156 related articles for article (PubMed ID: 35616183)
1. Anisotropic Charge Transport Enabling High-Throughput and High-Aspect-Ratio Wet Etching of Silicon Carbide.
Shi D; Chen Y; Li Z; Dong S; Li L; Hou M; Liu H; Zhao S; Chen X; Wong CP; Zhao N
Small Methods; 2022 Aug; 6(8):e2200329. PubMed ID: 35616183
[TBL] [Abstract][Full Text] [Related]
2. Hybrid Anodic and Metal-Assisted Chemical Etching Method Enabling Fabrication of Silicon Carbide Nanowires.
Chen Y; Zhang C; Li L; Zhou S; Chen X; Gao J; Zhao N; Wong CP
Small; 2019 Feb; 15(7):e1803898. PubMed ID: 30667586
[TBL] [Abstract][Full Text] [Related]
3. Method for fabricating micro/nanostructures via scanning probe microscope and anisotropic wet etching.
Hu K; Wang Q
J Nanosci Nanotechnol; 2013 Jun; 13(6):3966-71. PubMed ID: 23862434
[TBL] [Abstract][Full Text] [Related]
4. Helium Ion-Assisted Wet Etching of Silicon Carbide with Extremely Low Roughness for High-Quality Nanofabrication.
Wen X; Zhang L; Wang X; Chen L; Sun J; Hu H
Small Methods; 2024 May; 8(5):e2301364. PubMed ID: 38185791
[TBL] [Abstract][Full Text] [Related]
5. Uniform vertical trench etching on silicon with high aspect ratio by metal-assisted chemical etching using nanoporous catalysts.
Li L; Liu Y; Zhao X; Lin Z; Wong CP
ACS Appl Mater Interfaces; 2014 Jan; 6(1):575-84. PubMed ID: 24261312
[TBL] [Abstract][Full Text] [Related]
6. 25 nm Single-Crystal Silicon Nanowires Fabricated by Anisotropic Wet Etching.
Chu HM; Nguyen MV; Vu HN; Hane K
J Nanosci Nanotechnol; 2017 Feb; 17(2):1525-529. PubMed ID: 29688670
[TBL] [Abstract][Full Text] [Related]
7. Electrochemical etching strategy for shaping monolithic 3D structures from 4H-SiC wafers.
Hochreiter A; Groß F; Möller MN; Krieger M; Weber HB
Sci Rep; 2023 Nov; 13(1):19086. PubMed ID: 37925526
[TBL] [Abstract][Full Text] [Related]
8. Silicon etching using only Oxygen at high temperature: An alternative approach to Si micro-machining on 150 mm Si wafers.
Chai J; Walker G; Wang L; Massoubre D; Tan SH; Chaik K; Hold L; Iacopi A
Sci Rep; 2015 Dec; 5():17811. PubMed ID: 26634813
[TBL] [Abstract][Full Text] [Related]
9. Two-step texture process for high-efficiency crystalline silicon solar cell applications.
Kim H; Lee Y; Shin C; Han S; Kim S; Lee Y; Yi J
J Nanosci Nanotechnol; 2013 Dec; 13(12):7916-9. PubMed ID: 24266164
[TBL] [Abstract][Full Text] [Related]
10. Fabrication of Homogeneous Nanoporous Structure on 4H-/6H-SiC Wafer Surface via Efficient and Eco-Friendly Electrolytic Plasma-Assisted Chemical Etching.
Zhan S; Liu B; Yu X; Chen X; Zeng G; Zhao Y
Small; 2023 Apr; 19(14):e2205720. PubMed ID: 36634983
[TBL] [Abstract][Full Text] [Related]
11. Controlled Patterning of Vertical Silicon Structures Using Polymer Lithography and Wet Chemical Etching.
Kim HJ; Lee SH; Lee J; Lee ES; Choi JH; Jung JY; Jeong JH; Choi DG
J Nanosci Nanotechnol; 2015 Jun; 15(6):4522-9. PubMed ID: 26369075
[TBL] [Abstract][Full Text] [Related]
12. Fabrication of p-type silicon nanowire arrays with a high aspect ratio using electrochemical and alkaline etching.
Jang HS; Choi HJ; Kim JH
J Nanosci Nanotechnol; 2012 Apr; 12(4):3567-70. PubMed ID: 22849170
[TBL] [Abstract][Full Text] [Related]
13. Effect of Isopropyl Alcohol Concentration and Etching Time on Wet Chemical Anisotropic Etching of Low-Resistivity Crystalline Silicon Wafer.
Abdur-Rahman E; Alghoraibi I; Alkurdi H
Int J Anal Chem; 2017; 2017():7542870. PubMed ID: 28831284
[TBL] [Abstract][Full Text] [Related]
14. An Investigation of Processes for Glass Micromachining.
Van Toan N; Toda M; Ono T
Micromachines (Basel); 2016 Mar; 7(3):. PubMed ID: 30407424
[TBL] [Abstract][Full Text] [Related]
15. Anisotropic multi-step etching for large-area fabrication of surface microstructures on stainless steel to control thermal radiation.
Shimizu M; Yamada T; Sasaki K; Takada A; Nomura H; Iguchi F; Yugami H
Sci Technol Adv Mater; 2015 Apr; 16(2):025001. PubMed ID: 27877770
[TBL] [Abstract][Full Text] [Related]
16. Chemical etching of silicon carbide in pure water by using platinum catalyst.
Isohashi A; Bui PV; Toh D; Matsuyama S; Sano Y; Inagaki K; Morikawa Y; Yamauchi K
Appl Phys Lett; 2017 May; 110(20):201601. PubMed ID: 28611484
[TBL] [Abstract][Full Text] [Related]
17. Fabrication of arrays of tapered silicon micro-/nano-pillars by metal-assisted chemical etching and anisotropic wet etching.
Yamada K; Yamada M; Maki H; Itoh KM
Nanotechnology; 2018 Jul; 29(28):28LT01. PubMed ID: 29697051
[TBL] [Abstract][Full Text] [Related]
18. Recent Advances in Reactive Ion Etching and Applications of High-Aspect-Ratio Microfabrication.
Huff M
Micromachines (Basel); 2021 Aug; 12(8):. PubMed ID: 34442613
[TBL] [Abstract][Full Text] [Related]
19. Wafer-Scale Fabrication of Ultra-High Aspect Ratio, Microscale Silicon Structures with Smooth Sidewalls Using Metal Assisted Chemical Etching.
Zhang X; Yao C; Niu J; Li H; Xie C
Micromachines (Basel); 2023 Jan; 14(1):. PubMed ID: 36677239
[TBL] [Abstract][Full Text] [Related]
20. Photo-catalytic deactivation of hazardous sulfate reducing bacteria using palladium nanoparticles decorated silicon carbide: A comparative study with pure silicon carbide nanoparticles.
Baig U; Gondal MA; Dastageer MA; Khalil AB; Zubair SM
J Photochem Photobiol B; 2018 Oct; 187():113-119. PubMed ID: 30121421
[TBL] [Abstract][Full Text] [Related]
[Next] [New Search]
