These tools will no longer be maintained as of December 31, 2024. Archived website can be found here. PubMed4Hh GitHub repository can be found here. Contact NLM Customer Service if you have questions.


BIOMARKERS

Molecular Biopsy of Human Tumors

- a resource for Precision Medicine *

124 related articles for article (PubMed ID: 36296797)

  • 21. Deposition Mechanism and Properties of Plasma-Enhanced Atomic Layer Deposited Gallium Nitride Films with Different Substrate Temperatures.
    Ren FB; Jiang SC; Hsu CH; Zhang XY; Gao P; Wu WY; Chiu YJ; Lien SY; Zhu WZ
    Molecules; 2022 Nov; 27(23):. PubMed ID: 36500217
    [TBL] [Abstract][Full Text] [Related]  

  • 22. Performance and Stability Enhancement of In-Sn-Zn-O TFTs Using SiO
    Sheng J; Han JH; Choi WH; Park J; Park JS
    ACS Appl Mater Interfaces; 2017 Dec; 9(49):42928-42934. PubMed ID: 29161024
    [TBL] [Abstract][Full Text] [Related]  

  • 23. Production Strategies of TiN
    Mortalò C; Deambrosis SM; Montagner F; Zin V; Fabrizio M; Pasquali L; Capelli R; Montecchi M; Miorin E
    Membranes (Basel); 2021 May; 11(5):. PubMed ID: 34063392
    [TBL] [Abstract][Full Text] [Related]  

  • 24. Investigation of the Physical Properties of Plasma Enhanced Atomic Layer Deposited Silicon Nitride as Etch Stopper.
    Kim HS; Meng X; Kim SJ; Lucero AT; Cheng L; Byun YC; Lee JS; Hwang SM; Kondusamy ALN; Wallace RM; Goodman G; Wan AS; Telgenhoff M; Hwang BK; Kim J
    ACS Appl Mater Interfaces; 2018 Dec; 10(51):44825-44833. PubMed ID: 30485061
    [TBL] [Abstract][Full Text] [Related]  

  • 25. Electrical Characteristics of Metal-Oxide-Semiconductor Capacitor with High-κ/Metal Gate Using Oxygen Scavenging Process.
    Lee J; Kim JH; Kwon DW; Park E; Park T; Kim HW; Park BG
    J Nanosci Nanotechnol; 2016 May; 16(5):4897-900. PubMed ID: 27483842
    [TBL] [Abstract][Full Text] [Related]  

  • 26. Incorporation of Si and Zr into Pure HfO₂ and Its Effects on Dielectric Integrity.
    Kim H; Choi P; Lee N; Kim S; Koo K; Lee J; Choi B
    J Nanosci Nanotechnol; 2018 Sep; 18(9):5899-5903. PubMed ID: 29677713
    [TBL] [Abstract][Full Text] [Related]  

  • 27. Effects of titanium nitride coatings on surface and corrosion characteristics of Ni-Ti alloy.
    Endo K; Sachdeva R; Araki Y; Ohno H
    Dent Mater J; 1994 Dec; 13(2):228-39. PubMed ID: 7758284
    [TBL] [Abstract][Full Text] [Related]  

  • 28. Low-Power, High-Performance, Non-volatile Inkjet-Printed HfO
    Vescio G; Martín G; Crespo-Yepes A; Claramunt S; Alonso D; López-Vidrier J; Estradé S; Porti M; Rodríguez R; Peiró F; Cornet A; Cirera A; Nafría M
    ACS Appl Mater Interfaces; 2019 Jul; 11(26):23659-23666. PubMed ID: 31180626
    [TBL] [Abstract][Full Text] [Related]  

  • 29. Ion Drift and Polarization in Thin SiO
    Popov VP; Antonov VA; Miakonkikh AV; Rudenko KV
    Nanomaterials (Basel); 2022 Sep; 12(19):. PubMed ID: 36234528
    [TBL] [Abstract][Full Text] [Related]  

