These tools will no longer be maintained as of December 31, 2024. Archived website can be found here. PubMed4Hh GitHub repository can be found here. Contact NLM Customer Service if you have questions.
158 related articles for article (PubMed ID: 34821888)
1. Growth modulation of atomic layer deposition of HfO Ko BG; Nguyen CT; Gu B; Khan MR; Park K; Oh H; Park J; Shong B; Lee HB Dalton Trans; 2021 Dec; 50(48):17935-17944. PubMed ID: 34821888 [TBL] [Abstract][Full Text] [Related]
2. Growth and properties of hafnicone and HfO(2)/hafnicone nanolaminate and alloy films using molecular layer deposition techniques. Lee BH; Anderson VR; George SM ACS Appl Mater Interfaces; 2014 Oct; 6(19):16880-7. PubMed ID: 25203487 [TBL] [Abstract][Full Text] [Related]
3. In Situ Photoluminescence of Colloidal Quantum Dots During Gas Exposure-The Role of Water and Reactive Atomic Layer Deposition Precursors. Kuhs J; Werbrouck A; Zawacka N; Drijvers E; Smet PF; Hens Z; Detavernier C ACS Appl Mater Interfaces; 2019 Jul; 11(29):26277-26287. PubMed ID: 31260622 [TBL] [Abstract][Full Text] [Related]
4. Effect of Co-Reactants on Interfacial Oxidation in Atomic Layer Deposition of Oxides on Metal Surfaces. Swarup JV; Chuang HR; You AL; Engstrom JR ACS Appl Mater Interfaces; 2024 Apr; 16(13):16983-16995. PubMed ID: 38506615 [TBL] [Abstract][Full Text] [Related]
6. Plasma-Enhanced Atomic Layer Deposition of HfO Beladiya V; Faraz T; Schmitt P; Munser AS; Schröder S; Riese S; Mühlig C; Schachtler D; Steger F; Botha R; Otto F; Fritz T; van Helvoirt C; Kessels WMM; Gargouri H; Szeghalmi A ACS Appl Mater Interfaces; 2022 Mar; 14(12):14677-14692. PubMed ID: 35311275 [TBL] [Abstract][Full Text] [Related]
7. Low-Temperature Atomic Layer Deposition of Highly Conformal Tin Nitride Thin Films for Energy Storage Devices. Ansari MZ; Nandi DK; Janicek P; Ansari SA; Ramesh R; Cheon T; Shong B; Kim SH ACS Appl Mater Interfaces; 2019 Nov; 11(46):43608-43621. PubMed ID: 31633331 [TBL] [Abstract][Full Text] [Related]
8. Selective Growth of Interface Layers from Reactions of Sc(MeCp) Rahman R; Klesko JP; Dangerfield A; Mattson EC; Chabal YJ ACS Appl Mater Interfaces; 2018 Sep; 10(38):32818-32827. PubMed ID: 30211529 [TBL] [Abstract][Full Text] [Related]
9. In situ auger electron spectroscopy study of atomic layer deposition: growth initiation and interface formation reactions during ruthenium ALD on Si-H, SiO2, and HfO2 surfaces. Park KJ; Terry DB; Stewart SM; Parsons GN Langmuir; 2007 May; 23(11):6106-12. PubMed ID: 17461600 [TBL] [Abstract][Full Text] [Related]
10. Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy. Vandenbroucke SST; Levrau E; Minjauw MM; Van Daele M; Solano E; Vos R; Dendooven J; Detavernier C Phys Chem Chem Phys; 2020 May; 22(17):9262-9271. PubMed ID: 32307490 [TBL] [Abstract][Full Text] [Related]
11. Atomistic kinetic Monte Carlo study of atomic layer deposition derived from density functional theory. Shirazi M; Elliott SD J Comput Chem; 2014 Jan; 35(3):244-59. PubMed ID: 24249148 [TBL] [Abstract][Full Text] [Related]
12. Atomic Layer Deposition on Polymer Thin Films: On the Role of Precursor Infiltration and Reactivity. Petit RR; Li J; Van de Voorde B; Van Vlierberghe S; Smet PF; Detavernier C ACS Appl Mater Interfaces; 2021 Sep; 13(38):46151-46163. PubMed ID: 34519479 [TBL] [Abstract][Full Text] [Related]
13. Stepwise mechanism and H2O-assisted hydrolysis in atomic layer deposition of SiO2 without a catalyst. Fang GY; Xu LN; Wang LG; Cao YQ; Wu D; Li AD Nanoscale Res Lett; 2015; 10():68. PubMed ID: 25897298 [TBL] [Abstract][Full Text] [Related]
14. Uniformity of HfO Choi B; Kim HU; Jeon N Nanomaterials (Basel); 2022 Dec; 13(1):. PubMed ID: 36616071 [TBL] [Abstract][Full Text] [Related]
15. Selective SnO Lee JH; Yoo M; Kang D; Lee HM; Choi WH; Park JW; Yi Y; Kim HY; Park JS ACS Appl Mater Interfaces; 2018 Oct; 10(39):33335-33342. PubMed ID: 30199618 [TBL] [Abstract][Full Text] [Related]
16. Bimolecular Reaction Mechanism in the Amido Complex-Based Atomic Layer Deposition of HfO D'Acunto G; Tsyshevsky R; Shayesteh P; Gallet JJ; Bournel F; Rochet F; Pinsard I; Timm R; Head AR; Kuklja M; Schnadt J Chem Mater; 2023 Jan; 35(2):529-538. PubMed ID: 36711051 [TBL] [Abstract][Full Text] [Related]
17. Surface chemistry for molecular layer deposition of organic and hybrid organic-inorganic polymers. George SM; Yoon B; Dameron AA Acc Chem Res; 2009 Apr; 42(4):498-508. PubMed ID: 19249861 [TBL] [Abstract][Full Text] [Related]
19. Spatial resolution in thin film deposition on silicon surfaces by combining silylation and UV/ozonolysis. Guo L; Zaera F Nanotechnology; 2014 Dec; 25(50):504006. PubMed ID: 25431897 [TBL] [Abstract][Full Text] [Related]
20. Unearthing [3-(Dimethylamino)propyl]aluminium(III) Complexes as Novel Atomic Layer Deposition (ALD) Precursors for Al Mai L; Gebhard M; de Los Arcos T; Giner I; Mitschker F; Winter M; Parala H; Awakowicz P; Grundmeier G; Devi A Chemistry; 2017 Aug; 23(45):10768-10772. PubMed ID: 28665519 [TBL] [Abstract][Full Text] [Related] [Next] [New Search]