These tools will no longer be maintained as of December 31, 2024. Archived website can be found here. PubMed4Hh GitHub repository can be found here. Contact NLM Customer Service if you have questions.


BIOMARKERS

Molecular Biopsy of Human Tumors

- a resource for Precision Medicine *

148 related articles for article (PubMed ID: 34550696)

  • 1. Characterizing Self-Assembled Monolayer Breakdown in Area-Selective Atomic Layer Deposition.
    Liu TL; Zeng L; Nardi KL; Hausmann DM; Bent SF
    Langmuir; 2021 Oct; 37(39):11637-11645. PubMed ID: 34550696
    [TBL] [Abstract][Full Text] [Related]  

  • 2. Area-selective atomic layer deposition of lead sulfide: nanoscale patterning and DFT simulations.
    Lee W; Dasgupta NP; Trejo O; Lee JR; Hwang J; Usui T; Prinz FB
    Langmuir; 2010 May; 26(9):6845-52. PubMed ID: 20099790
    [TBL] [Abstract][Full Text] [Related]  

  • 3. Reaction Mechanism of Area-Selective Atomic Layer Deposition for Al
    Seo S; Yeo BC; Han SS; Yoon CM; Yang JY; Yoon J; Yoo C; Kim HJ; Lee YB; Lee SJ; Myoung JM; Lee HB; Kim WH; Oh IK; Kim H
    ACS Appl Mater Interfaces; 2017 Nov; 9(47):41607-41617. PubMed ID: 29111636
    [TBL] [Abstract][Full Text] [Related]  

  • 4. Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide.
    Sampson MD; Emery JD; Pellin MJ; Martinson ABF
    ACS Appl Mater Interfaces; 2017 Oct; 9(39):33429-33436. PubMed ID: 28379011
    [TBL] [Abstract][Full Text] [Related]  

  • 5. Stearic Acid as an Atomic Layer Deposition Inhibitor: Spectroscopic Insights from AFM-IR.
    Satyarthy S; Hasan Ul Iqbal M; Abida F; Nahar R; Hauser AJ; Cheng MM; Ghosh A
    Nanomaterials (Basel); 2023 Oct; 13(19):. PubMed ID: 37836354
    [TBL] [Abstract][Full Text] [Related]  

  • 6. Molecular Mechanism of Selective Al
    Choi Y; Kim HJ; Kim E; Kang H; Park J; Do YR; Kwak K; Cho M
    ACS Appl Mater Interfaces; 2023 Aug; 15(34):41170-41179. PubMed ID: 37561063
    [TBL] [Abstract][Full Text] [Related]  

  • 7. Substrate-Dependent Study of Chain Orientation and Order in Alkylphosphonic Acid Self-Assembled Monolayers for ALD Blocking.
    Bobb-Semple D; Zeng L; Cordova I; Bergsman DS; Nordlund D; Bent SF
    Langmuir; 2020 Nov; 36(43):12849-12857. PubMed ID: 33079543
    [TBL] [Abstract][Full Text] [Related]  

  • 8. Controlled Synthesis of Pd/Pt Core Shell Nanoparticles Using Area-selective Atomic Layer Deposition.
    Cao K; Zhu Q; Shan B; Chen R
    Sci Rep; 2015 Feb; 5():8470. PubMed ID: 25683469
    [TBL] [Abstract][Full Text] [Related]  

  • 9. Selective area atomic layer deposited ZnO nanodot on self-assembled monolayer pattern using a diblock copolymer nano-template.
    Kim D; Yoon J; Kim H
    J Nanosci Nanotechnol; 2012 Feb; 12(2):1483-6. PubMed ID: 22629984
    [TBL] [Abstract][Full Text] [Related]  

  • 10. Structural investigations of self-assembled monolayers for organic electronics: results from X-ray reflectivity.
    Khassanov A; Steinrück HG; Schmaltz T; Magerl A; Halik M
    Acc Chem Res; 2015 Jul; 48(7):1901-8. PubMed ID: 26072927
    [TBL] [Abstract][Full Text] [Related]  