  • 30. Structural and Electrical Properties of EOT HfO2 (<1 nm) Grown on InAs by Atomic Layer Deposition and Its Thermal Stability.
    Kang YS; Kang HK; Kim DK; Jeong KS; Baik M; An Y; Kim H; Song JD; Cho MH
    ACS Appl Mater Interfaces; 2016 Mar; 8(11):7489-98. PubMed ID: 26928131
    [TBL] [Abstract][Full Text] [Related]  

  • 31. Tantalum-Doped TiO
    Hsu CH; Chen KT; Lin LY; Wu WY; Liang LS; Gao P; Qiu Y; Zhang XY; Huang PH; Lien SY; Zhu WZ
    Nanomaterials (Basel); 2021 Jun; 11(6):. PubMed ID: 34200248
    [TBL] [Abstract][Full Text] [Related]  

  • 32. Comparative study of Laser induce damage of HfO2/SiO2 and TiO2/SiO2 mirrors at 1064 nm.
    Jiao H; Ding T; Zhang Q
    Opt Express; 2011 Feb; 19(5):4059-66. PubMed ID: 21369234
    [TBL] [Abstract][Full Text] [Related]  

  • 33. Systematic Study of the SiO
    Ma HP; Yang JH; Yang JG; Zhu LY; Huang W; Yuan GJ; Feng JJ; Jen TC; Lu HL
    Nanomaterials (Basel); 2019 Jan; 9(1):. PubMed ID: 30609822
    [TBL] [Abstract][Full Text] [Related]  

  • 34. Selective Growth of Interface Layers from Reactions of Sc(MeCp)
    Rahman R; Klesko JP; Dangerfield A; Mattson EC; Chabal YJ
    ACS Appl Mater Interfaces; 2018 Sep; 10(38):32818-32827. PubMed ID: 30211529
    [TBL] [Abstract][Full Text] [Related]  

  • 35. Plasma-Enhanced Atomic Layer Deposition of HfO
    Beladiya V; Faraz T; Schmitt P; Munser AS; Schröder S; Riese S; Mühlig C; Schachtler D; Steger F; Botha R; Otto F; Fritz T; van Helvoirt C; Kessels WMM; Gargouri H; Szeghalmi A
    ACS Appl Mater Interfaces; 2022 Mar; 14(12):14677-14692. PubMed ID: 35311275
    [TBL] [Abstract][Full Text] [Related]  

  • 36. High-Quality
    Cañas J; Reyes DF; Zakhtser A; Dussarrat C; Teramoto T; Gutiérrez M; Gheeraert E
    Nanomaterials (Basel); 2022 Nov; 12(23):. PubMed ID: 36500747
    [TBL] [Abstract][Full Text] [Related]  

  • 37. Reliable resistive switching of epitaxial single crystalline cubic Y-HfO
    Wang Y; Niu G; Wang Q; Roy S; Dai L; Wu H; Sun Y; Song S; Song Z; Xie YH; Ye ZG; Meng X; Ren W
    Nanotechnology; 2020 May; 31(20):205203. PubMed ID: 32018237
    [TBL] [Abstract][Full Text] [Related]  

  • 38. Improved oxygen diffusion barrier properties of ruthenium-titanium nitride thin films prepared by plasma-enhanced atomic layer deposition.
    Jeong SJ; Kim DI; Kim SO; Han TH; Kwon JD; Park JS; Kwon SH
    J Nanosci Nanotechnol; 2011 Jan; 11(1):671-4. PubMed ID: 21446521
    [TBL] [Abstract][Full Text] [Related]  

  • 39. Soft x-ray reflectometry, hard x-ray photoelectron spectroscopy and transmission electron microscopy investigations of the internal structure of TiO
    Filatova EO; Kozhevnikov IV; Sokolov AA; Ubyivovk EV; Yulin S; Gorgoi M; Schäfers F
    Sci Technol Adv Mater; 2012 Feb; 13(1):015001. PubMed ID: 27877468
    [TBL] [Abstract][Full Text] [Related]  

  • 40. Al
    Kang HK; Kang YS; Kim DK; Baik M; Song JD; An Y; Kim H; Cho MH
    ACS Appl Mater Interfaces; 2017 May; 9(20):17526-17535. PubMed ID: 28387121
    [TBL] [Abstract][Full Text] [Related]  

    [Previous]   [Next]    [New Search]
    of 7.