Claes D; Nalin Mehta A; Bender H; Vandervorst W; Heyns M; Caymax M; Radu I; Delabie A J Chem Phys; 2019 Mar; 150(10):104703. PubMed ID: 30876349 [TBL] [Abstract][Full Text] [Related]
6. Field-Effect Device Using Quasi-Two-Dimensional Electron Gas in Mass-Producible Atomic-Layer-Deposited Al Seok TJ; Liu Y; Jung HJ; Kim SB; Kim DH; Kim SM; Jang JH; Cho DY; Lee SW; Park TJ ACS Nano; 2018 Oct; 12(10):10403-10409. PubMed ID: 30204410 [TBL] [Abstract][Full Text] [Related]
7. Irradiation-induced reactions at the CeO Sapkota P; Aprahamian A; Chan KY; Frentz B; Macon KT; Ptasinska S; Robertson D; Manukyan K J Chem Phys; 2020 Mar; 152(10):104704. PubMed ID: 32171230 [TBL] [Abstract][Full Text] [Related]
8. PEALD of SiO Gebhard M; Mai L; Banko L; Mitschker F; Hoppe C; Jaritz M; Kirchheim D; Zekorn C; de Los Arcos T; Grochla D; Dahlmann R; Grundmeier G; Awakowicz P; Ludwig A; Devi A ACS Appl Mater Interfaces; 2018 Feb; 10(8):7422-7434. PubMed ID: 29338170 [TBL] [Abstract][Full Text] [Related]
9. Platinum-Enhanced Electron Transfer and Surface Passivation through Ultrathin Film Aluminum Oxide (Al₂O₃) on Si(111)-CH₃ Photoelectrodes. Kim HJ; Kearney KL; Le LH; Pekarek RT; Rose MJ ACS Appl Mater Interfaces; 2015 Apr; 7(16):8572-84. PubMed ID: 25880534 [TBL] [Abstract][Full Text] [Related]
10. The impact of thickness and thermal annealing on refractive index for aluminum oxide thin films deposited by atomic layer deposition. Wang ZY; Zhang RJ; Lu HL; Chen X; Sun Y; Zhang Y; Wei YF; Xu JP; Wang SY; Zheng YX; Chen LY Nanoscale Res Lett; 2015; 10():46. PubMed ID: 25852343 [TBL] [Abstract][Full Text] [Related]
11. Re-distribution of oxygen at the interface between γ-Al Filatova EO; Konashuk AS; Sakhonenkov SS; Sokolov AA; Afanas'ev VV Sci Rep; 2017 Jul; 7(1):4541. PubMed ID: 28674397 [TBL] [Abstract][Full Text] [Related]
12. Investigation on the passivated Si/Al2O3 interface fabricated by non-vacuum spatial atomic layer deposition system. Lien SY; Yang CH; Wu KC; Kung CY Nanoscale Res Lett; 2015; 10():93. PubMed ID: 25852389 [TBL] [Abstract][Full Text] [Related]
13. Damage Effect of ALD-Al Ding M Micromachines (Basel); 2021 Jun; 12(6):. PubMed ID: 34200007 [TBL] [Abstract][Full Text] [Related]
14. Selective Growth of Interface Layers from Reactions of Sc(MeCp) Rahman R; Klesko JP; Dangerfield A; Mattson EC; Chabal YJ ACS Appl Mater Interfaces; 2018 Sep; 10(38):32818-32827. PubMed ID: 30211529 [TBL] [Abstract][Full Text] [Related]
15. Electrical properties and thermal stability in stack structure of HfO Baik M; Kang HK; Kang YS; Jeong KS; An Y; Choi S; Kim H; Song JD; Cho MH Sci Rep; 2017 Sep; 7(1):11337. PubMed ID: 28900097 [TBL] [Abstract][Full Text] [Related]
16. Silicon diffusion control in atomic-layer-deposited Al2O3/La2O3/Al2O3 gate stacks using an Al2O3 barrier layer. Wang X; Liu HX; Fei CX; Yin SY; Fan XJ Nanoscale Res Lett; 2015; 10():141. PubMed ID: 25897303 [TBL] [Abstract][Full Text] [Related]
17. Structural evolution and the control of defects in atomic layer deposited HfO2-Al2O3 stacked films on GaAs. Kang YS; Kim DK; Jeong KS; Cho MH; Kim CY; Chung KB; Kim H; Kim DC ACS Appl Mater Interfaces; 2013 Mar; 5(6):1982-9. PubMed ID: 23438318 [TBL] [Abstract][Full Text] [Related]
18. Low-temperature atomic layer deposition of SiO Putkonen M; Sippola P; Svärd L; Sajavaara T; Vartiainen J; Buchanan I; Forsström U; Simell P; Tammelin T Philos Trans A Math Phys Eng Sci; 2018 Feb; 376(2112):. PubMed ID: 29277735 [TBL] [Abstract][Full Text] [Related]
19. Electron beam-induced crystallization of Al Klingshirn CJ; Jayawardena A; Dhar S; Ramamurthy RP; Morisette D; Warecki Z; Cumings J; Zheleva T; Lelis A; Salamanca-Riba LG Micron; 2021 Jan; 140():102954. PubMed ID: 33181451 [TBL] [Abstract][Full Text] [Related]
20. Oxidation of nano-multilayered AlTiSiN thin films between 600 and 1000 degrees C in air. Lee JC; Kim SK; Nguyen TD; Lee DB J Nanosci Nanotechnol; 2011 Jul; 11(7):6563-8. PubMed ID: 22121757 [TBL] [Abstract][Full Text] [Related] [Next] [New Search]