  • 11. Area selective molecular layer deposition of polyurea films.
    Prasittichai C; Zhou H; Bent SF
    ACS Appl Mater Interfaces; 2013 Dec; 5(24):13391-6. PubMed ID: 24229350
    [TBL] [Abstract][Full Text] [Related]  

  • 12. Atomic layer deposition of aluminum oxide on carboxylic acid-terminated self-assembled monolayers.
    Li M; Dai M; Chabal YJ
    Langmuir; 2009 Feb; 25(4):1911-4. PubMed ID: 19140733
    [TBL] [Abstract][Full Text] [Related]  

  • 13. Fifteen Nanometer Resolved Patterns in Selective Area Atomic Layer Deposition-Defectivity Reduction by Monolayer Design.
    Wojtecki R; Mettry M; Fine Nathel NF; Friz A; De Silva A; Arellano N; Shobha H
    ACS Appl Mater Interfaces; 2018 Nov; 10(44):38630-38637. PubMed ID: 30335930
    [TBL] [Abstract][Full Text] [Related]  

  • 14. Enhanced Self-Assembled Monolayer Surface Coverage by ALD NiO in p-i-n Perovskite Solar Cells.
    Phung N; Verheijen M; Todinova A; Datta K; Verhage M; Al-Ashouri A; Köbler H; Li X; Abate A; Albrecht S; Creatore M
    ACS Appl Mater Interfaces; 2022 Jan; 14(1):2166-2176. PubMed ID: 34936322
    [TBL] [Abstract][Full Text] [Related]  

  • 15. Nucleation and growth mechanisms of Al
    Zhang H; Chiappe D; Meersschaut J; Conard T; Franquet A; Nuytten T; Mannarino M; Radu I; Vandervorst W; Delabie A
    J Chem Phys; 2017 Feb; 146(5):052810. PubMed ID: 28178804
    [TBL] [Abstract][Full Text] [Related]  

  • 16. Area-Selective Atomic Layer Deposition on Metal/Dielectric Patterns: Amphiphobic Coating, Vaporizable Inhibitors, and Regenerative Processing.
    Chang CW; Tseng YH; Hsu CS; Chen JT
    ACS Appl Mater Interfaces; 2023 Jun; 15(23):28817-28824. PubMed ID: 37264593
    [TBL] [Abstract][Full Text] [Related]  

  • 17. Copper-metal deposition on self assembled monolayer for making top contacts in molecular electronic devices.
    Seitz O; Dai M; Aguirre-Tostado FS; Wallace RM; Chabal YJ
    J Am Chem Soc; 2009 Dec; 131(50):18159-67. PubMed ID: 19924992
    [TBL] [Abstract][Full Text] [Related]  

  • 18. Effect of the phase states of self-assembled monolayers on pentacene growth and thin-film transistor characteristics.
    Lee HS; Kim DH; Cho JH; Hwang M; Jang Y; Cho K
    J Am Chem Soc; 2008 Aug; 130(32):10556-64. PubMed ID: 18630908
    [TBL] [Abstract][Full Text] [Related]  

  • 19. Effect of Multilayer versus Monolayer Dodecanethiol on Selectivity and Pattern Integrity in Area-Selective Atomic Layer Deposition.
    Liu TL; Nardi KL; Draeger N; Hausmann DM; Bent SF
    ACS Appl Mater Interfaces; 2020 Sep; 12(37):42226-42235. PubMed ID: 32805867
    [TBL] [Abstract][Full Text] [Related]  

  • 20. Selective Deposition of Dielectrics: Limits and Advantages of Alkanethiol Blocking Agents on Metal-Dielectric Patterns.
    Minaye Hashemi FS; Birchansky BR; Bent SF
    ACS Appl Mater Interfaces; 2016 Dec; 8(48):33264-33272. PubMed ID: 27934166
    [TBL] [Abstract][Full Text] [Related]  

    [Next]    [New Search]
    of 8.