These tools will no longer be maintained as of December 31, 2024. Archived website can be found here. PubMed4Hh GitHub repository can be found here. Contact NLM Customer Service if you have questions.
127 related articles for article (PubMed ID: 35540334)
21. Performance Enhancement for Tungsten-Doped Indium Oxide Thin Film Transistor by Hydrogen Peroxide as Cosolvent in Room-Temperature Supercritical Fluid Systems. Ruan DB; Liu PT; Yu MC; Chien TC; Chiu YC; Gan KJ; Sze SM ACS Appl Mater Interfaces; 2019 Jun; 11(25):22521-22530. PubMed ID: 31190532 [TBL] [Abstract][Full Text] [Related]
22. Structural and electrical characteristics of high-κ Er2O3 and Er2TiO5 gate dielectrics for a-IGZO thin-film transistors. Chen FH; Her JL; Shao YH; Matsuda YH; Pan TM Nanoscale Res Lett; 2013 Jan; 8(1):18. PubMed ID: 23294730 [TBL] [Abstract][Full Text] [Related]
23. Wide range modulation of synaptic weight in thin-film transistors with hafnium oxide gate insulator and indium-zinc oxide channel layer for artificial synapse application. Beom K; Han J; Kim HM; Yoon TS Nanoscale; 2021 Jul; 13(26):11370-11379. PubMed ID: 34160528 [TBL] [Abstract][Full Text] [Related]
24. Mobility Enhancement in Amorphous In-Ga-Zn-O Thin-Film Transistor by Induced Metallic in Nanoparticles and Cu Electrodes. Hu S; Ning H; Lu K; Fang Z; Li Y; Yao R; Xu M; Wang L; Peng J; Lu X Nanomaterials (Basel); 2018 Mar; 8(4):. PubMed ID: 29584710 [TBL] [Abstract][Full Text] [Related]
25. Homojunction solution-processed metal oxide thin-film transistors using passivation-induced channel definition. Kim JH; Rim YS; Kim HJ ACS Appl Mater Interfaces; 2014 Apr; 6(7):4819-22. PubMed ID: 24611468 [TBL] [Abstract][Full Text] [Related]
26. Effect of channel layer thickness on the performance of indium-zinc-tin oxide thin film transistors manufactured by inkjet printing. Avis C; Hwang HR; Jang J ACS Appl Mater Interfaces; 2014 Jul; 6(14):10941-5. PubMed ID: 24877653 [TBL] [Abstract][Full Text] [Related]
27. Electrical Performance and Bias-Stress Stability of Amorphous InGaZnO Thin-Film Transistors with Buried-Channel Layers. Zhang Y; Xie H; Dong C Micromachines (Basel); 2019 Nov; 10(11):. PubMed ID: 31739504 [TBL] [Abstract][Full Text] [Related]
28. High-Performance Indium Gallium Tin Oxide Transistors with an Al Choi CH; Kim T; Ueda S; Shiah YS; Hosono H; Kim J; Jeong JK ACS Appl Mater Interfaces; 2021 Jun; 13(24):28451-28461. PubMed ID: 34111928 [TBL] [Abstract][Full Text] [Related]
29. Performance Enhancement of Channel-Engineered Al-Zn-Sn-O Thin-Film Transistors with Highly Conductive In-Ga-Zn-O Buried Layer via Vacuum Rapid Thermal Annealing. Kim SH; Cho WJ J Nanosci Nanotechnol; 2020 Aug; 20(8):4671-4677. PubMed ID: 32126639 [TBL] [Abstract][Full Text] [Related]
30. High Performance, Low Temperature Solution-Processed Barium and Strontium Doped Oxide Thin Film Transistors. Banger KK; Peterson RL; Mori K; Yamashita Y; Leedham T; Sirringhaus H Chem Mater; 2014 Jan; 26(2):1195-1203. PubMed ID: 24511184 [TBL] [Abstract][Full Text] [Related]
