These tools will no longer be maintained as of December 31, 2024. Archived website can be found here. PubMed4Hh GitHub repository can be found here. Contact NLM Customer Service if you have questions.
2. Controlled Anisotropic Wetting by Plasma Treatment for Directed Self-Assembly of High-χ Block Copolymers. Putranto AF; Petit-Etienne C; Cavalaglio S; Cabannes-Boué B; Panabiere M; Forcina G; Fleury G; Kogelschatz M; Zelsmann M ACS Appl Mater Interfaces; 2024 May; 16(21):27841-27849. PubMed ID: 38758246 [TBL] [Abstract][Full Text] [Related]
3. Straightforward Integration Flow of a Silicon-Containing Block Copolymer for Line-Space Patterning. Legrain A; Fleury G; Mumtaz M; Navarro C; Arias-Zapata J; Chevalier X; Cayrefourcq I; Zelsmann M ACS Appl Mater Interfaces; 2017 Dec; 9(49):43043-43050. PubMed ID: 29182294 [TBL] [Abstract][Full Text] [Related]
4. High-Fidelity, Sub-5 nm Patterns from High-χ Block Copolymer Films with Vapor-Deposited Ultrathin, Cross-Linked Surface-Modification Layers. Wang HS; Oh S; Choi J; Jang W; Kim KH; Arellano CL; Huh J; Bang J; Im SG Macromol Rapid Commun; 2020 Feb; 41(4):e1900514. PubMed ID: 31958190 [TBL] [Abstract][Full Text] [Related]
5. Hierarchical Self-Assembly of Thickness-Modulated Block Copolymer Thin Films for Controlling Nanodomain Orientations inside Bare Silicon Trenches. Shin JY; Oh YT; Kim S; Lim HY; Lee B; Ko YC; Park S; Seon SW; Lee SG; Mun SS; Kim BH Polymers (Basel); 2021 Feb; 13(4):. PubMed ID: 33668510 [TBL] [Abstract][Full Text] [Related]
6. Orientation Control in Thin Films of a High-χ Block Copolymer with a Surface Active Embedded Neutral Layer. Zhang J; Clark MB; Wu C; Li M; Trefonas P; Hustad PD Nano Lett; 2016 Jan; 16(1):728-35. PubMed ID: 26682931 [TBL] [Abstract][Full Text] [Related]
7. Lithographically Defined Cross-Linkable Top Coats for Nanomanufacturing with High-χ Block Copolymers. Chevalier X; Gomes Correia C; Pound-Lana G; Bézard P; Sérégé M; Petit-Etienne C; Gay G; Cunge G; Cabannes-Boué B; Nicolet C; Navarro C; Cayrefourcq I; Müller M; Hadziioannou G; Iliopoulos I; Fleury G; Zelsmann M ACS Appl Mater Interfaces; 2021 Mar; 13(9):11224-11236. PubMed ID: 33621463 [TBL] [Abstract][Full Text] [Related]
8. Competitive Registration Fields for The Development of Complex Block Copolymer Structures by A Layer-by-Layer Approach. Demazy N; Argudo PG; Fleury G Small; 2023 Feb; 19(7):e2205254. PubMed ID: 36504447 [TBL] [Abstract][Full Text] [Related]
9. Effect of Entrapped Solvent on the Evolution of Lateral Order in Self-Assembled P(S-r-MMA)/PS-b-PMMA Systems with Different Thicknesses. Giammaria TJ; Ferrarese Lupi F; Seguini G; Sparnacci K; Antonioli D; Gianotti V; Laus M; Perego M ACS Appl Mater Interfaces; 2017 Sep; 9(37):31215-31223. PubMed ID: 28195457 [TBL] [Abstract][Full Text] [Related]
10. Interface Manipulations Using Cross-Linked Underlayers and Surface-Active Diblock Copolymers to Extend Morphological Diversity in High-χ Diblock Copolymer Thin Films. Baumgarten N; Mumtaz M; Merino DH; Solano E; Halila S; Bernard J; Drockenmuller E; Fleury G; Borsali R ACS Appl Mater Interfaces; 2023 May; 15(19):23736-23748. PubMed ID: 37134266 [TBL] [Abstract][Full Text] [Related]
11. Interfacial Energy-Controlled Top Coats for Gyroid/Cylinder Phase Transitions of Polystyrene-block-polydimethylsiloxane Block Copolymer Thin Films. Ryu IH; Kim YJ; Jung YS; Lim JS; Ross CA; Son JG ACS Appl Mater Interfaces; 2017 May; 9(20):17427-17434. PubMed ID: 28470057 [TBL] [Abstract][Full Text] [Related]
12. Potential-induced wetting and dewetting in pH-responsive block copolymer membranes for mass transport control. Kwon SR; Baek S; Bohn PW Faraday Discuss; 2022 Apr; 233(0):283-294. PubMed ID: 34904977 [TBL] [Abstract][Full Text] [Related]
13. Vacuum-Driven Orientation of Nanostructured Diblock Copolymer Thin Films. Panda AS; Lee YC; Hung CJ; Liu KP; Chang CY; Manesi GM; Avgeropoulos A; Tseng FG; Chen FR; Ho RM ACS Nano; 2022 Aug; 16(8):12686-12694. PubMed ID: 35905494 [TBL] [Abstract][Full Text] [Related]
15. Directed Self-Assembly and Pattern Transfer of Five Nanometer Block Copolymer Lamellae. Lane AP; Yang X; Maher MJ; Blachut G; Asano Y; Someya Y; Mallavarapu A; Sirard SM; Ellison CJ; Willson CG ACS Nano; 2017 Aug; 11(8):7656-7665. PubMed ID: 28700207 [TBL] [Abstract][Full Text] [Related]
16. Through-Thickness Vertically Ordered Lamellar Block Copolymer Thin Films on Unmodified Quartz with Cold Zone Annealing. Basutkar MN; Samant S; Strzalka J; Yager KG; Singh G; Karim A Nano Lett; 2017 Dec; 17(12):7814-7823. PubMed ID: 29136475 [TBL] [Abstract][Full Text] [Related]
17. Hierarchical nanopores formed by block copolymer lithography on the surfaces of different materials pre-patterned by nanosphere lithography. Brassat K; Kool D; Bürger J; Lindner JKN Nanoscale; 2018 May; 10(21):10005-10017. PubMed ID: 29774901 [TBL] [Abstract][Full Text] [Related]
18. Chemically tailored block copolymers for highly reliable sub-10-nm patterns by directed self-assembly. Maekawa S; Seshimo T; Dazai T; Sato K; Hatakeyama-Sato K; Nabae Y; Hayakawa T Nat Commun; 2024 Jul; 15(1):5671. PubMed ID: 38971785 [TBL] [Abstract][Full Text] [Related]