151 related articles for article (PubMed ID: 35448337)
1. Investigation of the Resistivity and Emissivity of a Pellicle Membrane for EUV Lithography.
Wi SJ; Jang YJ; Kim H; Cho K; Ahn J
Membranes (Basel); 2022 Mar; 12(4):. PubMed ID: 35448337
[TBL] [Abstract][Full Text] [Related]
2. Study on ZrSi
Wi SJ; Kim WJ; Kim H; Jeong D; Lee DG; Choi J; Cho SJ; Yu L; Ahn J
Membranes (Basel); 2023 Aug; 13(8):. PubMed ID: 37623792
[TBL] [Abstract][Full Text] [Related]
3. Investigating the Degradation of EUV Transmittance of an EUV Pellicle Membrane.
Wi SJ; Jang YJ; Lee DG; Kim SY; Ahn J
Membranes (Basel); 2022 Dec; 13(1):. PubMed ID: 36676812
[TBL] [Abstract][Full Text] [Related]
4. Fabrication of a 100 × 100 mm
Nam KB; Hu Q; Yeo JH; Kim MJ; Yoo JB
Nanoscale Adv; 2022 Sep; 4(18):3824-3831. PubMed ID: 36133349
[TBL] [Abstract][Full Text] [Related]
5. Transverse Deflection for Extreme Ultraviolet Pellicles.
Kim SK
Materials (Basel); 2023 Apr; 16(9):. PubMed ID: 37176352
[TBL] [Abstract][Full Text] [Related]
6. Enhanced Thermal Conductivity of Free-Standing Double-Walled Carbon Nanotube Networks.
Mehew JD; Timmermans MY; Saleta Reig D; Sergeant S; Sledzinska M; Chávez-Ángel E; Gallagher E; Sotomayor Torres CM; Huyghebaert C; Tielrooij KJ
ACS Appl Mater Interfaces; 2023 Oct; 15(44):51876-84. PubMed ID: 37889473
[TBL] [Abstract][Full Text] [Related]
7. Extreme ultraviolet pellicle wrinkles influence on mask 3D effects: experimental demonstration.
Lee DG; Moon S; Choi J; Wi SJ; Ahn J
Appl Opt; 2023 Aug; 62(24):6307-6315. PubMed ID: 37706820
[TBL] [Abstract][Full Text] [Related]
8. Fabrication of extreme ultraviolet lithography pellicle with nanometer-thick graphite film by sublimation of camphor supporting layer.
Nam KB; Yeo JH; Hu Q; Kim MJ; Oh B; Yoo JB
Nanotechnology; 2021 Aug; 32(46):. PubMed ID: 34340219
[TBL] [Abstract][Full Text] [Related]
9. Resistless EUV lithography: Photon-induced oxide patterning on silicon.
Tseng LT; Karadan P; Kazazis D; Constantinou PC; Stock TJZ; Curson NJ; Schofield SR; Muntwiler M; Aeppli G; Ekinci Y
Sci Adv; 2023 Apr; 9(16):eadf5997. PubMed ID: 37075116
[TBL] [Abstract][Full Text] [Related]
10. Fluorine-Rich Zinc Oxoclusters as Extreme Ultraviolet Photoresists: Chemical Reactions and Lithography Performance.
Thakur N; Vockenhuber M; Ekinci Y; Watts B; Giglia A; Mahne N; Nannarone S; Castellanos S; Brouwer AM
ACS Mater Au; 2022 May; 2(3):343-355. PubMed ID: 36855383
[TBL] [Abstract][Full Text] [Related]
11. Refined extreme ultraviolet mask stack model.
Makhotkin IA; Wu M; Soltwisch V; Scholze F; Philipsen V
J Opt Soc Am A Opt Image Sci Vis; 2021 Apr; 38(4):498-503. PubMed ID: 33798178
[TBL] [Abstract][Full Text] [Related]
12. Mo/Si and Mo/Be multilayer thin films on Zerodur substrates for extreme-ultraviolet lithography.
Mirkarimi PB; Bajt S; Wall MA
Appl Opt; 2000 Apr; 39(10):1617-25. PubMed ID: 18345060
[TBL] [Abstract][Full Text] [Related]
13. Absolute intensity calibration of flat-field space-resolved extreme ultraviolet spectrometer using radial profiles of visible and extreme ultraviolet bremsstrahlung continuum emitted from high-density plasmas in Large Helical Device.
Dong C; Morita S; Goto M; Wang E
Rev Sci Instrum; 2011 Nov; 82(11):113102. PubMed ID: 22128961
[TBL] [Abstract][Full Text] [Related]
14. Nearly amorphous Mo-N gratings for ultimate resolution in extreme ultraviolet interference lithography.
Wang L; Kirk E; Wäckerlin C; Schneider CW; Hojeij M; Gobrecht J; Ekinci Y
Nanotechnology; 2014 Jun; 25(23):235305. PubMed ID: 24850475
[TBL] [Abstract][Full Text] [Related]
15. Reduction of EUV resist damage by neutral beam etching.
Kim GW; Chang WJ; Kang JE; Kim HJ; Yeom GY
Nanotechnology; 2021 Dec; 33(9):. PubMed ID: 34808609
[TBL] [Abstract][Full Text] [Related]
16. Investigation of correlative parameters to evaluate EUV lithographic performance of PMMA.
Kim K; Lee JW; Park BG; Oh HT; Ku Y; Lee JK; Lim G; Lee S
RSC Adv; 2022 Jan; 12(5):2589-2594. PubMed ID: 35425284
[TBL] [Abstract][Full Text] [Related]
17. Effect of mask-roughness on printed contact-size variation in extreme-ultraviolet lithography.
Naulleau PP
Appl Opt; 2005 Jan; 44(2):183-9. PubMed ID: 15678769
[TBL] [Abstract][Full Text] [Related]
18. Time-resolved two-dimensional profiles of electron density and temperature of laser-produced tin plasmas for extreme-ultraviolet lithography light sources.
Tomita K; Sato Y; Tsukiyama S; Eguchi T; Uchino K; Kouge K; Tomuro H; Yanagida T; Wada Y; Kunishima M; Soumagne G; Kodama T; Mizoguchi H; Sunahara A; Nishihara K
Sci Rep; 2017 Oct; 7(1):12328. PubMed ID: 28970565
[TBL] [Abstract][Full Text] [Related]
19. Extreme Ultraviolet Lighting Using Carbon Nanotube-Based Cold Cathode Electron Beam.
Yoo ST; Park KC
Nanomaterials (Basel); 2022 Nov; 12(23):. PubMed ID: 36500759
[TBL] [Abstract][Full Text] [Related]
20. Extreme ultraviolet narrow band emission from electron cyclotron resonance plasmas.
Zhao HY; Zhao HW; Sun LT; Zhang XZ; Wang H; Ma BH; Li XX; Zhu YH; Sheng LS; Zhang GB; Tian YC
Rev Sci Instrum; 2008 Feb; 79(2 Pt 2):02C719. PubMed ID: 18315272
[TBL] [Abstract][Full Text] [Related]
[Next] [New Search]