31. Vertically Graded Oxygen Deficiency for Improving Electrical Characteristics and Stability of Indium Gallium Zinc Oxide Thin-Film Transistors. Yoon CS; Kim HT; Kim MS; Yoo H; Park JW; Choi DH; Kim D; Kim HJ ACS Appl Mater Interfaces; 2021 Jan; 13(3):4110-4116. PubMed ID: 33448781 [TBL] [Abstract][Full Text] [Related]
32. A Comparative Study of E-Beam Deposited Gate Dielectrics on Channel Width-Dependent Performance and Reliability of Wu G; Sahoo AK; Chen DW; Chang JW Materials (Basel); 2018 Dec; 11(12):. PubMed ID: 30544867 [TBL] [Abstract][Full Text] [Related]
33. Investigation of the Capacitance-Voltage Electrical Characteristics of Thin-Film Transistors Caused by Hydrogen Diffusion under Negative Bias Stress in a Moist Environment. Chen HC; Kuo CW; Chang TC; Lai WC; Chen PH; Chen GF; Huang SP; Chen JJ; Zhou KJ; Shih CC; Tsao YC; Huang HC; Sze SM ACS Appl Mater Interfaces; 2019 Oct; 11(43):40196-40203. PubMed ID: 31573173 [TBL] [Abstract][Full Text] [Related]
34. Triple-Stack ZnO/AlZnO/YZnO Heterojunction Oxide Thin-Film Transistors by Spray Pyrolysis for High Mobility and Excellent Stability. Saha JK; Billah MM; Jang J ACS Appl Mater Interfaces; 2021 Aug; 13(31):37350-37362. PubMed ID: 34325511 [TBL] [Abstract][Full Text] [Related]
35. Comparative Study of Atomic Layer Deposited Indium-Based Oxide Transistors with a Fermi Energy Level-Engineered Heterojunction Structure Channel through a Cation Combinatorial Approach. Cho MH; Choi CH; Jeong JK ACS Appl Mater Interfaces; 2022 Apr; 14(16):18646-18661. PubMed ID: 35426670 [TBL] [Abstract][Full Text] [Related]
36. Performance Enhancement for Indium-Free Metal Oxide Thin-Film Transistors with Double-Active-Layers by Magnetron Sputtering at Room Temperature. Yan X; Song K; Li B; Zhang Y; Yang F; Wang Y; Wang C; Chi Y; Yang X Micromachines (Basel); 2022 Nov; 13(11):. PubMed ID: 36422452 [TBL] [Abstract][Full Text] [Related]
37. The effect of annealing ambient on the characteristics of an indium-gallium-zinc oxide thin film transistor. Park S; Bang S; Lee S; Park J; Ko Y; Jeon H J Nanosci Nanotechnol; 2011 Jul; 11(7):6029-33. PubMed ID: 22121652 [TBL] [Abstract][Full Text] [Related]
38. High-performance low-cost back-channel-etch amorphous gallium-indium-zinc oxide thin-film transistors by curing and passivation of the damaged back channel. Park JC; Ahn SE; Lee HN ACS Appl Mater Interfaces; 2013 Dec; 5(23):12262-7. PubMed ID: 24221957 [TBL] [Abstract][Full Text] [Related]
39. Tuning the Threshold Voltage of an Oxide Thin-Film Transistor by Electron Injection Control Using a p-n Semiconductor Heterojunction Structure. Han JH; Shin DY; Sung C; Cho SH; Ju BK; Chung KB; Nam S ACS Appl Mater Interfaces; 2024 Jun; 16(24):31254-31260. PubMed ID: 38856760 [TBL] [Abstract][Full Text] [Related]
40. Analysis of Threshold Voltage Shift for Full V Kim JH; Jang JT; Bae JH; Choi SJ; Kim DM; Kim C; Kim Y; Kim DH Micromachines (Basel); 2021 Mar; 12(3):. PubMed ID: 33808738 [TBL] [Abstract][Full Text] [Related] [Previous] [Next] [New Search]