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13. Influence of barrier interlayers on the performance of Mo/Be multilayer mirrors for next-generation EUV lithography. Svechnikov MV; Chkhalo NI; Gusev SA; Nechay AN; Pariev DE; Pestov AE; Polkovnikov VN; Tatarskiy DA; Salashchenko NN; Schäfers F; Sertsu MG; Sokolov A; Vainer YA; Zorina MV Opt Express; 2018 Dec; 26(26):33718-33731. PubMed ID: 30650805 [TBL] [Abstract][Full Text] [Related]
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