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11. Towards High Accuracy Reflectometry for Extreme-Ultraviolet Lithography. Tarrio C; Grantham S; Squires MB; Vest RE; Lucatorto TB J Res Natl Inst Stand Technol; 2003; 108(4):267-73. PubMed ID: 27413610 [TBL] [Abstract][Full Text] [Related]
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