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3. Conversion of a Patterned Organic Resist into a High Performance Inorganic Hard Mask for High Resolution Pattern Transfer. Marneffe JF; Chan BT; Spieser M; Vereecke G; Naumov S; Vanhaeren D; Wolf H; Knoll AW ACS Nano; 2018 Nov; 12(11):11152-11160. PubMed ID: 30481961 [TBL] [Abstract][Full Text] [Related]
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