These tools will no longer be maintained as of December 31, 2024. Archived website can be found here. PubMed4Hh GitHub repository can be found here. Contact NLM Customer Service if you have questions.


BIOMARKERS

Molecular Biopsy of Human Tumors

- a resource for Precision Medicine *

205 related articles for article (PubMed ID: 35910127)

  • 1. Unraveling the Mechanism of Maskless Nanopatterning of Black Silicon by CF
    Ghezzi F; Pedroni M; Kovač J; Causa F; Cremona A; Anderle M; Caniello R; Pietralunga SM; Vassallo E
    ACS Omega; 2022 Jul; 7(29):25600-25612. PubMed ID: 35910127
    [TBL] [Abstract][Full Text] [Related]  

  • 2. Pseudo-Wet Plasma Mechanism Enabling High-Throughput Dry Etching of SiO
    Hsiao SN; Sekine M; Britun N; Mo MKT; Imai Y; Tsutsumi T; Ishikawa K; Iijima Y; Suda R; Yokoi M; Kihara Y; Hori M
    Small Methods; 2024 Jun; ():e2400090. PubMed ID: 38824668
    [TBL] [Abstract][Full Text] [Related]  

  • 3. Evolution and characteristics of GaN nanowires produced via maskless reactive ion etching.
    Haab A; Mikulics M; Sutter E; Jin J; Stoica T; Kardynal B; Rieger T; Grützmacher D; Hardtdegen H
    Nanotechnology; 2014 Jun; 25(25):255301. PubMed ID: 24896155
    [TBL] [Abstract][Full Text] [Related]  

  • 4. Plasma-Induced, Self-Masking, One-Step Approach to an Ultrabroadband Antireflective and Superhydrophilic Subwavelength Nanostructured Fused Silica Surface.
    Ye X; Shao T; Sun L; Wu J; Wang F; He J; Jiang X; Wu WD; Zheng W
    ACS Appl Mater Interfaces; 2018 Apr; 10(16):13851-13859. PubMed ID: 29617569
    [TBL] [Abstract][Full Text] [Related]  

  • 5. On Relationships between Gas-Phase Chemistry and Reactive Ion Etching Kinetics for Silicon-Based Thin Films (SiC, SiO
    Efremov A; Lee BJ; Kwon KH
    Materials (Basel); 2021 Mar; 14(6):. PubMed ID: 33804274
    [TBL] [Abstract][Full Text] [Related]  

  • 6. Improvement of polycrystalline silicon wafer solar cell efficiency by forming nanoscale pyramids on wafer surface using a self-mask etching technique.
    Lin HH; Chen WH; Hong FC
    J Vac Sci Technol B Nanotechnol Microelectron; 2013 May; 31(3):31401. PubMed ID: 23847751
    [TBL] [Abstract][Full Text] [Related]  

  • 7. Cyclic photochemical re-growth of gold nanoparticles: Overcoming the mask-erosion limit during reactive ion etching on the nanoscale.
    Ozdemir B; Seidenstücker A; Plettl A; Ziemann P
    Beilstein J Nanotechnol; 2013; 4():886-94. PubMed ID: 24367758
    [TBL] [Abstract][Full Text] [Related]  

  • 8. High-Density Patterning of InGaZnO by CH
    Kundu S; Decoster S; Bezard P; Nalin Mehta A; Dekkers H; Lazzarino F
    ACS Appl Mater Interfaces; 2022 Jul; ():. PubMed ID: 35850517
    [TBL] [Abstract][Full Text] [Related]  

  • 9. A Review: Inductively Coupled Plasma Reactive Ion Etching of Silicon Carbide.
    Racka-Szmidt K; Stonio B; Żelazko J; Filipiak M; Sochacki M
    Materials (Basel); 2021 Dec; 15(1):. PubMed ID: 35009277
    [TBL] [Abstract][Full Text] [Related]  

  • 10. On Relationships between Plasma Chemistry and Surface Reaction Kinetics Providing the Etching of Silicon in CF
    Baek SY; Efremov A; Bobylev A; Choi G; Kwon KH
    Materials (Basel); 2023 Jul; 16(14):. PubMed ID: 37512317
    [TBL] [Abstract][Full Text] [Related]  

  • 11. Fabrication of Silicon Nanobelts and Nanopillars by Soft Lithography for Hydrophobic and Hydrophilic Photonic Surfaces.
    Baquedano E; Martinez RV; Llorens JM; Postigo PA
    Nanomaterials (Basel); 2017 May; 7(5):. PubMed ID: 28492474
    [TBL] [Abstract][Full Text] [Related]  

  • 12. Silicon flower structures by maskless plasma etching.
    Zhao G; Zhao X; Zhang H; Lian Z; Zhao Y; Ming A; Lin Y
    Heliyon; 2023 Dec; 9(12):e22792. PubMed ID: 38125487
    [TBL] [Abstract][Full Text] [Related]  

  • 13. Self-masked high-aspect-ratio polymer nanopillars.
    Chen MH; Chuang YJ; Tseng FG
    Nanotechnology; 2008 Dec; 19(50):505301. PubMed ID: 19942765
    [TBL] [Abstract][Full Text] [Related]  

  • 14. Finding needles in haystacks: scanning tunneling microscopy reveals the complex reactivity of Si(100) surfaces.
    Skibinski ES; Hines MA
    Acc Chem Res; 2015 Jul; 48(7):2159-66. PubMed ID: 26107690
    [TBL] [Abstract][Full Text] [Related]  

  • 15. Formation of Si nanopillars through partial sacrificing in super passivation reactive ion etching.
    Zhang J; Yu L; Ye S; Zhao Q; Guo J; Yin H; Wang Y
    Nanotechnology; 2024 May; 35(31):. PubMed ID: 38688257
    [TBL] [Abstract][Full Text] [Related]  

  • 16. Application of Si and SiO2 Etching Mechanisms in CF4/C4F8/Ar Inductively Coupled Plasmas for Nanoscale Patterns.
    Lee J; Efremov A; Yeom GY; Lim N; Kwon KH
    J Nanosci Nanotechnol; 2015 Oct; 15(10):8340-7. PubMed ID: 26726514
    [TBL] [Abstract][Full Text] [Related]  

  • 17. Recent Advances in Reactive Ion Etching and Applications of High-Aspect-Ratio Microfabrication.
    Huff M
    Micromachines (Basel); 2021 Aug; 12(8):. PubMed ID: 34442613
    [TBL] [Abstract][Full Text] [Related]  

  • 18. Fabrication of polymer nanowires via maskless O2 plasma etching.
    Du K; Wathuthanthri I; Liu Y; Kang YT; Choi CH
    Nanotechnology; 2014 Apr; 25(16):165301. PubMed ID: 24670779
    [TBL] [Abstract][Full Text] [Related]  

  • 19. Aluminum oxide mask fabrication by focused ion beam implantation combined with wet etching.
    Liu Z; Iltanen K; Chekurov N; Grigoras K; Tittonen I
    Nanotechnology; 2013 May; 24(17):175304. PubMed ID: 23571491
    [TBL] [Abstract][Full Text] [Related]  

  • 20. Enhancing Si
    Tung NH; Lee H; Dinh DK; Kim DW; Lee JY; Eom GW; Kim HU; Kang WS
    Sensors (Basel); 2024 May; 24(10):. PubMed ID: 38793941
    [TBL] [Abstract][Full Text] [Related]  

    [Next]    [New Search]
    of 11.