These tools will no longer be maintained as of December 31, 2024. Archived website can be found here. PubMed4Hh GitHub repository can be found here. Contact NLM Customer Service if you have questions.
8. Solvothermal Vapor Annealing of Lamellar Poly(styrene)-block-poly(d,l-lactide) Block Copolymer Thin Films for Directed Self-Assembly Application. Cummins C; Mokarian-Tabari P; Andreazza P; Sinturel C; Morris MA ACS Appl Mater Interfaces; 2016 Mar; 8(12):8295-304. PubMed ID: 26950246 [TBL] [Abstract][Full Text] [Related]
9. Oriented mesoporous organosilicate thin films. Freer EM; Krupp LE; Hinsberg WD; Rice PM; Hedrick JL; Cha JN; Miller RD; Kim HC Nano Lett; 2005 Oct; 5(10):2014-8. PubMed ID: 16218729 [TBL] [Abstract][Full Text] [Related]
10. Ordered nanostructure of PS-b-PEO copolymer by solvent annealing with mixture of benzene/water vapor and its micropattern fabrication. Kim TH; Hwang J; Acharya H; Park C J Nanosci Nanotechnol; 2010 Oct; 10(10):6883-7. PubMed ID: 21137817 [TBL] [Abstract][Full Text] [Related]
11. Porous Ultra-Thin Films from Photocleavable Block Copolymers: In-Situ Degradation Kinetics Study of Pore Material. Altinpinar S; Ali W; Schuchardt P; Yildiz P; Zhao H; Theato P; Gutmann JS Polymers (Basel); 2020 Apr; 12(4):. PubMed ID: 32252242 [TBL] [Abstract][Full Text] [Related]
12. Synthesis of mesoporous silica from poly(ethylene oxide)/polystyrene copolymers: influence of block architecture and each copolymer block on porous size. Dong Z; Shi Y; Fu Z; Yang W J Nanosci Nanotechnol; 2013 Oct; 13(10):6967-77. PubMed ID: 24245172 [TBL] [Abstract][Full Text] [Related]
13. Robust block copolymer mask for nanopatterning polymer films. Chao CC; Wang TC; Ho RM; Georgopanos P; Avgeropoulos A; Thomas EL ACS Nano; 2010 Apr; 4(4):2088-94. PubMed ID: 20201544 [TBL] [Abstract][Full Text] [Related]
14. Swift nanopattern formation of PS-b-PMMA and PS-b-PDMS block copolymer films using a microwave assisted technique. Borah D; Senthamaraikannan R; Rasappa S; Kosmala B; Holmes JD; Morris MA ACS Nano; 2013 Aug; 7(8):6583-96. PubMed ID: 23859379 [TBL] [Abstract][Full Text] [Related]
15. Orienting block copolymer microdomains with block copolymer brushes. Gu W; Hong SW; Russell TP ACS Nano; 2012 Nov; 6(11):10250-7. PubMed ID: 23092357 [TBL] [Abstract][Full Text] [Related]
16. Fabrication of Ordered Nanopattern by using ABC Triblock Copolymer with Salt in Toluene. Huang H; Zhong B; Zu X; Luo H; Lin W; Zhang M; Zhong Y; Yi G Nanoscale Res Lett; 2017 Aug; 12(1):491. PubMed ID: 28812244 [TBL] [Abstract][Full Text] [Related]
17. The effect of random copolymer on the characteristic dimensions of cylinder-forming PS-b-PMMA thin films. Andreozzi A; Poliani E; Seguini G; Perego M Nanotechnology; 2011 May; 22(18):185304. PubMed ID: 21415473 [TBL] [Abstract][Full Text] [Related]
18. Directed Self-Assembly of Star-Block Copolymers by Topographic Nanopatterns through Nucleation and Growth Mechanism. Krishnan MR; Lu KY; Chiu WY; Chen IC; Lin JW; Lo TY; Georgopanos P; Avgeropoulos A; Lee MC; Ho RM Small; 2018 Apr; 14(16):e1704005. PubMed ID: 29573555 [TBL] [Abstract][Full Text] [Related]
19. Enhanced Lateral Ordering in Cylinder Forming PS-b-PMMA Block Copolymers Exploiting the Entrapped Solvent. Seguini G; Zanenga F; Giammaria TJ; Ceresoli M; Sparnacci K; Antonioli D; Gianotti V; Laus M; Perego M ACS Appl Mater Interfaces; 2016 Mar; 8(12):8280-8. PubMed ID: 26959626 [TBL] [Abstract][Full Text] [Related]
20. Sub-25 nm Inorganic and Dielectric Nanopattern Arrays on Substrates: A Block Copolymer-Assisted Lithography. Ghoshal T; Prochukhan N; Morris MA ACS Omega; 2021 Dec; 6(51):35738-35744. PubMed ID: 34984304 [TBL] [Abstract][Full Text] [Related] [Next] [New Search]