These tools will no longer be maintained as of December 31, 2024. Archived website can be found here. PubMed4Hh GitHub repository can be found here. Contact NLM Customer Service if you have questions.


BIOMARKERS

Molecular Biopsy of Human Tumors

- a resource for Precision Medicine *

110 related articles for article (PubMed ID: 36223734)

  • 1. Atomic layer etching of Sn by surface modification with H and Cl radicals.
    Kim DS; Jang YJ; Kim YE; Gil HS; Jeong BH; Yeom GY
    Nanotechnology; 2022 Nov; 34(3):. PubMed ID: 36223734
    [TBL] [Abstract][Full Text] [Related]  

  • 2. Atomic layer etching of chrome using ion beams.
    Park JW; Kim DS; Lee WO; Kim JE; Yeom GY
    Nanotechnology; 2019 Feb; 30(8):085303. PubMed ID: 30523944
    [TBL] [Abstract][Full Text] [Related]  

  • 3. Highly selective etching of SnO2 absorber in binary mask structure for extreme ultra-violet lithography.
    Lee SJ; Jung CY; Park SJ; Hwangbo CK; Seo HS; Kim SS; Lee NE
    J Nanosci Nanotechnol; 2012 Apr; 12(4):3334-40. PubMed ID: 22849119
    [TBL] [Abstract][Full Text] [Related]  

  • 4. Prospects for Thermal Atomic Layer Etching Using Sequential, Self-Limiting Fluorination and Ligand-Exchange Reactions.
    George SM; Lee Y
    ACS Nano; 2016 May; 10(5):4889-94. PubMed ID: 27216115
    [TBL] [Abstract][Full Text] [Related]  

  • 5. Controlled Layer-by-Layer Etching of MoSâ‚‚.
    Lin T; Kang B; Jeon M; Huffman C; Jeon J; Lee S; Han W; Lee J; Lee S; Yeom G; Kim K
    ACS Appl Mater Interfaces; 2015 Jul; 7(29):15892-7. PubMed ID: 26091282
    [TBL] [Abstract][Full Text] [Related]  

  • 6. Atomic layer etching of Al2O3 using sequential, self-limiting thermal reactions with Sn(acac)2 and hydrogen fluoride.
    Lee Y; George SM
    ACS Nano; 2015 Feb; 9(2):2061-70. PubMed ID: 25604976
    [TBL] [Abstract][Full Text] [Related]  

  • 7. Isotropic Atomic Layer Etching of ZnO Using Acetylacetone and O
    Mameli A; Verheijen MA; Mackus AJM; Kessels WMM; Roozeboom F
    ACS Appl Mater Interfaces; 2018 Nov; 10(44):38588-38595. PubMed ID: 30286289
    [TBL] [Abstract][Full Text] [Related]  

  • 8. Mechanisms of Thermal Atomic Layer Etching.
    George SM
    Acc Chem Res; 2020 Jun; 53(6):1151-1160. PubMed ID: 32476413
    [TBL] [Abstract][Full Text] [Related]  

  • 9. Thermally Driven Self-Limiting Atomic Layer Etching of Metallic Tungsten Using WF
    Xie W; Lemaire PC; Parsons GN
    ACS Appl Mater Interfaces; 2018 Mar; 10(10):9147-9154. PubMed ID: 29461793
    [TBL] [Abstract][Full Text] [Related]  

  • 10. Atomic Layer Etching Mechanism of MoS
    Kim KS; Kim KH; Nam Y; Jeon J; Yim S; Singh E; Lee JY; Lee SJ; Jung YS; Yeom GY; Kim DW
    ACS Appl Mater Interfaces; 2017 Apr; 9(13):11967-11976. PubMed ID: 28306240
    [TBL] [Abstract][Full Text] [Related]  

  • 11. Characterizing fluorocarbon assisted atomic layer etching of Si using cyclic Ar/C
    Metzler D; Li C; Engelmann S; Bruce RL; Joseph EA; Oehrlein GS
    J Chem Phys; 2017 Feb; 146(5):052801. PubMed ID: 28178847
    [TBL] [Abstract][Full Text] [Related]  

  • 12. Reduction of EUV resist damage by neutral beam etching.
    Kim GW; Chang WJ; Kang JE; Kim HJ; Yeom GY
    Nanotechnology; 2021 Dec; 33(9):. PubMed ID: 34808609
    [TBL] [Abstract][Full Text] [Related]  

  • 13. Atomic layer etching of graphene through controlled ion beam for graphene-based electronics.
    Kim KS; Ji YJ; Nam Y; Kim KH; Singh E; Lee JY; Yeom GY
    Sci Rep; 2017 May; 7(1):2462. PubMed ID: 28550291
    [TBL] [Abstract][Full Text] [Related]  

  • 14. WO
    Johnson NR; George SM
    ACS Appl Mater Interfaces; 2017 Oct; 9(39):34435-34447. PubMed ID: 28876892
    [TBL] [Abstract][Full Text] [Related]  

  • 15. Atomic Layer Etching: Rethinking the Art of Etch.
    Kanarik KJ; Tan S; Gottscho RA
    J Phys Chem Lett; 2018 Aug; 9(16):4814-4821. PubMed ID: 30095919
    [TBL] [Abstract][Full Text] [Related]  

  • 16. Surface Phenomena During Plasma-Assisted Atomic Layer Etching of SiO
    Gasvoda RJ; van de Steeg AW; Bhowmick R; Hudson EA; Agarwal S
    ACS Appl Mater Interfaces; 2017 Sep; 9(36):31067-31075. PubMed ID: 28796486
    [TBL] [Abstract][Full Text] [Related]  

  • 17. In Situ Thermal Atomic Layer Etching for Sub-5 nm InGaAs Multigate MOSFETs.
    Lu W; Lee Y; Gertsch JC; Murdzek JA; Cavanagh AS; Kong L; Del Alamo JA; George SM
    Nano Lett; 2019 Aug; 19(8):5159-5166. PubMed ID: 31251069
    [TBL] [Abstract][Full Text] [Related]  

  • 18. Thermal Atomic Layer Etching of Silica and Alumina Thin Films Using Trimethylaluminum with Hydrogen Fluoride or Fluoroform.
    Rahman R; Mattson EC; Klesko JP; Dangerfield A; Rivillon-Amy S; Smith DC; Hausmann D; Chabal YJ
    ACS Appl Mater Interfaces; 2018 Sep; 10(37):31784-31794. PubMed ID: 30179460
    [TBL] [Abstract][Full Text] [Related]  

  • 19. Reaction Mechanism and Selectivity Control of Si Compound ALE Based on Plasma Modification and F-Radical Exposure.
    Vervuurt RHJ; Mukherjee B; Nakane K; Tsutsumi T; Hori M; Kobayashi N
    Langmuir; 2021 Nov; 37(43):12663-12672. PubMed ID: 34666489
    [TBL] [Abstract][Full Text] [Related]  

  • 20. Thermal Atomic Layer Etching of MoS
    Soares J; Mane AU; Choudhury D; Letourneau S; Hues SM; Elam JW; Graugnard E
    Chem Mater; 2023 Feb; 35(3):927-936. PubMed ID: 36818590
    [TBL] [Abstract][Full Text] [Related]  

    [Next]    [New Search]
    of 6.