These tools will no longer be maintained as of December 31, 2024. Archived website can be found here. PubMed4Hh GitHub repository can be found here. Contact NLM Customer Service if you have questions.


BIOMARKERS

Molecular Biopsy of Human Tumors

- a resource for Precision Medicine *

139 related articles for article (PubMed ID: 35539551)

  • 21. UV/Ozone-Treated and Sol-Gel-Processed Y
    Lee S; Cho Y; Heo S; Bae JH; Kang IM; Kim K; Lee WY; Jang J
    Nanomaterials (Basel); 2024 May; 14(9):. PubMed ID: 38727385
    [TBL] [Abstract][Full Text] [Related]  

  • 22. Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors.
    Shih HY; Chu FC; Das A; Lee CY; Chen MJ; Lin RM
    Nanoscale Res Lett; 2016 Dec; 11(1):235. PubMed ID: 27129687
    [TBL] [Abstract][Full Text] [Related]  

  • 23. Atomic layer deposition of tungsten sulfide using a new metal-organic precursor and H
    Kim DH; Ramesh R; Nandi DK; Bae JS; Kim SH
    Nanotechnology; 2021 Feb; 32(7):075405. PubMed ID: 33108773
    [TBL] [Abstract][Full Text] [Related]  

  • 24. Growth Temperature Influence on Atomic-Layer-Deposited In
    Farva U; Lee HW; Kim RN; Lee DG; Kang DW; Kim J
    Nanomaterials (Basel); 2021 Aug; 11(8):. PubMed ID: 34443878
    [TBL] [Abstract][Full Text] [Related]  

  • 25. Nanostructured Er2O3 thin films grown by metalorganic chemical vapour deposition.
    Xu K; Dang VS; Ney A; de los Arcos T; Devil A
    J Nanosci Nanotechnol; 2014 Jul; 14(7):5095-102. PubMed ID: 24757985
    [TBL] [Abstract][Full Text] [Related]  

  • 26. Low temperature growth of gallium oxide thin films via plasma enhanced atomic layer deposition.
    O'Donoghue R; Rechmann J; Aghaee M; Rogalla D; Becker HW; Creatore M; Wieck AD; Devi A
    Dalton Trans; 2017 Dec; 46(47):16551-16561. PubMed ID: 29160880
    [TBL] [Abstract][Full Text] [Related]  

  • 27. Effects of Deposition Temperature on the Device Characteristics of Oxide Thin-Film Transistors Using In-Ga-Zn-O Active Channels Prepared by Atomic-Layer Deposition.
    Yoon SM; Seong NJ; Choi K; Seo GH; Shin WC
    ACS Appl Mater Interfaces; 2017 Jul; 9(27):22676-22684. PubMed ID: 28653825
    [TBL] [Abstract][Full Text] [Related]  

  • 28. Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application.
    Kim HY; Jung EA; Mun G; Agbenyeke RE; Park BK; Park JS; Son SU; Jeon DJ; Park SK; Chung TM; Han JH
    ACS Appl Mater Interfaces; 2016 Oct; 8(40):26924-26931. PubMed ID: 27673338
    [TBL] [Abstract][Full Text] [Related]  

  • 29. Growth of Atomic layer-deposited Monoclinic Molybdenum Dioxide Films Stabilized by Tin Oxide Doping for DRAM Capacitor Electrode Applications.
    Lee JH; Kang W; Shin JE; Park BK; Chung TM; Han JH
    ACS Appl Mater Interfaces; 2024 Apr; ():. PubMed ID: 38664939
    [TBL] [Abstract][Full Text] [Related]  

  • 30. Effect of Growth Temperature on the Structural and Electrical Properties of ZrO₂ Films Fabricated by Atomic Layer Deposition Using a CpZr[N(CH₃)₂]₃/C₇H₈ Cocktail Precursor.
    An JK; Chung NK; Kim JT; Hahm SH; Lee G; Lee SB; Lee T; Park IS; Yun JY
    Materials (Basel); 2018 Mar; 11(3):. PubMed ID: 29510594
    [TBL] [Abstract][Full Text] [Related]  

  • 31. SnO deposition
    Huster N; Ghiyasi R; Zanders D; Rogalla D; Karppinen M; Devi A
    Dalton Trans; 2022 Oct; 51(39):14970-14979. PubMed ID: 36111964
    [TBL] [Abstract][Full Text] [Related]  

  • 32. Low temperature atomic layer deposition of zirconium oxide for inkjet printed transistor applications.
    Jewel MU; Mahmud MS; Monne MA; Zakhidov A; Chen MY
    RSC Adv; 2019 Jan; 9(4):1841-1848. PubMed ID: 35516157
    [TBL] [Abstract][Full Text] [Related]  

  • 33. Synthesis and characterisation of zirconium-amido guanidinato complex: a potential precursor for ZrO2 thin films.
    Devi A; Bhakta R; Milanov A; Hellwig M; Barreca D; Tondello E; Thomas R; Ehrhart P; Winter M; Fischer R
    Dalton Trans; 2007 May; (17):1671-6. PubMed ID: 17443259
    [TBL] [Abstract][Full Text] [Related]  

  • 34. Selective SnO
    Lee JH; Yoo M; Kang D; Lee HM; Choi WH; Park JW; Yi Y; Kim HY; Park JS
    ACS Appl Mater Interfaces; 2018 Oct; 10(39):33335-33342. PubMed ID: 30199618
    [TBL] [Abstract][Full Text] [Related]  

  • 35. Thermal atomic layer deposition of rhenium nitride and rhenium metal thin films using methyltrioxorhenium.
    Cwik S; Woods KN; Perera SS; Saly MJ; Knisley TJ; Winter CH
    Dalton Trans; 2021 Dec; 50(48):18202-18211. PubMed ID: 34860223
    [TBL] [Abstract][Full Text] [Related]  

  • 36. Atomic Nature of the Growth Mechanism of Atomic Layer Deposited High-κ Y
    Cheng CP; Chen WS; Cheng YT; Wan HW; Yang CY; Pi TW; Kwo J; Hong M
    ACS Omega; 2018 Feb; 3(2):2111-2118. PubMed ID: 31458518
    [TBL] [Abstract][Full Text] [Related]  

  • 37. A comparative study on the evolution of the interface chemistry and electrical performance of ALD-driven Hf
    Gao J; He G; Hao L; Wang D; Zhao L
    RSC Adv; 2020 Apr; 10(25):14733-14745. PubMed ID: 35497120
    [TBL] [Abstract][Full Text] [Related]  

  • 38. Modulating the interface quality and electrical properties of HfTiO/InGaAs gate stack by atomic-layer-deposition-derived Al₂O₃ passivation layer.
    He G; Gao J; Chen H; Cui J; Sun Z; Chen X
    ACS Appl Mater Interfaces; 2014 Dec; 6(24):22013-25. PubMed ID: 25471009
    [TBL] [Abstract][Full Text] [Related]  

  • 39. Magnetic Properties of CoFe
    Pham CD; Chang J; Zurbuchen MA; Chang JP
    ACS Appl Mater Interfaces; 2017 Oct; 9(42):36980-36988. PubMed ID: 28925262
    [TBL] [Abstract][Full Text] [Related]  

  • 40. Atomic Layer Growth of Rutile TiO
    Kim T; Jeon J; Ryu SH; Chung HK; Jang M; Lee S; Chung YJ; Kim SK
    ACS Appl Mater Interfaces; 2024 Jul; 16(26):33877-33884. PubMed ID: 38961576
    [TBL] [Abstract][Full Text] [Related]  

    [Previous]   [Next]    [New Search]
    of 7.